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Dr. Agostino Cangiano
at KLA Italy Srl
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Publications (1)
Proceedings Article | 19 March 2015 Paper
Influence of the process-induced asymmetry on the accuracy of overlay measurements
Tetyana Shapoval, Bernd Schulz, Tal Itzkovich, Sean Durran, Ronny Haupt, Agostino Cangiano, Barak Bringoltz, Matthias Ruhm, Eric Cotte, Rolf Seltmann, Tino Hertzsch, Eitan Hajaj, Carsten Hartig, Boris Efraty, Daniel Fischer
Proceedings Volume 9424, 94240B (2015) https://doi.org/10.1117/12.2085788
KEYWORDS: Optical filters, Overlay metrology, Semiconducting wafers, Data modeling, Metrology, Optical properties, Optical simulations, Signal processing, Etching, Image segmentation
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