Dr. Andrew M. C. Dawes Profile

Dr. Andrew M. C. Dawes

Staff Applications Engineer at Synopsys Inc

SPIE Involvement:

Author

Area of Expertise:

nonlinear optics , simulation , quantum optics , lithography , atomic physics , photonics

Publications (9)

Proceedings Article | 13 November 2024 Presentation

Lithographic imaging analysis of new EUV mask blank materials and their architectures

Supriya Jaiswal, Andrew Dawes

Proceedings Volume 13216, 132160B (2024) https://doi.org/10.1117/12.3036729

KEYWORDS: Reflectivity, Lithography, Extreme ultraviolet, Yield improvement, Photomasks, Design, Computer architecture, Simulations, Semiconducting wafers, Reflection

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Proceedings Article | 12 November 2024 Presentation + Paper

Metalens response to process variation

Andrew M. Dawes, Lawrence Melvin, Maryvonne Chalony, Betsy Grubbs, Phil Stopford, Jian Rao, Rajeev Ranjan, Joachim Siebert, JiSoo Park, Ying Zhou

Proceedings Volume 13216, 132161F (2024) https://doi.org/10.1117/12.3034641

KEYWORDS: Manufacturing, Etching, Design, Lithography, Optics manufacturing, Metalenses, Lens design, Phase shifts, Thin films, Infrared telescopes

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Proceedings Article | 10 April 2024 Presentation + Paper

Simulating use of displacement Talbot lithography for high volume AR waveguide manufacturing

Kelsey Wooley, Maryvonne Chalony, Andrew M. Dawes, Zhixin Wang, Harun Solak, Lawrence Melvin

Proceedings Volume 12954, 1295414 (2024) https://doi.org/10.1117/12.3014541

KEYWORDS: Design, Optical gratings, Manufacturing, Eye, Lithography, Waveguides, Printing, Etching, Diffractive optical elements, Augmented reality

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Proceedings Article | 9 April 2024 Presentation + Paper

Metalens manufacturing complexities and costs

Lawrence Melvin, Maryvonne Chalony, Andrew M. Dawes, Bernd Kuechler, Rainer Zimmermann, Emilie Viasnoff, Ying Zhou, Al Blais

Proceedings Volume 12958, 129580A (2024) https://doi.org/10.1117/12.3010491

KEYWORDS: Manufacturing, Design, Lithography, Metalenses, Optics manufacturing, Etching, Optical proximity correction, Optical components, Scanners, Silicon

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Proceedings Article | 13 March 2024 Poster

Modeling tools for use of displacement Talbot lithography for high volume AR waveguide manufacturing

Kelsey Wooley, Andrew M. Dawes, Zhixin Wang, Maryvonne Chalony, Harun Solak, Lawrence Melvin

Proceedings Volume PC12913, PC129130R (2024) https://doi.org/10.1117/12.3003908

KEYWORDS: Waveguides, Modeling, Lithography, Augmented reality, Printing, Manufacturing, Autoregressive models, Optical lithography, Design and modelling, Optics manufacturing

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Proceedings Article | 21 November 2023 Presentation + Paper

Displacement Talbot lithography process simulation analysis

Andrew M. Dawes, Zhixin Wang, Lawrence Melvin, Bernd Kuechler, Wolfgang Demmerle, Al Blais, Kelsey Wooley, Harun Solak

Proceedings Volume 12751, 127510C (2023) https://doi.org/10.1117/12.2690860

KEYWORDS: Printing, Lithography, Line edge roughness, Semiconducting wafers, Image transmission, Optical gratings, Light sources and illumination, Photoresist processing, Collimation, Optical lithography

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Proceedings Article | 21 February 2014 Paper

Multimode quantum state tomography of slow light in rubidium vapor

Andrew Dawes, Noah Holte, Hunter Dassonville

Proceedings Volume 8998, 89980H (2014) https://doi.org/10.1117/12.2047536

KEYWORDS: Electroluminescent displays, Quantum memory, Slow light, Sensors, Rubidium, Detector arrays, Tomography, Quantum information, Charge-coupled devices, Transparency

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Proceedings Article | 6 March 2013 Paper

Quantum state tomography of slow and stored light

Andrew M. Dawes, Noah Holte, Hunter Dassonville

Proceedings Volume 8636, 863610 (2013) https://doi.org/10.1117/12.2010474

KEYWORDS: Electroluminescent displays, Quantum memory, Data modeling, Sensors, Quantum information, Chemical species, Detector arrays, Charge-coupled devices, Tomography, Slow light

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Proceedings Article | 4 April 2005 Paper

Observation of ultra-low-light-level all-optical switching

Andrew Dawes, Susan Clark, Lucas Illing, Daniel Gauthier

Proceedings Volume 5735, (2005) https://doi.org/10.1117/12.601704

KEYWORDS: Switching, Switches, Chemical species, Rubidium, Modulation, Nonlinear optics, Polarization, Optical switching, Telecommunications, Optical components

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Showing 5 of 9 publications

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