Mr. Tomohiro Iseki Profile

Tomohiro Iseki

at Tokyo Electron Kyushu Ltd

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Author

Publications (4)

Proceedings Article | 27 March 2017 Presentation + Paper

Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure

Seiji Nagahara, Michael Carcasi, Gosuke Shiraishi, Hisashi Nakagawa, Satoshi Dei, Takahiro Shiozawa, Kathleen Nafus, Danilo De Simone, Geert Vandenberghe, Hans-Jürgen Stock, Bernd Küchler, Masafumi Hori, Takehiko Naruoka, Tomoki Nagai, Yukie Minekawa, Tomohiro Iseki, Yoshihiro Kondo, Kosuke Yoshihara, Yuya Kamei, Masaru Tomono, Ryo Shimada, Serge Biesemans, Hideo Nakashima, Philippe Foubert, Elizabeth Buitrago, Michaela Vockenhuber, Yasin Ekinci, Akihiro Oshima, Seiichi Tagawa

Proceedings Volume 10146, 101460G (2017) https://doi.org/10.1117/12.2258217

KEYWORDS: Extreme ultraviolet lithography, Chemically amplified resists, Floods, Lithography, Extreme ultraviolet, Line edge roughness, Image processing, Image enhancement, Ultraviolet radiation, Scanners, Picosecond phenomena, Polymers, Line width roughness, Stochastic processes

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Proceedings Article | 27 March 2017 Paper

Simulation and experimentation of PSCAR chemistry for complex structures

Michael Carcasi, Seiji Nagahara, Gosuke Shiraishi, Tomohiro Iseki, Yukie Minekawa, Kosuke Yoshihara, Hisashi Nakagawa, Takehiko Naruoka, Tomoki Nagai, Akihiro Oshima, Seiichi Tagawa

Proceedings Volume 10143, 1014329 (2017) https://doi.org/10.1117/12.2258166

KEYWORDS: Chemistry, Extreme ultraviolet lithography, Extreme ultraviolet, Line edge roughness, Lithography, Chemically amplified resists, Industrial chemicals, Floods, Light sources, Polymers, Picosecond phenomena, Ultraviolet radiation, Chemical reactions, Absorption

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Proceedings Article | 20 March 2012 Paper

Resist process optimization for further defect reduction

Keiichi Tanaka, Tomohiro Iseki, Hiroshi Marumoto, Koji Takayanagi, Yuichi Yoshida, Ryouichi Uemura, Kosuke Yoshihara

Proceedings Volume 8325, 83252L (2012) https://doi.org/10.1117/12.915813

KEYWORDS: Semiconducting wafers, Particles, Photoresist processing, Bridges, Wafer manufacturing, Polymers, Capillaries, Yield improvement, NOx, Optical lithography

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Proceedings Article | 26 March 2008 Paper

Application technology of stacked film with highly controlled edge structure

Katsunori Ichino, Keiji Tanouchi, Tomohiro Iseki, Nobuhiro Ogata, Taro Yamamoto, Kosuke Yoshihara, Akihiro Fujimoto

Proceedings Volume 6923, 69231R (2008) https://doi.org/10.1117/12.772158

KEYWORDS: Semiconducting wafers, Coating, Head-mounted displays, Immersion lithography, Particles, Control systems, Ions, Natural surfaces, Thin film coatings, Silicon

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