Dr. Sean Kerr Eichenlaub Profile

Dr. Sean Kerr Eichenlaub

at SUNY Poly SEMATECH

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 20 March 2010 Paper

Particle removal challenges of EUV patterned masks for the sub-22nm HP node

Abbas Rastegar, Sean Eichenlaub, Arun John Kadaksham, Byunghoon Lee, Matt House, Sungmin Huh, Brian Cha, Henry Yun, Iacopo Mochi, Kenneth Goldberg

Proceedings Volume 7636, 76360N (2010) https://doi.org/10.1117/12.847056

KEYWORDS: Particles, Extreme ultraviolet, Photomasks, Silica, Ruthenium, Scanning electron microscopy, Reflectivity, Scanning probe microscopy, Vacuum ultraviolet, Inspection

Read Abstract +

Proceedings Article | 27 May 2009 Paper

Sub-30-nm defect removal on EUV substrates

Abbas Rastegar, Sean Eichenlaub, Arun John Kadaksham, Matt House, Brian Cha, Henry Yun

Proceedings Volume 7470, 74700Z (2009) https://doi.org/10.1117/12.835197

KEYWORDS: Particles, Inspection, Extreme ultraviolet, Defect detection, Glasses, Surface finishing, Atomic force microscopy, Chemical mechanical planarization, Optical spheres, Quartz

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Nanopit smoothing by cleaning

Abbas Rastegar, Sean Eichenlaub, Arun John Kadaksham, Matt House

Proceedings Volume 7271, 72710F (2009) https://doi.org/10.1117/12.814242

KEYWORDS: Extreme ultraviolet, Particles, Etching, Photomasks, Quartz, Surface roughness, Glasses, Chemical mechanical planarization, Deposition processes, Anisotropic etching

Read Abstract +

Proceedings Article | 1 April 2008 Paper

Sub 50 nm cleaning-induced damage in EUV mask blanks

Abbas Rastegar, Sean Eichenlaub, Vivek Kapila, Arun John Kadaksham, Pat Marmillion

Proceedings Volume 6921, 692120 (2008) https://doi.org/10.1117/12.774951

KEYWORDS: Glasses, Cavitation, Particles, Extreme ultraviolet, Surface finishing, Acoustics, Quartz, Inspection, Photomasks, Atomic force microscopy

Read Abstract +

Proceedings Article | 16 November 2007 Paper

A method to determine the origin of remaining particles after mask blank cleaning

Vivek Kapila, Sean Eichenlaub, Abbas Rastegar, Arun John, Pat Marmillion

Proceedings Volume 6730, 67304L (2007) https://doi.org/10.1117/12.746798

KEYWORDS: Particles, Quartz, Scanning probe microscopy, Photomasks, Chemistry, Extreme ultraviolet lithography, Liquids, Mask cleaning, Ions, Vacuum ultraviolet

Read Abstract +

Proceedings Article | 30 October 2007 Paper

The effect of size and shape of sub-50 nm defects on their detectability

Abbas Rastegar, Wonil Cho, Eric Gullikson, Sean Eichenlaub

Proceedings Volume 6730, 67305F (2007) https://doi.org/10.1117/12.746816

KEYWORDS: Particles, Gold, Inspection, Quartz, Silica, Photomasks, Optical spheres, Defect detection, Extreme ultraviolet, Atomic force microscopy

Read Abstract +

Proceedings Article | 3 May 2007 Paper

Hydrogenated water application for particle removal on EUV mask blank substrates

Sean Eichenlaub, Abbas Rastegar, Peter Dress, Fei Xu, Pat Marmillion

Proceedings Volume 6533, 653311 (2007) https://doi.org/10.1117/12.737174

KEYWORDS: Particles, Extreme ultraviolet, Hydrogen, Photomasks, Lithography, Acquisition tracking and pointing, Defect inspection, Quartz, Standards development, Inspection

Read Abstract +

Proceedings Article | 15 March 2007 Paper

New requirements for the cleaning of EUV mask blanks

Abbas Rastegar, Sean Eichenlaub, Vivek Kapila, Arun John Kadaksham, Pat Marmillion

Proceedings Volume 6517, 65171D (2007) https://doi.org/10.1117/12.712105

KEYWORDS: Particles, Extreme ultraviolet, Quartz, Atomic force microscopy, Glasses, Inspection, Iron, Gold, Aluminum, Surface finishing

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Point cleaning of mask blanks for extreme ultraviolet lithography

Mike Brown, John Hartley, Sean Eichenlaub, Abbas Rastegar, Patricia Marmillion, Ken Roessler

Proceedings Volume 6349, 63492K (2006) https://doi.org/10.1117/12.686764

KEYWORDS: Atomic force microscopy, Photomasks, Extreme ultraviolet lithography, Inspection, Image processing, Extreme ultraviolet, Atomic force microscope, Coating, Particles, Image resolution

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Dependency of EUV mask defects on substrate defects

Sean Eichenlaub, Abbas Rastegar, Vivek Kapila, Yoshiaki Ikuta, Pat Marmillion

Proceedings Volume 6349, 63493C (2006) https://doi.org/10.1117/12.686437

KEYWORDS: Particles, Inspection, Scanning probe microscopy, Extreme ultraviolet, Defect inspection, Multilayers, Deposition processes, Scanning electron microscopy, Atomic force microscopy, Defect detection

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Interaction forces on mask surfaces relevant to EUV lithography

R. Hübner, S. Eichenlaub, A. Rastegar, R. Geer

Proceedings Volume 6349, 63493E (2006) https://doi.org/10.1117/12.687175

KEYWORDS: Quartz, Photomasks, Particles, Optical spheres, Extreme ultraviolet lithography, Chromium, Chemistry, Surface roughness, Atomic force microscopy, Mask cleaning

Read Abstract +

Proceedings Article | 20 October 2006 Paper

Cleaning of MoSi multilayer mask blanks for EUVL

Vivek Kapila, Abbas Rastegar, Yoshiaki Ikuta, Sean Eichenlaub, Pat Marmillion

Proceedings Volume 6349, 63492W (2006) https://doi.org/10.1117/12.686556

KEYWORDS: Photomasks, Particles, Multilayers, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon, Quartz, Deposition processes, Chemistry

Read Abstract +

Proceedings Article | 20 May 2006 Paper

A study of damage mechanisms during EUV mask substrate cleaning

Abbas Rastegar, Sean Eichenalub, Kurt Goncher, Pat Marmillion

Proceedings Volume 6283, 62830I (2006) https://doi.org/10.1117/12.681841

KEYWORDS: Particles, Extreme ultraviolet, Glasses, Photomasks, Quartz, Atomic force microscopy, Image processing, Chemical mechanical planarization, Surface roughness, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 9 November 2005 Paper

Cleaning of low thermal expansion material substrates for mask blanks in EUV lithography

Sean Eichenlaub, Sebastian Dietze, Yoshiaki Ikuta, Helmut Popp, Kurt Goncher, Pat Marmillion, Abbas Rastegar

Proceedings Volume 5992, 59923K (2005) https://doi.org/10.1117/12.658508

KEYWORDS: Particles, Quartz, Scanning probe microscopy, Defect inspection, Photomasks, Extreme ultraviolet lithography, Inspection, Surface roughness, Silica, Scanning electron microscopy

Read Abstract +

Showing 5 of 14 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years