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30 April 2023 Foundry compatible 300 mm process flows for Si spin and superconducting qubits
Danny Wan, Stefan Kubicek, Tsvetan Ivanov, Shana Massar, Massimo Mongillo, Anton Potocnik, Ruoyu Li, Clement Godfrin, Daniel Perez Lozano, Xiaoyu Piao, Julien Jussot, Yann Canvel, Antoine Pacco, Andriy Hikavyy, Henri Jansen, Asser Elsayed, Mohamed Shehata, Jeroen Verjauw, Rohith Acharya, Jacques Van Damme, George Simion, Kristiaan De Greve
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Proceedings Volume PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII; PC1249908 (2023) https://doi.org/10.1117/12.2662652
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States
Abstract
A fully error corrected quantum machine is one of the keys to unlocking the promise and potential of quantum computing. It is now widely accepted that this will require thousands if not millions of identical, highly coherent, interconnected qubits and highlights the increasing need for improving fabrication and scalability of current qubit implementations. Conventional qubit fabrication processes, many relying on lift-off, suffer from low yield and poor uniformity. We outline progress on realizing qubits in a 300 mm fabrication facility with state-of-the-art tooling and advanced process technology and demonstrate advantages of foundry compatible flows for both spin and superconducting qubits.
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© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Danny Wan, Stefan Kubicek, Tsvetan Ivanov, Shana Massar, Massimo Mongillo, Anton Potocnik, Ruoyu Li, Clement Godfrin, Daniel Perez Lozano, Xiaoyu Piao, Julien Jussot, Yann Canvel, Antoine Pacco, Andriy Hikavyy, Henri Jansen, Asser Elsayed, Mohamed Shehata, Jeroen Verjauw, Rohith Acharya, Jacques Van Damme, George Simion, and Kristiaan De Greve "Foundry compatible 300 mm process flows for Si spin and superconducting qubits", Proc. SPIE PC12499, Advanced Etch Technology and Process Integration for Nanopatterning XII, PC1249908 (30 April 2023); https://doi.org/10.1117/12.2662652
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KEYWORDS
Quantum communications
Superconductors
Silicon
Quantum computing
Electron transport
Etching
Interfaces
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