Dr. Yi-Pei Tsai Profile

Dr. Yi-Pei Tsai

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Publications (5)

Proceedings Article | 12 November 2024 Presentation + Paper

Unfolding the curves: novel designs and metrology methods for curvilinear masks qualification

Darko Trivković, Xuelong Shi, Yi-Pei Tsai, Chieh-Miao Chang, Jane Wang, Victoria Malacara, Balakumar Baskaran, Youssef Drissi, Joost Bekaert, Kenichi Miyaguchi

Proceedings Volume 13216, 132160I (2024) https://doi.org/10.1117/12.3036470

KEYWORDS: Photomasks, Critical dimension metrology, Metrology, Optical proximity correction, Manufacturing, Semiconducting wafers, Logic, Industry, Industrial applications, Silicon photonics

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Proceedings Article | 10 April 2024 Presentation + Paper

Study of EUV stochastic defect on wafer yield

Yi-Pei Tsai, Chieh-Miao Chang, Yi-Han Chang, Apoorva Oak, Darko Trivkovic, Ryoung-Han Kim

Proceedings Volume 12954, 1295404 (2024) https://doi.org/10.1117/12.3010858

KEYWORDS: Stochastic processes, Extreme ultraviolet, Semiconducting wafers, Data modeling, Photomasks, Critical dimension metrology, Optical lithography, Back end of line, Inspection, Extreme ultraviolet lithography

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Proceedings Article | 10 April 2024 Presentation + Paper

Investigation of die-cost scaling scenarios in future technologies

G. Mirabelli, Y.-P. Tsai, Y.-H. Chang, D. Velenis, R.-H. Kim, J. Myers, L.-Å. Ragnarsson, O. Zografos, G. Hellings

Proceedings Volume 12954, 129540E (2024) https://doi.org/10.1117/12.3010149

KEYWORDS: Semiconductor manufacturing, Back end of line, Logic, Front end of line

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Proceedings Article | 28 April 2023 Poster + Paper

Productivity enhancement study: yield, cost, and turn-around-time modeling for EUV and high NA EUV

Yi-Pei Tsai, Yi-Han Chang, Jane Wang, Darko Trivkovic, Kurt Ronse, Ryoung-Han Kim

Proceedings Volume 12495, 124951U (2023) https://doi.org/10.1117/12.2658866

KEYWORDS: Extreme ultraviolet, Semiconducting wafers, Photomasks, Fin field effect transistors, Optical lithography, Front end of line, Manufacturing, Back end of line, Yield improvement, Extreme ultraviolet lithography

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Proceedings Article | 26 May 2022 Presentation + Paper

A yield prediction model and cost of ownership for productivity enhancement beyond imec 5nm technology node

Yi-Pei Tsai, Yi-Han Chang, Jane Wang, Darko Trivkovic, Kurt Ronse, Ryoung-Han Kim

Proceedings Volume 12052, 1205203 (2022) https://doi.org/10.1117/12.2617415

KEYWORDS: Extreme ultraviolet, Semiconducting wafers, Photomasks, Manufacturing, Optical lithography, Yield improvement, Front end of line, Semiconductor manufacturing, Performance modeling, Back end of line

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