Dr. Raj Sakamuri Profile

Dr. Raj Sakamuri

Sr. Research Chemist at FUJIFILM Electronic Materials USA Inc

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Author

Publications (11)

SPIE Journal Paper | 1 October 2005

Surface roughness investigation of 157- and 193-nm polymer platforms using different etch conditions

Christoph Hohle, Nicole Heckmann, Michael Sebald, Matthias Markert, Nickolay Stepanenko, Francis Houlihan, Andrew Romano, Raj Sakamuri, David Rentkiewicz, Ralph Dammel

JM3, Vol. 4, Issue 04, 043009, (October 2005) https://doi.org/10.1117/12.10.1117/1.2131101

KEYWORDS: Etching, Polymers, Surface roughness, Fluorine, Plasmas, Scanning electron microscopy, Resistance, Oxides, Plasma etching, Chlorine

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Proceedings Article | 4 May 2005 Paper

Resist component leaching in 193-nm immersion lithography

Ralph Dammel, Georg Pawlowski, Andrew Romano, Frank Houlihan, Woo-Kyu Kim, Raj Sakamuri, David Abdallah

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600782

KEYWORDS: Photoresist materials, Semiconducting wafers, Immersion lithography, Systems modeling, Lithography, Interfaces, Diffusion, Photoresist developing, Coating, Data modeling

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Proceedings Article | 4 May 2005 Paper

Effect of hard bake process on LER

Munirathna Padmanaban, David Rentkiewicz, SangHo Lee, Chisun Hong, Dongkwan Lee, Dalil Rahman, Raj Sakamuri, Ralph Dammel

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.604401

KEYWORDS: Line edge roughness, Photoresist processing, Polymers, Line width roughness, Semiconducting wafers, Critical dimension metrology, Cadmium, Chemically amplified resists, Transistors, Optical lithography

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Proceedings Article | 4 May 2005 Paper

Study of 157 nm resists with full field exposure tools

Yayi Wei, Nickolay Stepanenko, Michael Sebald, Christoph Hohle, Francis Houlihan, Raj Sakamuri, Alla Dimerli, Andrew Romano, Ralph Dammel

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601811

KEYWORDS: Thin film coatings, Coating, Binary data, Photomasks, Lithography, Phase shifts, Semiconducting wafers, Contamination, Deep ultraviolet, Absorbance

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Proceedings Article | 4 May 2005 Paper

Study of barrier coats for application in immersion 193-nm lithography

Francis Houlihan, Wookyu Kim, Raj Sakamuri, Keino Hamilton, Alla Dimerli, David Abdallah, Andrew Romano, Ralph Dammel, Georg Pawlowski, Alex Raub, Steve Brueck

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601768

KEYWORDS: Thin film coatings, Lithography, Immersion lithography, Interferometry, Semiconducting wafers, Water, Refractive index, Contamination, Doping, Lithium

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Proceedings Article | 4 May 2005 Paper

Study of barrier coats for protection against airborne contamination in 157-nm lithography

Francis Houlihan, Raj Sakamuri, Keino Hamilton, Alla Dimerli, David Rentkiewicz, Andrew Romano, Ralph Dammel, Yayi Wei, Nickolay Stepanenko, Michael Sebald, Christoph Hohle, Will Conley, Daniel Miller, Toshiro Itani, Masato Shigematsu, Etsuro Kawaguchi

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601810

KEYWORDS: Thin film coatings, Coating, Contamination, Scanning electron microscopy, Semiconducting wafers, Binary data, Photomasks, Lithography, Deep ultraviolet, Phase shifts

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Proceedings Article | 14 May 2004 Paper

Recent advances in fluorinated resists for application at 157 nm

Francis Houlihan, Raj Sakamuri, Andrew Romano, David Rentkiewicz, Ralph Dammel, Willard Conley, Daniel Miller, Michael Sebald, Nickolay Stepanenko, Matthias Markert, Uta Mierau, Inge Vermeir, Christoph Hohle, Toshiro Itani, Masato Shigematsu, Etsurou Kawaguchi

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537541

KEYWORDS: Transparency, Etching, Absorbance, Photomasks, Lithography, Resistance, Pellicles, Binary data, Silicon, Polymers

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Proceedings Article | 12 June 2003 Paper

Baking study of fluorinated 157-nm resist

Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joseph McDaniels, Chun Chang

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485196

KEYWORDS: Diffusion, Temperature metrology, Rutherfordium, Binary data, Annealing, Lithography, Chemically amplified resists, Image quality, Plasma etching, Resistance

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Proceedings Article | 12 June 2003 Paper

Evaluation of novel fluorinated resist matrices for 157-nm lithography

Francis Houlihan, Andrew Romano, David Rentkiewicz, Raj Sakamuri, Ralph Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joseph McDaniels, Chun Chang

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485195

KEYWORDS: Etching, Rutherfordium, Polymers, Absorbance, Lithography, Fluorine, Resistance, Oxides, Transparency, Plasma etching

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Proceedings Article | 24 July 2002 Paper

Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography

Ralph Dammel, Raj Sakamuri, Sang-Ho Lee, Dalil Rahman, Takanori Kudo, Andrew Romano, Larry Rhodes, John-Henry Lipian, Cheryl Hacker, Dennis Barnes

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474196

KEYWORDS: Polymers, Lithography, Absorbance, Photoresist materials, Polymerization, Transparency, Glasses, Binary data, Photomasks, Dry etching

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Proceedings Article | 24 August 2001 Paper

Transparent resins for 157-nm lithography

Ralph Dammel, Raj Sakamuri, Andrew Romano, Richard Vicari, Cheryl Hacker, Will Conley, Daniel Miller

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436865

KEYWORDS: Polymers, Etching, Absorbance, Lithography, Dry etching, Photoresist materials, Fluorine, Absorption, Transparency, Photomasks

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Showing 5 of 11 publications

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