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Yusuke Nakatani
at Hitachi Hightech Corp
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Publications (1)
Proceedings Article | 30 April 2023 Poster
Radical etching of high-k and low-k dielectrics for three-dimension device manufacturing with microwave-ECR etching system
Proceedings Volume PC12499, PC124990I (2023) https://doi.org/10.1117/12.2656040
KEYWORDS: Etching, Dielectrics, Gallium arsenide, Reactive ion etching, Manufacturing, Transistors, Plasma etching, Plasma, Magnetism, Ions
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