Mr. Ranjan Khurana Profile

Ranjan Khurana

Distinguished Member of Technical Staff at Micron Technology Inc

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Author

Publications (6)

Proceedings Article | 26 May 2022 Poster + Paper

An in-depth look at comprehensive and efficient methodology for CD uniformity budget breakdown

Ulrich Denker, Philip Gröger, Xaver Thrun, Stefan Buhl, Mycahya Eggleston, Nhi Doan, Gou Kawaguchi, Ranjan Khurana

Proceedings Volume 12053, 120531V (2022) https://doi.org/10.1117/12.2613709

KEYWORDS: Critical dimension metrology, Statistical analysis, Lithography, Error analysis, Data corrections, Visualization, Standards development, Scanners, Fluctuations and noise

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Proceedings Article | 22 February 2021 Presentation + Paper

Optimizing focus and dose process windows for robust process control using a multi-feature analysis

Philip Groeger, Ranjan Khurana, Aayush Mitra, Mycahya Eggleston, Stefan Buhl, Wan-Soo Kim, Xaver Thrun

Proceedings Volume 11611, 116111E (2021) https://doi.org/10.1117/12.2583928

KEYWORDS: Process control, Finite element methods, Semiconducting wafers, Optical lithography, Semiconductors, Scanners, Logic, High volume manufacturing, Extreme ultraviolet lithography

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SPIE Journal Paper | 11 September 2015

Critical dimension control using ultrashort laser for improving wafer critical dimension uniformity

Dan Avizemer, Ofir Sharoni, Sergey Oshemkov, Avi Cohen, Asaf Dayan, Ranjan Khurana, Dave Kewley

JM3, Vol. 14, Issue 03, 033510, (September 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.3.033510

KEYWORDS: Semiconducting wafers, Photomasks, Critical dimension metrology, Quartz, Pulsed laser operation, Signal attenuation, Beam controllers, Deep ultraviolet, Metrology, Process control

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Proceedings Article | 28 March 2014 Paper

A comparison of the pattern transfer of line-space patterns from graphoepitaxial and chemoepitaxial block co-polymer directed self-assembly

Dan Millward, Gurpreet Lugani, Ranjan Khurana, Scott Light, Ardavan Niroomand, Philip Hustad, Peter Trefonas, Shih-wei Chang, Christopher Lee, Dung Quach

Proceedings Volume 9054, 90540M (2014) https://doi.org/10.1117/12.2045580

KEYWORDS: Etching, Scanning electron microscopy, Carbon, Semiconducting wafers, Dry etching, Inspection, Cadmium sulfide, Line width roughness, Optical lithography, Directed self assembly

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Proceedings Article | 10 April 2013 Paper

Sub-40nm high-volume manufacturing overlay uncorrectable error evaluation

Pary Baluswamy, Ranjan Khurana, Bryan Orf, Wolfgang Keller

Proceedings Volume 8681, 868120 (2013) https://doi.org/10.1117/12.2012672

KEYWORDS: Semiconducting wafers, Data modeling, Statistical modeling, Overlay metrology, Statistical analysis, Error analysis, High volume manufacturing, Process control, Metrology, Feedback control

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Proceedings Article | 21 March 2006 Paper

Measurement, separation, and amelioration of transverse scanning synchronization error

Yuji Yamaguchi, Ranjan Khurana, Adlai Smith, Venky Subramony, Calvin Chen Chii Wean, Joseph Bendik

Proceedings Volume 6154, 615443 (2006) https://doi.org/10.1117/12.674471

KEYWORDS: Distortion, Semiconducting wafers, Dysprosium, Scanners, Overlay metrology, Reticles, Optical alignment, Lithography, Data corrections, Monochromatic aberrations

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Showing 5 of 6 publications

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