Dr. Larry F. Rhodes Profile

Dr. Larry F. Rhodes

Research Fellow at Promerus LLC

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Author

Publications (12)

Proceedings Article | 4 May 2005 Paper

Development of optically transparent cyclic olefin photoresist binder resins

Larry Rhodes, Chun Chang, Cheryl Burns, Dennis Barnes, Brian Bennett, Larry Seger, Xiaoming Wu, Andy Sobek, Mike Mishak, Craig Peterson, Leah Langsdorf, Hideo Hada, Hiroaki Shimizu, Kazuhito Sasaki

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600051

KEYWORDS: Polymers, Absorbance, Photoresist materials, Etching, Palladium, Lithography, Transparency, Polymerization, Resistance, Hydrogen

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Proceedings Article | 14 May 2004 Paper

Effect of photoacid generator additives on the dissolution behavior of bis-trifluoromethyl carbinol substituted polynorbornene

Trevor Hoskins, Cody Berger, Peter Ludovice, Clifford Henderson, Larry Seger, Chun Chang, Larry Rhodes

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536264

KEYWORDS: Polymers, Hydrogen, Solids, Photoresist materials, FT-IR spectroscopy, Ultraviolet radiation, Optical lithography, Lithography, Photoresist developing, Molecules

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Proceedings Article | 12 June 2003 Paper

Baking study of fluorinated 157-nm resist

Francis Houlihan, Raj Sakamuri, Andrew Romano, Ralph Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joseph McDaniels, Chun Chang

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485196

KEYWORDS: Diffusion, Temperature metrology, Rutherfordium, Binary data, Annealing, Lithography, Chemically amplified resists, Image quality, Plasma etching, Resistance

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Proceedings Article | 12 June 2003 Paper

Hydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymers

Hiroshi Ito, William Hinsberg, Larry Rhodes, Chun Chang

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485135

KEYWORDS: Polymers, Hydrogen, Resistance, Reflectivity, Lithography, FT-IR spectroscopy, Absorption, Spectroscopy, Chlorine, Roads

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Proceedings Article | 12 June 2003 Paper

Dissolution behavior of bis-trifluoromethyl-carbinol-substituted polynorbornenes

Trevor Hoskins, Won Jae Chung, Peter Ludovice, Clifford Henderson, Larry Seger, Larry Rhodes, Robert Shick

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485145

KEYWORDS: Polymers, Hydrogen, Polymer thin films, FT-IR spectroscopy, Solids, Lithography, Photoresist materials, Palladium, X-ray diffraction, Molecules

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Proceedings Article | 12 June 2003 Paper

Evaluation of novel fluorinated resist matrices for 157-nm lithography

Francis Houlihan, Andrew Romano, David Rentkiewicz, Raj Sakamuri, Ralph Dammel, Will Conley, Georgia Rich, Daniel Miller, Larry Rhodes, Joseph McDaniels, Chun Chang

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485195

KEYWORDS: Etching, Rutherfordium, Polymers, Absorbance, Lithography, Fluorine, Resistance, Oxides, Transparency, Plasma etching

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Proceedings Article | 15 January 2003 Paper

Fabrication of microchannels for compliant wafer-level packaging using sacrificial materials

Hollie Reed, Joseph Jayachandran, Robert Shick, Larry Rhodes, Jeffery Krotine, Ed Elce, Sue Ann Allen, Paul Kohl

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.479568

KEYWORDS: Lead, Polymers, Packaging, Semiconducting wafers, Gold, Optical interconnects, Transistors, Copper, Waveguides, Wafer testing

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Proceedings Article | 24 July 2002 Paper

Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography

Ralph Dammel, Raj Sakamuri, Sang-Ho Lee, Dalil Rahman, Takanori Kudo, Andrew Romano, Larry Rhodes, John-Henry Lipian, Cheryl Hacker, Dennis Barnes

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474196

KEYWORDS: Polymers, Lithography, Absorbance, Photoresist materials, Polymerization, Transparency, Glasses, Binary data, Photomasks, Dry etching

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Proceedings Article | 29 November 2000 Paper

High-performance polymeric materials for waveguide applications

Konstantin Glukh, John-Henry Lipian, Richard Mimna, Phillip Neal, R. Ravikiran, Larry Rhodes, Robert Shick, Xiao-Mei Zhao

Proceedings Volume 4106, (2000) https://doi.org/10.1117/12.408534

KEYWORDS: Waveguides, Cladding, Polymers, Polymer multimode waveguides, Adaptive optics, Data communications, Refractive index, Fabrication, Thermography, Channel waveguides

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The ever-increasing need for economical, reliable, and high- performance optical interconnects for telecommunication and data communication markets demands new innovative solutions. Polymer technology being developed at BFGoodrich is focused on satisfying this demand. It is based on proprietary polynorbornene polymers that exhibit excellent optical, thermal and mechanical properties essential for fabrication of reliable components for integrated optics. Typical polymer waveguide systems exhibit a tradeoff between thermal and optical performance. The uniqueness of the polynorbornene system is that these tradeoffs are minimized. The intrinsic properties of the polynorbornene system include low transmission loss (<0.1 dB/cm at 820 nm), wide spectral range (<0.4 dB/cm at 450 nm and <0.1 dB/cm at 515-870nm), low birefringence ((Delta) n(in plane)<10^-5, (Delta) n(out of plane) <10^{-3 at 820 nm}, consistent difference in index over a wide temperature range, long-term thermal stability (>2000 hours at 125 degree(s)C), high glass transition temperature (>280 degree(s)C), and low moisture absorption (<0.1%). The combination of these characteristics offers advantages over existing plastic materials for visible and near IR applications such as those used in the datacom market. Candidate materials have been identified as core and cladding components for optical waveguides. The refractive index of a typical core material is 1.53, and of a typical clad material, 1.50 at 820 nm. The difference in index between core and cladding is approximately 0.03 over a broad range of wavelength (515-870nm). Preliminary results indicate that the difference in index between core and cladding tracks with temperature, which is in line with out expectation since these polymers have similar structures at the molecular level. Fabrication of functional waveguides has been demonstrated using a conventional cast and cure process at the lab scale. Optical performance of the constituent materials and the waveguide devices will be discussed in the paper.

Proceedings Article | 11 June 1999 Paper

Approaches to etch-resistant 193-nm photoresists: performance and prospects

Robert Allen, Juliann Opitz, Hiroshi Ito, Thomas Wallow, Daniel Casmier, Richard Di Pietro, Phillip Brock, Gregory Breyta, Ratnam Sooriyakumaran, Carl Larson, Donald Hofer, Pushkara Varanasi, Ann Mewherter, Saikumar Jayaraman, Richard Vicari, Larry Rhodes, Shenliang Sun

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350262

KEYWORDS: Polymers, Polymerization, Etching, Absorbance, Resistance, Photoresist materials, Oxides, Transparency, Lithography, Deep ultraviolet

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Proceedings Article | 29 June 1998 Paper

Reactive ion etching of 193-nm resist candidates: current platforms and future requirements

Thomas Wallow, Phillip Brock, Richard Di Pietro, Robert Allen, Juliann Opitz, Ratnam Sooriyakumaran, Donald Hofer, Jeff Meute, Jeff Byers, Georgia Rich, Martin McCallum, S. Schuetze, Saikumar Jayaraman, Karen Hullihen, Richard Vicari, Larry Rhodes, Brian Goodall, Robert Shick

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312362

KEYWORDS: Etching, Polymers, Reactive ion etching, Oxides, Photoresist materials, Photoresist processing, Carbon, Resistance, Chemical reactions, Control systems

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Proceedings Article | 29 June 1998 Paper

Design of an etch-resistant cyclic olefin photoresist

Robert Allen, Juliann Opitz, Thomas Wallow, Richard Di Pietro, Donald Hofer, Saikumar Jayaraman, Karen Hullihan, Larry Rhodes, Brian Goodall, Robert Shick

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312472

KEYWORDS: Polymers, Polymerization, Etching, Photoresist materials, Resistance, Deep ultraviolet, Metals, Plasma etching, Lithography, Contamination

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Showing 5 of 12 publications

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