Mr. Taichi Yamazaki Profile

Taichi Yamazaki

at Toppan Printing Co Ltd

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Author

Publications (4)

Proceedings Article | 14 October 2011 Paper

Attenuated phase-shift mask with high tolerance for 193nm radiation damage

Taichi Yamazaki, Ryohei Gorai, Yosuke Kojima, Takashi Haraguchi, Tsuyoshi Tanaka, Ryuji Koitabashi, Yukio Inazuki, Hiroki Yoshikawa

Proceedings Volume 8166, 81663V (2011) https://doi.org/10.1117/12.898984

KEYWORDS: Photomasks, Silica, Lithography, Opacity, Excimer lasers, Phase shifts, Critical dimension metrology, Chemical vapor deposition, Radiation effects, 193nm lithography

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Proceedings Article | 25 September 2010 Paper

Study and improvement approach to 193-nm radiation damage of attenuated phase-shift mask

Yoshifumi Sakamoto, Tomohito Hirose, Hitomi Tsukuda, Taichi Yamazaki, Yosuke Kojima, Hayato Ida, Takashi Haraguchi, Tsuyoshi Tanaka, Ryuji Koitabashi, Yukio Inazuki, Hiroki Yoshikawa

Proceedings Volume 7823, 782324 (2010) https://doi.org/10.1117/12.867710

KEYWORDS: Photomasks, Opacity, Lithography, Radiation effects, Silica, Transmission electron microscopy, Excimer lasers, 193nm lithography, Silicon, Oxidation

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Proceedings Article | 11 May 2009 Paper

Fine pattern fabrication property of binary mask and attenuated phase shift mask

Taichi Yamazaki, Yosuke Kojima, Mitsuharu Yamana, Takashi Haraguchi, Tsuyoshi Tanaka

Proceedings Volume 7379, 73791V (2009) https://doi.org/10.1117/12.824307

KEYWORDS: SRAF, Chromium, Photomasks, Inspection, Image resolution, Phase shifts, Optical simulations, Binary data, Semiconducting wafers, Glasses

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Proceedings Article | 17 October 2008 Paper

Challenges for the quality control of assist features for 45nm node technology and beyond

Lin Wang, Todd Lukanc, Makoto Takahashi, Hung-Eil Kim, Khoi Phan, Taichi Yamazaki, Yosuke Kojima, Wataru Nozaki, Takashi Haraguchi, Yoshimitsu Okuda

Proceedings Volume 7122, 71220Z (2008) https://doi.org/10.1117/12.800916

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Optical proximity correction, Line edge roughness, Chromium, Photoresist processing, Resolution enhancement technologies, Reticles, SRAF

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