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Zhizhen Yang
at North China Univ of Technology
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Author
Publications (1)
Proceedings Article | 3 October 2018 Paper
Optimization of absorber and multilayer in EUV mask for 1D and 2D patterns
Proceedings Volume 10809, 1080919 (2018) https://doi.org/10.1117/12.2501463
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Image resolution, Image quality, Light sources, Lithographic illumination, 3D modeling
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