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Ramon Ynzunza
at KLA Corp.
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 8 October 2020 Presentation + Paper
High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification
Proceedings Volume 11517, 115170U (2020) https://doi.org/10.1117/12.2572912
KEYWORDS: Reticles, Inspection, Wafer inspection, Wafer-level optics, Photomasks, Plasma, Semiconducting wafers, Signal to noise ratio, Algorithm development, Optics manufacturing
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