Ms. Wonyoung Choi Profile

Wonyoung Choi

at Hanyang Univ

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Author

Publications (9)

Proceedings Article | 28 April 2023 Presentation + Paper

Effect of particle defect to extreme ultra-violet pellicle

Ji-Hyun Jeon, Ji-Won Kang, Hee-Chang Ko, Won-Young Choi, Hye-Keun Oh

Proceedings Volume 12494, 124940G (2023) https://doi.org/10.1117/12.2657898

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Extreme ultraviolet lithography, Temperature metrology, Semiconducting wafers, Tin, Aluminum, Scanners, Materials properties, High volume manufacturing

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Proceedings Article | 1 December 2022 Poster + Paper

Estimation of mechanical stability of EUV pellicle by the collision of the particle defect

Ji-Won Kang, Won-Young Choi, Hee-Chang Ko, Jang-Gun Park, Min-Woo Kim, Jun-Hyeung Lee, Hye-Keun Oh

Proceedings Volume 12292, 122920S (2022) https://doi.org/10.1117/12.2643119

KEYWORDS: Pellicles, Particles, Extreme ultraviolet, Graphene, Silicon carbide, Transmittance, Extreme ultraviolet lithography, Photomasks, Image processing, Semiconducting wafers

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Proceedings Article | 31 October 2022 Poster

Possible underlayer dependent CD and overlay variation due to different heat absorption with EUV exposure

Wonyoung Choi, Heechang Ko, Jiwon Kang, Janggun Park, Minwoo Kim, Junhyeong Lee, Hyekeun Oh

Proceedings Volume PC12292, PC122920R (2022) https://doi.org/10.1117/12.2643047

KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Absorption, Thin films, Semiconducting wafers, Photoresist materials, Overlay metrology, Thin film manufacturing, Thin film deposition, Semiconductors

Proceedings Article | 26 May 2022 Poster + Paper

Optimal thickness of phase shift mask considering phase and reflectance in high NA EUV contact-hole pattern

Jang-Gun Park, Min-Woo Kim, Ji-Won Kang, Hee-Chang Ko, Jun-Hyung Lee, Won-Young Choi, Hye-Keun Oh

Proceedings Volume 12051, 120510O (2022) https://doi.org/10.1117/12.2613984

KEYWORDS: Reflectivity, Nanoimprint lithography, Photomasks, Extreme ultraviolet, Phase shifts, Stochastic processes, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, 3D image processing

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SPIE Journal Paper | 31 August 2021

Possible extreme ultraviolet mask thermal deformation during exposure

Chung-Hyun Ban, In-Hwa Kang, Won-Yung Choi, Hye-Keun Oh

JM3, Vol. 20, Issue 03, 031012, (August 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.031012

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Convection, Tantalum, Nickel, Absorption, Multilayers, Silicon

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SPIE Journal Paper | 2 August 2021

Reduced lifetime of EUV pellicles due to defects

Chung-Hyun Ban, In-Hwa Kang, Won-Yung Choi, Hye-Keun Oh

JM3, Vol. 20, Issue 03, 034401, (August 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.034401

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Transmittance, Absorption, Reflectivity, Semiconducting wafers, Silicon carbide, Tin

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Proceedings Article | 22 February 2021 Poster + Presentation

Wafer heating analysis with pattern variation in EUVL

Won-Young Choi, Chung-Hyun Ban, Hye-Keun Oh

Proceedings Volume 11609, 116091P (2021) https://doi.org/10.1117/12.2583917

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Proceedings Article | 22 February 2021 Poster + Presentation

Effect of contaminants on pellicle lifetime for EUV lithography

Chung-Hyun Ban, In-Hwa Kang, Won-Young Choi, Hye-Keun Oh

Proceedings Volume 11609, 116091J (2021) https://doi.org/10.1117/12.2583675

KEYWORDS: Pellicles, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Finite element methods, Absorption, Thermography, Thermal modeling, Silicon carbide, Silica

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Proceedings Article | 20 September 2020 Poster

Thermal deformation of EUV mask according to mask type and pattern density

Chung-Hyun Ban, In-Hwa Kang, Beom-Jun Jeon, Won-young Choi, Hye-Keun Oh

Proceedings Volume 11517, 115171C (2020) https://doi.org/10.1117/12.2573149

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Multilayers, Light sources, Finite element methods, Reflectivity, Thermal effects, Pellicles, Semiconducting wafers, Computer simulations

Showing 5 of 9 publications

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