Dr. Stephane Godny Profile

Dr. Stephane Godny

at imec

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 24 March 2016 Paper

Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control

Anil Gunay-Demirkol, Efrain Altamirano Sanchez, Stephane Heraud, Stephane Godny, Anne-Laure Charley, Philippe Leray, Ronen Urenski, Oded Cohen, Igor Turovets, Shay Wolfling

Proceedings Volume 9778, 977807 (2016) https://doi.org/10.1117/12.2220287

KEYWORDS: Semiconducting wafers, Scatterometry, Etching, Critical dimension metrology, Diffractive optical elements, Metrology, Optical lithography, Scatter measurement, Process control, Lithography

Read Abstract +

Proceedings Article | 10 April 2015 Paper

Stack and topography verification as an enabler for computational metrology target design

Michael Adel, Inna Tarshish-Shapir, David Gready, Mark Ghinovker, Chen Dror, Stephane Godny

Proceedings Volume 9424, 94240D (2015) https://doi.org/10.1117/12.2086084

KEYWORDS: Metrology, Scanning electron microscopy, Diffraction gratings, Overlay metrology, Uncertainty analysis, Performance modeling, Diffraction, Scatterometry, Critical dimension metrology, Image processing

Read Abstract +

Proceedings Article | 10 April 2013 Paper

Hybrid approach to optical CD metrology of directed self-assembly lithography

Stephane Godny, Masafumi Asano, Akiko Kawamoto, Koichi Wakamoto, Kazuto Matsuki, Cornel Bozdog, Matthew Sendelbach, Igor Turovets, Ronen Urenski, Renan Milo

Proceedings Volume 8681, 86812D (2013) https://doi.org/10.1117/12.2012660

KEYWORDS: Metrology, Critical dimension metrology, Scanning transmission electron microscopy, Semiconducting wafers, Lithography, Polymers, Process control, Chemical elements, Geometrical optics, Directed self assembly

Read Abstract +

Proceedings Article | 10 April 2013 Paper

Application of optical CD metrology for alternative lithography

Masafumi Asano, Akiko Kawamoto, Kazuto Matsuki, Stephane Godny , Tingsheng Lin, Koichi Wakamoto

Proceedings Volume 8681, 86812C (2013) https://doi.org/10.1117/12.2010887

KEYWORDS: Nanoimprint lithography, Lithography, Metrology, Critical dimension metrology, Etching, 3D metrology, Coating, Process control, Transmission electron microscopy, Directed self assembly

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years