Dr. Francis M. Houlihan Profile

Dr. Francis M. Houlihan

Senior Staff Scientist

SPIE Involvement:

Author

Publications (42)

Proceedings Article | 1 April 2009 Paper

Paper

Radiation sensitive developable bottom anti-reflective coatings (DBARC): recent results

Francis Houlihan, Alberto Dioses, Takanori Kudo, Meng Li, Lin Zhang, Sumathy Vasanthan, Srinivasan Chakrapani, Deepa Parthasarathy, Charito Antonio, Edward Ng, Ping-Hung Lu, Mark Neisser, Munirathna Padmanaban

Proceedings Volume 7273, 727316 (2009) https://doi.org/10.1117/12.816375

KEYWORDS: Prototyping, Polymers, Binary data, Fourier transforms, Bottom antireflective coatings, Arsenic, Plasma etching, Head-mounted displays, Electroluminescence, Coating

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Proceedings Article | 15 April 2008 Paper

Paper

Second-generation radiation sensitive 193-nm developable bottom antireflective coatings (DBARC): recent results

Francis Houlihan, Alberto Dioses, Lin Zhang, Joseph Oberlander, Alexandra Krawicz, Sumathy Vasanthan, Meng Li, Yayi Wei, PingHung Lu, Mark Neisser

Proceedings Volume 6923, 692330 (2008) https://doi.org/10.1117/12.781587

KEYWORDS: Reflectivity, Polymers, Fourier transforms, Bottom antireflective coatings, Plasma etching, Coating, Silicon, Reticles, Plasma, Prototyping

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Proceedings Article | 2 April 2007 Paper

Paper

Spin-on trilayer approaches to high NA 193nm lithography

D. Abdallah, D. McKenzie, A. Timko, A. Dioses, F. Houlihan, D. Rahman, S. Miyazaki, R. Zhang, W. Kim, H. Wu, L. Pylneva, P.-H. Lu, M. Neisser, R. Dammel, J. Biafore

Proceedings Volume 6519, 65190M (2007) https://doi.org/10.1117/12.712700

KEYWORDS: Silicon, Etching, Fourier transforms, Carbon, Lithography, Antireflective coatings, Reflectivity, Semiconducting wafers, Photomasks, Silicon carbide

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Proceedings Article | 2 April 2007 Paper

Paper

Second-generation radiation sensitive developable bottom anti-reflective coatings (DBARC) and implant resists approaches for 193-nm lithography

Francis Houlihan, Alberto Dioses, Medhat Toukhy, Andrew Romano, Joseph Oberlander, HengPeng Wu, Salem Mullen, Alexandra Krawicz, PingHung Lu, Mark Neisser

Proceedings Volume 6519, 65190L (2007) https://doi.org/10.1117/12.713436

KEYWORDS: Arsenic, Resistance, Fluorine, Polymers, Prototyping, Lithography, Photoresist processing, Semiconducting wafers, Fourier transforms, Bottom antireflective coatings

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Proceedings Article | 11 April 2006 Paper

Paper

193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

M. Dalil Rahman, Srivanisan Chakrapani, Clement Anyadiegwu, Guanyang Lin, Allen Timko, Frank Houlihan, David Rentkiewicz, Takanori Kudo, Douglas McKenzie, Ralph Dammel, Munirathna Padmanaban

Proceedings Volume 6153, 615327 (2006) https://doi.org/10.1117/12.658671

KEYWORDS: Polymers, Lithography, Line edge roughness, Semiconducting wafers, Photoresist processing, Critical dimension metrology, Polymer thin films, Etching, Lithographic illumination, Polymerization

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Proceedings Article | 11 April 2006 Paper

Paper

Performance of a dry 193nm resist under wet conditions

Munirathna Padmanaban, Andrew Romano, Guanyang Lin, Simon Chiu, Allen Timko, Frank Houlihan, Dalil Rahman, S. Chakrapani, T. Kudo, Ralph Dammel, Karen Turnquest, Georgia Rich, Scott Schuetter, Timothy Shedd, Gregory Nellis

Proceedings Volume 6153, 615307 (2006) https://doi.org/10.1117/12.659392

KEYWORDS: Thin film coatings, Lithography, Polymers, Line edge roughness, Semiconducting wafers, Photoresist processing, Line width roughness, Immersion lithography, Photoresist materials, Fourier transforms

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Proceedings Article | 29 March 2006 Paper

Paper

Versatility in lithographic performance of advanced 193 nm contact hole resist

Takanori Kudo, Guanyang Lin, Dongkwan Lee, Dalil Rahman, Allen Timko, Douglas Mckenzie, Clement Anyadiegwu, Simon Chiu, Frank Houlihan, David Rentkiewicz, Ralph Dammel, Munirathna Padmanaban, John Biafore

Proceedings Volume 6153, 61532C (2006) https://doi.org/10.1117/12.659439

KEYWORDS: Polymers, Lithography, Semiconducting wafers, Photomasks, Resolution enhancement technologies, Photoresist processing, Electroluminescence, Critical dimension metrology, Scanning electron microscopy, Etching

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Proceedings Article | 29 March 2006 Paper

Paper

Study of the effect of amine additives on LWR and LER

Francis Houlihan, David Rentkiewicz, Guanyang Lin, Dalil Rahman, Douglas Mackenzie, Allen Timko, Takanori Kudo, Clement Anyadiegwu, Muthiah Thiyagarajan, Simon Chiu, Andrew Romano, Ralph Dammel, Munirathna Padmanaban

Proceedings Volume 6153, 615317 (2006) https://doi.org/10.1117/12.659465

KEYWORDS: Line edge roughness, Line width roughness, Polymers, Semiconducting wafers, Lithography, Transistors, Diffusion, Photoresist processing, Critical dimension metrology, Control systems

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SPIE Journal Paper | 1 October 2005

Surface roughness investigation of 157- and 193-nm polymer platforms using different etch conditions

Christoph Hohle, Nicole Heckmann, Michael Sebald, Matthias Markert, Nickolay Stepanenko, Francis Houlihan, Andrew Romano, Raj Sakamuri, David Rentkiewicz, Ralph Dammel

JM3, Vol. 4, Issue 04, 043009, (October 2005) https://doi.org/10.1117/12.10.1117/1.2131101

KEYWORDS: Etching, Polymers, Surface roughness, Fluorine, Plasmas, Scanning electron microscopy, Resistance, Oxides, Plasma etching, Chlorine

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Proceedings Article | 4 May 2005 Paper

Paper

Study of 157 nm resists with full field exposure tools

Yayi Wei, Nickolay Stepanenko, Michael Sebald, Christoph Hohle, Francis Houlihan, Raj Sakamuri, Alla Dimerli, Andrew Romano, Ralph Dammel

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601811

KEYWORDS: Thin film coatings, Coating, Binary data, Photomasks, Lithography, Phase shifts, Semiconducting wafers, Contamination, Deep ultraviolet, Absorbance

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Proceedings Article | 4 May 2005 Paper

Paper

Study of barrier coats for application in immersion 193-nm lithography

Francis Houlihan, Wookyu Kim, Raj Sakamuri, Keino Hamilton, Alla Dimerli, David Abdallah, Andrew Romano, Ralph Dammel, Georg Pawlowski, Alex Raub, Steve Brueck

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601768

KEYWORDS: Thin film coatings, Lithography, Immersion lithography, Interferometry, Semiconducting wafers, Water, Refractive index, Contamination, Doping, Lithium

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Proceedings Article | 4 May 2005 Paper

Paper

Resist component leaching in 193-nm immersion lithography

Ralph Dammel, Georg Pawlowski, Andrew Romano, Frank Houlihan, Woo-Kyu Kim, Raj Sakamuri, David Abdallah

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600782

KEYWORDS: Photoresist materials, Semiconducting wafers, Immersion lithography, Systems modeling, Lithography, Interfaces, Diffusion, Photoresist developing, Coating, Data modeling

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Proceedings Article | 4 May 2005 Paper

Paper

193nm dual layer organic BARCs for high NA immersion lithography

David Abdallah, Mark Neisser, Ralph Dammel, Georg Pawlowski, S. Ding, Francis Houlihan, Andrew Romano, J. Biafore, Alex Raub

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600736

KEYWORDS: Fourier transforms, Reflectivity, Lithography, Etching, Bottom antireflective coatings, Multilayers, Antireflective coatings, Semiconducting wafers, Stereolithography, 193nm lithography

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Proceedings Article | 4 May 2005 Paper

Paper

Study of barrier coats for protection against airborne contamination in 157-nm lithography

Francis Houlihan, Raj Sakamuri, Keino Hamilton, Alla Dimerli, David Rentkiewicz, Andrew Romano, Ralph Dammel, Yayi Wei, Nickolay Stepanenko, Michael Sebald, Christoph Hohle, Will Conley, Daniel Miller, Toshiro Itani, Masato Shigematsu, Etsuro Kawaguchi

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601810

KEYWORDS: Thin film coatings, Coating, Contamination, Scanning electron microscopy, Semiconducting wafers, Binary data, Photomasks, Lithography, Deep ultraviolet, Phase shifts

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Proceedings Article | 14 May 2004 Paper

Paper

Recent advances in fluorinated resists for application at 157 nm

Francis Houlihan, Raj Sakamuri, Andrew Romano, David Rentkiewicz, Ralph Dammel, Willard Conley, Daniel Miller, Michael Sebald, Nickolay Stepanenko, Matthias Markert, Uta Mierau, Inge Vermeir, Christoph Hohle, Toshiro Itani, Masato Shigematsu, Etsurou Kawaguchi

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537541

KEYWORDS: Transparency, Etching, Absorbance, Photomasks, Lithography, Resistance, Pellicles, Binary data, Silicon, Polymers

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Proceedings Article | 14 May 2004 Paper

Paper

A study on the dissolution inhibition of poly norbornene hexafluoroisopropanol in aqueous base solutions

Medhat Toukhy, Joseph Oberlander, Dalil Rahman, Francis Houlihan

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537077

KEYWORDS: Polymers, Hydrogen, Molecules, Lithography, 193nm lithography, Molybdenum, Absorption, Silicon, Semiconducting wafers, Solids

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Proceedings Article | 12 June 2003 Paper

Paper

Evaluation of novel fluorinated resist matrices for 157-nm lithography

Francis Houlihan, Andrew Romano, David Rentkiewicz, Raj Sakamuri, Ralph Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joseph McDaniels, Chun Chang

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485195

KEYWORDS: Etching, Rutherfordium, Polymers, Absorbance, Lithography, Fluorine, Resistance, Oxides, Transparency, Plasma etching

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Proceedings Article | 12 June 2003 Paper

Paper

Evaluation of fluorinated dissolution inhibitors for 157-nm lithography

Alyssandrea Hamad, Francis Houlihan, Larry Seger, Chun Chang, Christopher Ober

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485099

KEYWORDS: Etching, Polymers, Hydrogen, Photoresist materials, Distributed interactive simulations, Polymethylmethacrylate, FT-IR spectroscopy, Neodymium, Lithography, Sodium

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Proceedings Article | 12 June 2003 Paper

Paper

Baking study of fluorinated 157-nm resist

Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joseph McDaniels, Chun Chang

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485196

KEYWORDS: Diffusion, Temperature metrology, Rutherfordium, Binary data, Annealing, Lithography, Chemically amplified resists, Image quality, Plasma etching, Resistance

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Proceedings Article | 24 July 2002 Paper

Paper

Fluorinated dissolution inhibitors for 157-nm lithography

Alyssandrea Hamad, Young Bae, Xiang-Qian Liu, Christopher Ober, Francis Houlihan, Gary Dabbagh, Anthony Novembre

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474245

KEYWORDS: Polymers, FT-IR spectroscopy, Absorbance, Photoresist materials, Lithography, Polymethylmethacrylate, Polymer thin films, Distributed interactive simulations, Absorption, Silicon

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Proceedings Article | 24 August 2001 Paper

Paper

Lithographic behavior of carboxylate-based dissolution inhibitors and the effect of blending

Francis Houlihan, Zhenglin Yan, Elsa Reichmanis, Gary Dabbagh, Kevin Bolan, Omkaram Nalamasu, Ilya Rushkin, Ognian Dimov

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436904

KEYWORDS: Lithography, Polymers, Molecules, Solids, Semiconducting wafers, Image resolution, Silicon films, Prototyping, Chemically amplified resists, Analog electronics

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Proceedings Article | 24 August 2001 Paper

Paper

Base additives for use in a single layer 193-nm resist based upon poly(norbornene/maleic anhydride/acrylic acid/tert-butyl acrylate)

Francis Houlihan, Donna Person, Omkaram Nalamasu, Ilya Rushkin, Ognian Dimov, Elsa Reichmanis

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436912

KEYWORDS: Lithography, Hassium, Chemically amplified resists, Polymers, Chromophores, Information operations, Picosecond phenomena, Standards development, Calcium, Nomenclature

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Proceedings Article | 23 June 2000 Paper

Paper

Solid-state NMR characterization of resist formulations for 193-nm lithography: chain dynamics and length scale of mixing

Peter Mirau, Sharon Heffner, Ilya Rushkin, Francis Houlihan

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388370

KEYWORDS: Polymers, Carbon, Lithography, Diffusion, Polarization, Solid state electronics, Solid state physics, Temperature metrology, Optical lithography, Photoresist processing

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Proceedings Article | 23 June 2000 Paper

Paper

Surface composition of a norbornene-maleic-anhydride-based 193-nm photoresists for different photoacid generators as determined by x-ray photoelectron spectroscopy

Henry Krautter, Francis Houlihan, Richard Hutton, Ilya Rushkin, R. Opila

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388298

KEYWORDS: Fluorine, Photoresist materials, X-rays, Diffusion, Photoemission spectroscopy, Chemical species, Arsenic, Chemical elements, Backscatter, Spectroscopy

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Proceedings Article | 23 June 2000 Paper

Paper

Model study by FT-IR and 13C NMR of the interaction of poly(norbornene-alt-maleic anhydride) and its derivatives with select cholate dissolution inhibitors or with select iodonium and sulfonium phot

Gary Dabbagh, Francis Houlihan, Ilya Rushkin, Richard Hutton, Omkaram Nalamasu, Elsa Reichmanis, Zhenglin Yan, Arnost Reiser

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388265

KEYWORDS: Distributed interactive simulations, Clouds, Polymers, Hydrogen, FT-IR spectroscopy, Spectroscopy, Medium wave, Photoresist materials, Bismuth, Silver

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Proceedings Article | 23 June 2000 Paper

Paper

Dissolution properties of cycloolefin-maleic-anhydride-based resist resins

Ilya Rushkin, Francis Houlihan, Janet Kometani, Richard Hutton, Omkaram Nalamasu, Elsa Reichmanis, Ognian Dimov, Arturo Medina, Ulrike Varlemann, Allen Gabor, T. Sarrubi, Murrae Bowden

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388305

KEYWORDS: Polymers, Polymerization, Lithography, Molecules, Standards development, Photoresist processing, Dry etching, Resistance, Printing, Modulation

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Proceedings Article | 23 June 2000 Paper

Paper

Mechanism of single-layer 193-nm dissolution inhibition resist

Zhenglin Yan, Francis Houlihan, Elsa Reichmanis, Omkaram Nalamasu, Arnost Reiser, Gary Dabbagh, Richard Hutton, Dan Osei, Jose Sousa, Kevin Bolan

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388275

KEYWORDS: Ions, Polymers, Clouds, Polymer thin films, Switches, Medium wave, Molecules, Imaging systems, Spectroscopy, Hydrogen

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Proceedings Article | 23 June 2000 Paper

Paper

Modeling chemically amplified resists for 193-nm lithography

Ebo Croffie, Mosong Cheng, Andrew Neureuther, Francis Houlihan, Raymond Cirelli, James Sweeney, Gary Dabbagh, Pat Watson, Omkaram Nalamasu, Ilya Rushkin, Ognian Dimov, Allen Gabor

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388300

KEYWORDS: Diffusion, Data modeling, FT-IR spectroscopy, Chemically amplified resists, Semiconducting wafers, Absorbance, Photolysis, Polymers, Lithography, Interfaces

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Proceedings Article | 11 June 1999 Paper

Paper

Model study by FT-IR of the interaction of select cholate dissolution inhibitors with poly(norbornene-alt-maleic anhydride) and its derivatives

Gary Dabbagh, Francis Houlihan, Ilya Rushkin, Richard Hutton, Omkaram Nalamasu, Elsa Reichmanis, Allen Gabor, Arturo Medina

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350155

KEYWORDS: Polymers, Hydrogen, FT-IR spectroscopy, Absorption, Molecules, Molecular interactions, Spectroscopy, Polymer thin films, Fourier spectroscopy, Lithography

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Proceedings Article | 11 June 1999 Paper

Paper

New polymers for 193-nm single-layer resists based on substituted cycloolefins/maleic anhydride resins

Ilya Rushkin, Francis Houlihan, Janet Kometani, Richard Hutton, Allen Timko, Elsa Reichmanis, Omkaram Nalamasu, Allen Gabor, Arturo Medina, Sydney Slater, Mark Neisser

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350241

KEYWORDS: Polymers, Lithography, Etching, Polymerization, Plasma etching, Silicon, Resistance, Ultraviolet radiation, Plasma, Argon

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Proceedings Article | 11 June 1999 Paper

Paper

Resist outgassing as a function of differing photoadditives

Francis Houlihan, Ilya Rushkin, Richard Hutton, Allen Timko, Omkaram Nalamasu, Elsa Reichmanis, Allen Gabor, Arturo Medina, Sanjay Malik, M. Neiser, Roderick Kunz, Deanna Downs

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350209

KEYWORDS: Lithography, Chromophores, Photolysis, NOx, Polymers, Diffusion, Quartz, Electron beam lithography, Deep ultraviolet, Ultraviolet radiation

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Proceedings Article | 11 June 1999 Paper

Paper

Optimization of 193-nm single-layer resists through statistical design

Allen Gabor, Ognian Dimov, Arturo Medina, Mark Neisser, Sydney Slater, Ruey Wang, Francis Houlihan, Raymond Cirelli, Gary Dabbagh, Richard Hutton, Ilya Rushkin, James Sweeney, Allen Timko, Omkaram Nalamasu, Elsa Reichmanis

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350205

KEYWORDS: Polymers, Lithography, Binary data, Distributed interactive simulations, Etching, Resistance, Photomasks, Diffusion, Silicon, Semiconducting wafers

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Proceedings Article | 11 June 1999 Paper

Paper

Toward the ultimate storage device: the fabrication of an ultrahigh-density memory device with 193-nm lithography

Raymond Cirelli, J. Bude, William Mansfield, G. Timp, Fred Klemens, Pat Watson, Gary Weber, James Sweeney, Francis Houlihan, Allen Gabor, Fred Baumann, M. Buonanno, G. Forsyth, D. Barr, T. Lee, C. Rafferty, Richard Hutton, Allen Timko, J. Hergenrother, Elsa Reichmanis, Lloyd Harriott, S. Hillenius, Omkaram Nalamasu

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350213

KEYWORDS: Etching, Photomasks, Lithography, Diffusion, Semiconducting wafers, Phase shifts, 193nm lithography, Photoresist materials, Silicon, Chemically amplified resists

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Proceedings Article | 29 June 1998 Paper

Paper

193-nm single-layer photoresists based on alternating copolymers of cycloolefins: the use of photogenerators of sulfamic acids

Francis Houlihan, Janet Kometani, Allen Timko, Richard Hutton, Raymond Cirelli, Elsa Reichmanis, Omkaram Nalamasu, Allen Gabor, Arturo Medina, John Biafore, Sydney Slater

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312462

KEYWORDS: Diffusion, Lithography, Scanning electron microscopy, Polymers, Photoresist materials, Solids, Crystals, Semiconducting wafers, Chemically amplified resists, Sodium

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Proceedings Article | 29 June 1998 Paper

Paper

Recent advances in increasing the thermal flow resistance of acetal derivatized polyhydroxystyrene deep-UV matrix resins

Janet Kometani, Francis Houlihan, Allen Timko, Omkaram Nalamasu, Elsa Reichmanis, Sharon Heffner, Mary Galvin-Donoghue

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312466

KEYWORDS: Polymers, Lithography, Solids, Resistance, Ion exchange, Lithium, Deep ultraviolet, Liquids, Scanning electron microscopy, Matrices

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Proceedings Article | 7 July 1997 Paper

Paper

Recent advances in 193-nm single-layer photoresists based on alternating copolymers of cycloolefins

Francis Houlihan, Thomas Wallow, Allen Timko, E. Neria, Richard Hutton, Raymond Cirelli, Omkaram Nalamasu, Elsa Reichmanis

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275856

KEYWORDS: Polymers, Resistance, Photoresist materials, Lithography, Standards development, Analog electronics, Deep ultraviolet, Spectroscopy, Solids, Scanning electron microscopy

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Proceedings Article | 7 July 1997 Paper

Paper

Overview of photoacid generator design for acetal resist systems

Francis Houlihan, Omkaram Nalamasu, Elsa Reichmanis, Allen Timko, Ulrike Varlemann, Thomas Wallow, N. Bantu, John Biafore, Thomas Sarubbi, Pasquale Falcigno, H. Kirner, Norbert Muenzel, Klaus Petschel, Hans-Thomas Schacht, Reinhard Schulz

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275848

KEYWORDS: Lithography, Quantum efficiency, Absorbance, Polymers, Microelectronics, Chemically amplified resists, Semiconducting wafers, Chromophores, Silver, Chemistry

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Proceedings Article | 7 July 1997 Paper

Paper

Design and process of a new DUV ARCH3 resist

N. Bantu, Brian Maxwell, Arturo Medina, Thomas Sarubbi, Medhat Toukhy, Hans-Thomas Schacht, Pasquale Falcigno, Norbert Muenzel, Klaus Petschel, Francis Houlihan, Omkaram Nalamasu, Allen Timko

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275833

KEYWORDS: Polymers, Photoresist materials, Deep ultraviolet, Lithography, Photoresist processing, Chemistry, Photoresist developing, Scanning electron microscopy, Glasses, Resolution enhancement technologies

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Proceedings Article | 14 June 1996 Paper

Paper

Evaluation of cycloolefin-maleic anhydride alternating copolymers as single-layer photoresists for 193-nm photolithography

Thomas Wallow, Francis Houlihan, Omkaram Nalamasu, Edwin Chandross, Thomas Neenan, Elsa Reichmanis

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241834

KEYWORDS: Lithography, Photoresist materials, Distributed interactive simulations, Optical lithography, Resistance, Etching, Polymers, Silicon, Carbon, Deep ultraviolet

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Proceedings Article | 16 May 1994 Paper

Paper

Photogenerated acid-catalyzed formation of phosphonic/phosphoric acids by deprotection of esters

Marcia Schilling, Howard Katz, Francis Houlihan, Janet Kometani, Susan Stein, Omkaram Nalamasu

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175335

KEYWORDS: Polymers, Metals, Zirconium, Lithography, Nickel, Ions, Spectroscopy, Silicon, Semiconducting wafers, Etching

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Proceedings Article | 16 May 1994 Paper

Paper

Synthesis, characterization, and lithography of alpha-substituted 2-nitrobenzyl arylsulfonate photo-acid generators with improved resistance to post exposure bake

Francis Houlihan, Evelyn Chin, Omkaram Nalamasu, Janet Kometani, Thomas Neenan, A. Pangborne

Proceedings Volume 2195, (1994) https://doi.org/10.1117/12.175331

KEYWORDS: Chromophores, Lithography, Quantum efficiency, Absorbance, Oxygen, Ultraviolet radiation, Resistance, Tolerancing, Temperature metrology, Polymers

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Proceedings Article | 1 June 1991 Paper

Paper

Preliminary lithographic characteristics of an all-organic chemically amplified resist formulation for single-layer deep-UV lithography

Omkaram Nalamasu, Elsa Reichmanis, May Cheng, Victor Pol, Janet Kometani, Francis Houlihan, Thomas Neenan, M. Bohrer, David Mixon, Larry Thompson, Clifford Takemoto

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46355

KEYWORDS: Deep ultraviolet, Lithography, Chemically amplified resists, Photoresist processing, Polymers, Image enhancement, Head-mounted displays, Prototyping, Environmental sensing, Scanning electron microscopy

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Showing 5 of 42 publications

Proceedings Volume Editor (2)

SPIE Conference Volume | 24 August 2001

Advances in Resist Technology and Processing XVIII

SPIE Conference Volume | 23 June 2000

Advances in Resist Technology and Processing XVII

Conference Committee Involvement (3)

Advances in Resist Technology and Processing XX

24 February 2003 | Santa Clara, California, United States

Advances in Resist Technology and Processing XVIII

26 February 2001 | Santa Clara, CA, United States

Advances in Resist Technology and Processing XVII

28 February 2000 | Santa Clara, CA, United States

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