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Raheleh Pishkari
at ASML Netherlands BV
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Publications (1)
Proceedings Article | 20 March 2020 Paper
Improving after-etch overlay performance using high-density in-device metrology in DRAM manufacturing
Ik-Hyun Jeong, Seung-Woo Koo, Hyun-Sok Kim, Jung-Il Hwang, Dong-Jin Lee, Min-Shik Kim, Jae-Wuk Ju, Kang-Min Lee, Young-Sik Kim, Cees Lambregts, Rizvi Rahman, Marc Hauptmann, Raheleh Pishkari, Allwyn Boustheen, Kwang-Young Hu, Paul Böcker, Dong-Hak Lee, In-Ho Joo, Kang-San Lee
Proceedings Volume 11325, 113252X (2020) https://doi.org/10.1117/12.2552028
KEYWORDS: Overlay metrology, Etching, Inspection, Semiconducting wafers, Metrology, Feedback loops, Scanners, Spatial frequencies, High volume manufacturing
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