Yanrong Wang
at North China Univ. of Technology
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 3 October 2018 Paper
Proceedings Volume 10809, 1080919 (2018) https://doi.org/10.1117/12.2501463
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Image resolution, Image quality, Light sources, Lithographic illumination, 3D modeling

Proceedings Article | 3 October 2018 Paper
Proceedings Volume 10810, 108101E (2018) https://doi.org/10.1117/12.2501455
KEYWORDS: SRAF, Model-based design, Microelectronics, Photomasks, Image classification, Extreme ultraviolet, Manufacturing, Roads, Extreme ultraviolet lithography

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