Next-generation test equipment for micro-production

Kay Gastinger; Lars Johnsen; Malgorzata Kujawinska; Michal Jozwik; Uwe Zeitner; Peter Dannberg; Jorge Albero; Sylwester Bargiel; Christoph Schaeffel; Stephan Beer; Rudolf Moosburger; Patrick Lambelet; Marco Pizzi

doi:10.1117/12.855087

14 May 2010 Next-generation test equipment for micro-production

Kay Gastinger, Lars Johnsen, Malgorzata Kujawinska, Michal Jozwik, Uwe Zeitner, Peter Dannberg, Jorge Albero, Sylwester Bargiel, Christoph Schaeffel, Stephan Beer, Rudolf Moosburger, Patrick Lambelet, Marco Pizzi

Author Affiliations +

Proceedings Volume 7718, Optical Micro- and Nanometrology III; 77180F (2010) https://doi.org/10.1117/12.855087
Event: SPIE Photonics Europe, 2010, Brussels, Belgium

Abstract

The paper introduces different approaches to overcome the large ratio between wafer size and feature size in the testing step of micro production. For the inspection of Micro(Opto)ElectroMechanicalSystems (M(O)EMS) a priori information are available to optimise the inspection process. The EU-project SMARTIEHS develops a new concept for high volume M(O)EMS testing. The design of the test station and the fabrication of the first components are presented and the advancements compared to the state of the art are introduced within the following fields: micro-optical interferometer design, micro-optical production, smart-pixel camera and mechanical design. Furthermore the first demonstrators are introduced and experimental results are presented.

Citation Download Citation

Kay Gastinger, Lars Johnsen, Malgorzata Kujawinska, Michal Jozwik, Uwe Zeitner, Peter Dannberg, Jorge Albero, Sylwester Bargiel, Christoph Schaeffel, Stephan Beer, Rudolf Moosburger, Patrick Lambelet, and Marco Pizzi "Next-generation test equipment for micro-production", Proc. SPIE 7718, Optical Micro- and Nanometrology III, 77180F (14 May 2010); https://doi.org/10.1117/12.855087

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