Mr. Toshimichi Iwai Profile

Toshimichi Iwai

Senior Vice President at Nanotechnology Business Group Advantest Corp

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Author

Publications (14)

Proceedings Article | 21 November 2023 Presentation + Paper

Optimizing CD-SEM metrology for anamorphic high-NA EUV photomasks

Deepan Kishore Kumar, Varun Mohan, Hatsey Frezghi, Adam Seeger, Malahat Tavassoli, Masayuki Kuribara, Kiyoshi Oura, Wataru Ito, Soichi Shida, Tatsuro Okawa, Mark Sheppard, Toshimichi Iwai

Proceedings Volume 12751, 127510R (2023) https://doi.org/10.1117/12.2687660

KEYWORDS: Metrology, Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Photomasks, Optical proximity correction, Reticles

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Proceedings Article | 5 October 2023 Paper

High-performance computing architecture (HW/SW) for mask CDSEM design based metrology

Tatsuro Okawa, Yusuke Kakinuma, Yoshiaki Ogiso, Naoyuki Tanaka, Kazuo Mukawa, Soichi Shida, Shinichi Kojima, Toshimichi Iwai

Proceedings Volume 12802, 128020D (2023) https://doi.org/10.1117/12.2675545

KEYWORDS: Image processing, Metrology, Design and modelling, Computer hardware, Image processing software, Scanning electron microscopy, Contour extraction, Parallel processing, Computing systems, Lithography

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Proceedings Article | 28 June 2013 Paper

A study of phase defect measurement on EUV mask by multiple detectors CD-SEM

Isao Yonekura, Hidemitsu Hakii, Shinya Morisaki, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 8701, 870110 (2013) https://doi.org/10.1117/12.2031846

KEYWORDS: 3D metrology, Sensors, 3D image processing, Atomic force microscopy, 3D vision, 3D acquisition, Extreme ultraviolet, Scanning electron microscopy, Phase measurement, Electron beams

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Proceedings Article | 28 June 2013 Paper

Photomask quality evaluation using lithography simulation and multi-detector MVM-SEM

Keisuke Ito, Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Kazuyuki Hagiwara, Daisuke Hara

Proceedings Volume 8701, 87010A (2013) https://doi.org/10.1117/12.2027201

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, 3D image processing, 3D metrology, Defect inspection, Optical inspection, Databases, Inspection

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Proceedings Article | 8 November 2012 Paper

Photomask quality evaluation using lithography simulation and precision SEM image contour data

Tsutomu Murakawa, Naoki Fukuda, Soichi Shida, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Kazuyuki Hagiwara, Shohei Matsushita, Daisuke Hara, Anthony Adamov

Proceedings Volume 8522, 852226 (2012) https://doi.org/10.1117/12.964994

KEYWORDS: Photomasks, Lithography, Scanning electron microscopy, Semiconducting wafers, Image quality, Sensors, Signal detection, Databases, 3D metrology, Inspection

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Proceedings Article | 30 June 2012 Paper

New CDSEM technology and its performance for multiple patterning process

Yuta Chihara, Keisuke Ito, Masayuki Kuribara, Toshimichi Iwai, Soichi Shida, Masahiro Seyama, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 8441, 844109 (2012) https://doi.org/10.1117/12.964404

KEYWORDS: Scanning electron microscopy, Photomasks, Metrology, Electron beam lithography, Line scan image sensors, Electron beams, Lithography, Semiconductors, Capacitance, Absorption

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Proceedings Article | 14 October 2011 Paper

Addressing 3D metrology challenges by using a multiple detector CDSEM

Mitsuo Hiroyama, Tsutomu Murakawa, Masayuki Kuribara, Toshimichi Iwai, Minoru Soma, Ikuo Iko, Masahiro Seyama, Jun Matsumoto, Takayuki Nakamura, Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Kenji Komoto

Proceedings Volume 8166, 81661R (2011) https://doi.org/10.1117/12.896982

KEYWORDS: Sensors, Signal detection, 3D metrology, Photomasks, Atomic force microscopy, Lithography, Scanning electron microscopy, Image sensors, Edge detection, Extreme ultraviolet

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Proceedings Article | 19 May 2011 Paper

New CD-SEM metrology method for the side wall angle measurement using multiple detectors

Hiroshi Fukaya, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura, Hidemitsu Hakii, Isao Yonekura, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Yasutaka Kikuchi

Proceedings Volume 8081, 80810G (2011) https://doi.org/10.1117/12.899368

KEYWORDS: Sensors, Signal detection, Photomasks, Algorithm development, 3D metrology, Polonium, Metrology, Scanning electron microscopy, Electron beams, Detection and tracking algorithms

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Proceedings Article | 20 April 2011 Paper

Study of the three-dimensional shape measurement for mask patterns using Multiple Detector CD-SEM

Isao Yonekura, Hidemitsu Hakii, Masashi Kawashita, Yasushi Nishiyama, Keishi Tanaka, Yasutaka Kikuchi, Tsutomu Murakawa, Soichi Shida, Masayuki Kuribara, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7971, 797121 (2011) https://doi.org/10.1117/12.879400

KEYWORDS: Sensors, Atomic force microscopy, Signal detection, Photomasks, Etching, 3D metrology, Tantalum, Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet

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Proceedings Article | 25 September 2010 Paper

A new CDSEM metrology method for thin film hardmasks patterns using multiple detectors

Sumito Harada, Yuta Chihara, Motoji Hirano, Toshi Iwai, Masayuki Kuribara, Ikuo Iko, Masahiro Seyama, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7823, 78233H (2010) https://doi.org/10.1117/12.864171

KEYWORDS: Sensors, Thin films, Detection and tracking algorithms, Algorithm development, Metrology, Double patterning technology, Electron beams, Scanning electron microscopy, Photomasks, Binary data

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Proceedings Article | 27 May 2010 Paper

The large contour data generation from divided image of photomask pattern of 32 nm and beyond

Tsutomu Murakawa, Yoshiaki Ogiso, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7748, 77481A (2010) https://doi.org/10.1117/12.866056

KEYWORDS: Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Data acquisition, Data conversion, Imaging arrays, Data modeling, Algorithm development, Distortion

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Proceedings Article | 23 September 2009 Paper

A study of contour image comparison measurement for photomask patterns of 32 nm and beyond

Isao Yonekura, Hidemitsu Hakii, Keishi Tanaka, Masaru Higuchi, Yoshiaki Ogiso, Toshihide Oba, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura

Proceedings Volume 7488, 748831 (2009) https://doi.org/10.1117/12.833405

KEYWORDS: Photomasks, Distance measurement, Scanning electron microscopy, Cadmium, Critical dimension metrology, Image enhancement, Printing, Semiconducting wafers, Reticles, Software development

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Proceedings Article | 18 March 2009 Paper

Evaluation of the CD-SEM Vistec LWM90xx for line-width measurement of nanoimprint templates

Marcus Pritschow, Joerg Butschke, Mathias Irmscher, Lidia Parisoli, Toshihide Oba, Toshimichi Iwai, Takayuki Nakamura

Proceedings Volume 7271, 72711U (2009) https://doi.org/10.1117/12.814161

KEYWORDS: Quartz, Scanning electron microscopy, Photomasks, Contamination, Process control, Optical lithography, Nanoimprint lithography, Etching, Control systems, Metrology

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Proceedings Article | 17 October 2008 Paper

A study of the limited area scanning system in the mask CD-SEM

Toshi Iwai, Soichi Shida, Mitsuo Hiroyama, Takayuki Nakamura, Hisaya Sakaguchi, Hiroki Ueno, Masaru Higuchi, Tatsuya Aihara

Proceedings Volume 7122, 71222R (2008) https://doi.org/10.1117/12.801418

KEYWORDS: Scanning electron microscopy, Photomasks, Critical dimension metrology, Electron beams, Metrology, Electron microscopes, Process control, OLE for process control, Image resolution, Beam controllers

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Showing 5 of 14 publications

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