Mr. Naoki Fukuda Profile

Naoki Fukuda

at Advantest Corp

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Author

Publications (3)

Proceedings Article | 9 September 2013 Paper

SEM image quality enhancement technology for bright field mask

Naoki Fukuda, Yuta Chihara, Soichi Shida, Keisuke Ito

Proceedings Volume 8880, 88801C (2013) https://doi.org/10.1117/12.2029786

KEYWORDS: Scanning electron microscopy, Photomasks, Optical lithography, Selenium, Line scan image sensors, Metrology, Opacity, Glasses, Sensors, Image quality

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Proceedings Article | 28 June 2013 Paper

Photomask quality evaluation using lithography simulation and multi-detector MVM-SEM

Keisuke Ito, Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Kazuyuki Hagiwara, Daisuke Hara

Proceedings Volume 8701, 87010A (2013) https://doi.org/10.1117/12.2027201

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, 3D image processing, 3D metrology, Defect inspection, Optical inspection, Databases, Inspection

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Proceedings Article | 8 November 2012 Paper

Photomask quality evaluation using lithography simulation and precision SEM image contour data

Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Kazuyuki Hagiwara, Shohei Matsushita, Daisuke Hara, Anthony Adamov

Proceedings Volume 8522, 852226 (2012) https://doi.org/10.1117/12.964994

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, Image quality, Sensors, Signal detection, Databases, 3D metrology, Inspection

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