Dr. Atsushi Uemoto Profile

Dr. Atsushi Uemoto

at Hitachi High-Tech Science Corp

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Author

Publications (6)

Proceedings Article | 30 October 2007 Paper

A semi-automated AFM photomask repair process for manufacturing application using SPR6300

Mario Dellagiovanna, Hidenori Yoshioka, Hiroyuki Miyashita, Shiaki Murai, Takuya Nakaue, Osamu Takaoka, Atsushi Uemoto, Syuichi Kikuchi, Ryoji Hagiwara, Stephane Benard

Proceedings Volume 6730, 673020 (2007) https://doi.org/10.1117/12.746405

KEYWORDS: Atomic force microscopy, Critical dimension metrology, Particles, Photomasks, Image processing, Scanning electron microscopy, Diamond, Manufacturing, Contamination, Scanners

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Proceedings Article | 9 November 2005 Paper

Advanced photomask repair technology for 65nm lithography (4)

Yasutoshi Itou, Yoshiyuki Tanaka, Osamu Suga, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida

Proceedings Volume 5992, 59924Y (2005) https://doi.org/10.1117/12.632756

KEYWORDS: Gallium, Photomasks, Quartz, Ions, Transmittance, Lithography, Monte Carlo methods, 193nm lithography, Binary data, Opacity

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Proceedings Article | 28 June 2005 Paper

Advanced photomask repair technology for 65nm lithography (3)

Yasutoshi Itou, Yoshiyuki Tanaka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617344

KEYWORDS: Photomasks, Lithography, Opacity, Computer aided design, Atomic force microscopy, Surface conduction electron emitter displays, 193nm lithography, Control systems, Acoustics, Etching

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Proceedings Article | 6 December 2004 Paper

Advanced photomask repair technology for 65-nm lithography (2)

Yasutoshi Itou, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida, Toshiya Ozawa

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.578615

KEYWORDS: Photomasks, Lithography, Etching, Computer aided design, Control systems, Surface conduction electron emitter displays, 193nm lithography, Chromium, Transmittance, Imaging systems

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Proceedings Article | 20 August 2004 Paper

Advanced photomask repair technology for 65-nm lithography (1)

Yasutoshi Itou, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Junichi Tashiro, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida, Toshiya Ozawa

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557789

KEYWORDS: Computer aided design, Photomasks, Lithography, Transmittance, Control systems, Carbon, Surface conduction electron emitter displays, 193nm lithography, Image resolution, Raman spectroscopy

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Showing 5 of 6 publications

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