Rolf Seltmann
at RS Litho-consult
SPIE Involvement:
Author
Publications (31)

Proceedings Article | 22 February 2021 Presentation
Rolf Seltmann, Tino Hertzsch, Matthias Ruhm, Ofir Sharoni, Thomas Scheruebl
Proceedings Volume 11611, 1161120 (2021) https://doi.org/10.1117/12.2585642

Proceedings Article | 3 October 2019 Paper
Proceedings Volume 11148, 111480L (2019) https://doi.org/10.1117/12.2536896
KEYWORDS: Photomasks, Semiconducting wafers, Optical lithography, Critical dimension metrology, Failure analysis, Scanners, 3D modeling, Line width roughness, Reticles

Proceedings Article | 29 August 2019 Paper
Proceedings Volume 11177, 1117712 (2019) https://doi.org/10.1117/12.2535686
KEYWORDS: Semiconducting wafers, Printing, Logic, Photomasks, Critical dimension metrology, Lithography, Metrology, Manufacturing, Optical lithography, Metals

Proceedings Article | 20 March 2018 Paper
Thomas Thamm, Bernd Geh, Marija Djordjevic Kaufmann, Rolf Seltmann, Alla Bitensky, Martin Sczyrba, Aravind Narayana Samy
Proceedings Volume 10587, 105870F (2018) https://doi.org/10.1117/12.2297382
KEYWORDS: Photomasks, Scanners, Reticles, Light scattering, Scattering, Logic devices, Source mask optimization, Lithography

Proceedings Article | 20 October 2016 Paper
Proceedings Volume 10032, 100320I (2016) https://doi.org/10.1117/12.2248889
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Manufacturing, Scanning electron microscopy, Error analysis, Semiconductors, Process control, Lithography, Control systems

Proceedings Article | 19 March 2015 Paper
Tetyana Shapoval, Bernd Schulz, Tal Itzkovich, Sean Durran, Ronny Haupt, Agostino Cangiano, Barak Bringoltz, Matthias Ruhm, Eric Cotte, Rolf Seltmann, Tino Hertzsch, Eitan Hajaj, Carsten Hartig, Boris Efraty, Daniel Fischer
Proceedings Volume 9424, 94240B (2015) https://doi.org/10.1117/12.2085788
KEYWORDS: Optical filters, Overlay metrology, Semiconducting wafers, Data modeling, Metrology, Optical properties, Optical simulations, Signal processing, Etching, Image segmentation

Proceedings Article | 17 October 2014 Paper
Matthias Ruhm, Bernd Schulz, Eric Cotte, Rolf Seltmann, Tino Hertzsch
Proceedings Volume 9231, 92310O (2014) https://doi.org/10.1117/12.2068206
KEYWORDS: Overlay metrology, Etching, Semiconducting wafers, Lithography, Distortion, Metrology, Photomasks, Semiconductor manufacturing, Control systems, Plasma etching

Proceedings Article | 17 October 2014 Paper
Proceedings Volume 9231, 923104 (2014) https://doi.org/10.1117/12.2068020
KEYWORDS: Lithography, Optical lithography, Reticles, Scanners, 3D modeling, Manufacturing, Chemical mechanical planarization, Optical proximity correction, Semiconducting wafers, Photomasks

Proceedings Article | 8 October 2014 Paper
Rémi Rivière, Selvi Gopalakrishnan, Martin Mazur, Nevzat Öner, Sven Mühle, Rolf Seltmann
Proceedings Volume 9235, 92350S (2014) https://doi.org/10.1117/12.2059622
KEYWORDS: Photomasks, Reticles, Optical proximity correction, Semiconducting wafers, Binary data, Chromium, Critical dimension metrology, Photoresist materials, Opacity, Front end of line

Proceedings Article | 1 October 2013 Paper
Aravind Narayana Samy, Roberto Schiwon, Rolf Seltmann, Frank Kahlenberg, Ushasree Katakamsetty
Proceedings Volume 8886, 888609 (2013) https://doi.org/10.1117/12.2047086
KEYWORDS: 3D modeling, Photomasks, Chemical mechanical planarization, Semiconducting wafers, Lithography, Calibration, Finite element methods, 3D metrology, Computer simulations, Reticles

Proceedings Article | 12 April 2013 Paper
Aravind Narayana Samy, Rolf Seltmann, Frank Kahlenberg, Jessy Schramm, Bernd Küchler, Ulrich Klostermann
Proceedings Volume 8683, 86831E (2013) https://doi.org/10.1117/12.2011427
KEYWORDS: 3D modeling, Calibration, Photoresist processing, Data modeling, Scanning electron microscopy, 3D metrology, Etching, Process modeling, Atomic force microscopy, Lithography

Proceedings Article | 8 November 2012 Paper
Guoxiang Ning, Christian Holfeld, Daniel Fischer, Paul Ackmann, Andre Holfeld, Karin Kurth, Martin Sczyrba, Tino Hertzsch, Rolf Seltmann, Angeline Ho, Fang GN
Proceedings Volume 8522, 85221X (2012) https://doi.org/10.1117/12.958607
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Reticles, Photomasks, Phase shifts, Binary data, Printing, Design for manufacturability, Manufacturing, Defect detection

Proceedings Article | 8 November 2012 Paper
Proceedings Volume 8522, 85220B (2012) https://doi.org/10.1117/12.965531
KEYWORDS: Critical dimension metrology, Inspection, Photomasks, Scanning electron microscopy, Defect inspection, Spatial resolution, Semiconducting wafers, Control systems, Manufacturing, Data modeling

Proceedings Article | 2 April 2011 Paper
Proceedings Volume 7985, 798507 (2011) https://doi.org/10.1117/12.885690
KEYWORDS: Reticles, Semiconducting wafers, Scanners, Overlay metrology, Thermal effects, Manufacturing, Lithography, Wafer-level optics, Image processing, Process control

Proceedings Article | 2 April 2011 Paper
Holger Bald, Rolf Seltmann, Karsten Bubke, Matthias Ruhm, Marc Noot, Dieter Woischke, Paul van Adrichem, Paul Luehrmann
Proceedings Volume 7985, 79850J (2011) https://doi.org/10.1117/12.886120
KEYWORDS: Scanners, Scatterometry, Scanning electron microscopy, Semiconducting wafers, Optical proximity correction, Time metrology, Metrology, High volume manufacturing, Cadmium sulfide, Cadmium

Proceedings Article | 23 March 2011 Paper
Karsten Bubke, Matthias Ruhm, Rafael Aldana, Martin Niehoff, Xu Xie, Justin Ghan, Paul van Adrichem, Holger Bald, Paul Luehrmann, Stefan Roling, Rolf Seltmann
Proceedings Volume 7973, 79732E (2011) https://doi.org/10.1117/12.890501
KEYWORDS: Data modeling, Scanners, Scatterometry, Scanning electron microscopy, Metrology, Critical dimension metrology, Semiconducting wafers, Printing, Imaging systems, Cadmium

Proceedings Article | 2 April 2010 Paper
Jens Busch, Anne Parge, Rolf Seltmann, Heike Scholtz, Bernd Schultz, Uwe Knappe, Matthias Ruhm, Marc Noot, Dieter Woischke, Paul Luehrmann
Proceedings Volume 7638, 763805 (2010) https://doi.org/10.1117/12.848613
KEYWORDS: Semiconducting wafers, Scanners, Metrology, Overlay metrology, Lithography, Process control, Control systems, Time metrology, Data modeling, Scatterometry

Proceedings Article | 27 May 2009 Paper
Rolf Seltmann, Gert Burbach, Anne Parge, Jens Busch, Tino Hertzsch, Andre Poock, Francois Weisbuch, Andre Holfeld
Proceedings Volume 7470, 747006 (2009) https://doi.org/10.1117/12.835166
KEYWORDS: Photomasks, Semiconducting wafers, Optical lithography, Etching, Transistors, Line width roughness, Logic, Oscillators, Scanners, Metrology

Proceedings Article | 1 April 2008 Paper
Proceedings Volume 6924, 69241J (2008) https://doi.org/10.1117/12.772711
KEYWORDS: Critical dimension metrology, Line edge roughness, Photomasks, Semiconducting wafers, Image processing, Diffusion, Lithography, Light scattering, Optical lithography, Photoresist processing

Proceedings Article | 26 March 2008 Paper
Bruno LaFontaine, Yunfei Deng, Ryoung-Han Kim, Harry Levinson, Sarah McGowan, Uzodinma Okoroanyanwu, Rolf Seltmann, Cyrus Tabery, Anna Tchikoulaeva, Tom Wallow, Obert Wood, John Arnold, Don Canaperi, Matthew Colburn, Kurt Kimmel, Chiew-Seng Koay, Erin Mclellan, Dave Medeiros, Satyavolu Papa Rao, Karen Petrillo, Yunpeng Yin, Hiroyuki Mizuno, Sander Bouten, Michael Crouse, Andre van Dijk, Youri van Dommelen, Judy Galloway, Sang-In Han, Bart Kessels, Brian Lee, Sjoerd Lok, Brian Niekrewicz, Bill Pierson, Robert Routh, Emil Schmit-Weaver, Kevin Cummings, James Word
Proceedings Volume 6921, 69210P (2008) https://doi.org/10.1117/12.772933
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Transistors, Extreme ultraviolet, Optical proximity correction, Photoresist processing, Etching, Metals, Scanners

Proceedings Article | 3 May 2007 Paper
B. Alles, B. Simeon, E. Cotte, T. Wandel, B. Schulz, R. Seltmann
Proceedings Volume 6533, 65330U (2007) https://doi.org/10.1117/12.736958
KEYWORDS: Photomasks, Semiconducting wafers, Error analysis, Statistical analysis, Image registration, Overlay metrology, Dysprosium, Data modeling, Statistical modeling, Metals

Proceedings Article | 4 April 2007 Paper
Proceedings Volume 6518, 65180E (2007) https://doi.org/10.1117/12.708471
KEYWORDS: Overlay metrology, Reticles, Semiconducting wafers, Image registration, Photomasks, Data modeling, Pellicles, Scanners, Error analysis, Metrology

Proceedings Article | 27 March 2007 Paper
Frank Kahlenberg, Rolf Seltmann, Bruno La Fontaine, René Wirtz, Aernout Kisteman, Roel N. Vanneer, Marco Pieters
Proceedings Volume 6520, 65200Z (2007) https://doi.org/10.1117/12.712169
KEYWORDS: Sensors, Finite element methods, Semiconducting wafers, Back end of line, Signal processing, Matrices, Wafer-level optics, Measurement devices, Metals, Optical sensors

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6152, 615213 (2006) https://doi.org/10.1117/12.656467
KEYWORDS: Reticles, Overlay metrology, Scanners, Data modeling, Semiconducting wafers, Metrology, Chemical mechanical planarization, Manufacturing, Polishing, Optical alignment

Proceedings Article | 13 March 2006 Paper
Karla Romero, Rolf Seltmann, Gert Burbach, Rolf Stephan, Joerg Paufler, David Greenlaw
Proceedings Volume 6156, 61560D (2006) https://doi.org/10.1117/12.657131
KEYWORDS: Transistors, Critical dimension metrology, Optical lithography, Line edge roughness, Structural design, Image processing, Scanners, Monochromatic aberrations, Semiconducting wafers, Etching

Proceedings Article | 26 June 2003 Paper
Rolf Seltmann, Rolf Stephan, Martin Mazur, Christopher Spence, Bruno La Fontaine, Dirk Stankowski, Andre Poock, Wolfram Grundke
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485337
KEYWORDS: Scanners, Reticles, Manufacturing, Semiconducting wafers, Critical dimension metrology, Optical filters, Contamination, Modulation transfer functions, Logic, Etching

Proceedings Article | 16 July 2002 Paper
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473477
KEYWORDS: Overlay metrology, Semiconducting wafers, Calibration, Wafer-level optics, Etching, Optical testing, Metrology, Reticles, Scanners, Manufacturing

Proceedings Article | 5 July 2000 Paper
Rolf Seltmann, Wolfgang Demmerle, Marc Staples, Anna Maria Minvielle, Bernd Schulz, Sven Muehle
Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388935
KEYWORDS: Optical alignment, Overlay metrology, Semiconducting wafers, Chemical mechanical planarization, Aluminum, Reticles, Copper, Metals, Distortion, Data transmission

Proceedings Article | 26 July 1999 Paper
Rolf Seltmann, Anna Maria Minvielle, Chris Spence, Sven Muehle, Luigi Capodieci, Khanh Nguyen
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354337
KEYWORDS: Reticles, Semiconducting wafers, Scanners, Cadmium, Monochromatic aberrations, Deep ultraviolet, Critical dimension metrology, Photomasks, Photoresist processing, Manufacturing

Proceedings Article | 26 May 1995 Paper
Heinz Kueck, Michael Bollerott, Wolfgang Doleschal, Andreas Gehner, Wolfram Grundke, Detlef Kunze, Rolf Melcher, Joerg Paufler, Rolf Seltmann, Guenter Zimmer
Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209280
KEYWORDS: Spatial light modulators, Semiconducting wafers, Excimer lasers, Modulators, Lithography, Wafer-level optics, Electrodes, Mirrors, Optics manufacturing, Optical lithography

Proceedings Article | 1 June 1992 Paper
Rainer Pforr, Stefan Wittekoek, Roland Van Den Bosch, Luc Van den Hove, Rik Jonckheere, Theo Fahner, Rolf Seltmann
Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130355
KEYWORDS: Optical alignment, Semiconducting wafers, Diffraction gratings, Image quality, Information operations, Diffraction, Refractive index, Oxides, Overlay metrology, Silicon

Showing 5 of 31 publications
Proceedings Volume Editor (1)

SPIE Conference Volume | 16 March 2011

Conference Committee Involvement (2)
38th European Mask and Lithography Conference
19 June 2023 | Dresden, Germany
27th European Mask and Lithography Conference
18 January 2011 | Dresden, Germany
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