Dr. Nabila Baba-Ali Profile

Dr. Nabila Baba-Ali

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Publications (4)

Proceedings Article | 24 March 2006 Paper

Achieving mask-based imaging with optical maskless lithography

Elizabeth Stone, Jason Hintersteiner, Wenceslao Cebuhar, Ronald Albright, Nicholas Eib, Azat Latypov, Nabila Baba-Ali, Sherman Poultney, Ebo Croffie

Proceedings Volume 6151, 61512E (2006) https://doi.org/10.1117/12.658690

KEYWORDS: Spatial light modulators, Mirrors, Photomasks, Optical proximity correction, Transistors, Maskless lithography, Calibration, Optimization (mathematics), Semiconducting wafers, Diffraction

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Proceedings Article | 6 May 2005 Paper

Optical rasterization algorithms for contrast devices utilizing different physical modulation principles in optical maskless lithography

Azat Latypov, Ronald Albright, Nabila BabaAli, Wenceslao Cebuhar, Jason Hintersteiner, Elizabeth Stone

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600241

KEYWORDS: Mirrors, Spatial light modulators, Modulation, Photomasks, Diffraction, Maskless lithography, Nanoimprint lithography, Transmittance, Semiconducting wafers, Critical dimension metrology

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Proceedings Article | 17 December 2003 Paper

Application of rigorous electromagnetic simulation to SLM-based maskless lithography for 65-nm node

Ebo Croffie, Nick Eib, Neal Callan, Nabila Baba-Ali, Azat Latypov, Jason Hintersteiner, Torbjorn Sandstrom, Arno Bleeker, Kevin Cummings

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518747

KEYWORDS: Mirrors, Spatial light modulators, Diffraction, Light scattering, Maskless lithography, Near field, Electromagnetism, Photomasks, Imaging systems, Electromagnetic scattering

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Proceedings Article | 26 June 2003 Paper

Overcoming the resolution challenge using special illumination techniques to print 50/50-nm nested contact holes at 157-nm wavelength

Nabila Baba-Ali, Harry Sewell, Justin Kreuzer

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485328

KEYWORDS: Polarization, Lithographic illumination, Printing, Extreme ultraviolet, Photomasks, Nanoimprint lithography, Image quality, Immersion lithography, Diffraction, Lithography

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