Dr. Philipp Hönicke
at Physikalisch-Technische Bundesanstalt
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 27 April 2023 Presentation + Paper
Philipp Hönicke, Yves Kayser, Victor Soltwisch, Andre Wählisch, Nils Wauschkuhn, Jeroen Scheerder, Claudia Fleischmann, Janusz Bogdanowicz, Anne-Laure Charley, Anabela Veloso, Roger Loo, Hans Mertens, Andriy Hikavyy, Thomas Siefke, Anna Andrle, Grzegorz Gwalt, Frank Siewert, Richard Ciesielski, Burkhard Beckhoff
Proceedings Volume 12496, 124961J (2023) https://doi.org/10.1117/12.2657963
KEYWORDS: Nanostructures, X-ray fluorescence spectroscopy, Metrology, Semiconductors, Fluorescence intensity, Data modeling, Transmission electron microscopy, Small targets

Proceedings Article | 27 April 2023 Presentation + Paper
Richard Ciesielski, Leonhard Lohr, Hans Mertens, Anne-Laure Charley, Rudi de Ruyter, Janusz Bogdanowicz, Philipp Hönicke, Najmeh Abbasirad, Victor Soltwisch
Proceedings Volume 12496, 124961M (2023) https://doi.org/10.1117/12.2658501
KEYWORDS: Extreme ultraviolet, Scatterometry, Data modeling, Diffraction, Nanostructures, X-rays, Finite element methods, Scattering

Proceedings Article | 21 June 2021 Presentation + Paper
Zanyar Salami, Analía Fernández Herrero, Anna Andrle, Philipp Hönicke, Victor Soltwisch
Proceedings Volume 11783, 1178307 (2021) https://doi.org/10.1117/12.2592611
KEYWORDS: Line edge roughness, Line width roughness, Nanostructures, X-ray fluorescence spectroscopy, X-rays, Oxides, Scatterometry, Grazing incidence, Finite element methods

Proceedings Article | 22 February 2021 Presentation
Anna Andrle, Philipp Hönicke, Grzegorz Gwalt, Philipp-Immanuel Schneider, Yves Kayser, Frank Siewert, Victor Soltwisch
Proceedings Volume 11611, 116110R (2021) https://doi.org/10.1117/12.2586082
KEYWORDS: Nanostructures, Metrology, Machine learning, X-rays, X-ray optics, X-ray fluorescence spectroscopy, Statistical analysis, Semiconducting wafers, Reflectivity, Nondestructive evaluation

Proceedings Article | 4 November 2020 Presentation + Paper
Rik Jonckheere, Chien-Ching Wu, Veronique de Rooij-Lohmann, Dorus Elstgeest, Henk Lensen, Philipp Hönicke, Michael Kolbe, Victor Soltwisch, Claudia Zech, Frank Scholze, Remko Aubert, Vineet Nair, Eric Hendrickx
Proceedings Volume 11517, 115170Z (2020) https://doi.org/10.1117/12.2573125
KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Ruthenium, Scanners, Contamination, Integrated circuits, Semiconductors, X-rays

Showing 5 of 7 publications
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