Dr. Anto Yasaka Profile

Dr. Anto Yasaka

Director at Hitachi High-Tech Science Corp

SPIE Involvement:

Author

Publications (27)

Proceedings Article | 21 October 2014 Paper

Performance of GFIS mask repair system for various mask materials

Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Anto Yasaka, Shingo Yoshikawa, Koichi Kanno, Hiroyuki Miyashita, Naoya Hayashi

Proceedings Volume 9235, 92350F (2014) https://doi.org/10.1117/12.2069435

KEYWORDS: Photomasks, Etching, Scanning electron microscopy, Ions, Quartz, Semiconducting wafers, Critical dimension metrology, Phase shifts, Nitrogen

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Proceedings Article | 7 April 2011 Paper

Development of new FIB technology for EUVL mask repair

Fumio Aramaki, Takashi Ogawa, Osamu Matsuda, Tomokazu Kozakai, Yasuhiko Sugiyama, Hiroshi Oba, Anto Yasaka, Tsuyoshi Amano, Hiroyuki Shigemura, Osamu Suga

Proceedings Volume 7969, 79691C (2011) https://doi.org/10.1117/12.879609

KEYWORDS: Extreme ultraviolet lithography, Ions, Etching, Extreme ultraviolet, Silicon, Image resolution, Reflectivity, Ion beams, Mirrors, Ruthenium

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Proceedings Article | 25 September 2010 Paper

Study of EUV mask defect repair using FIB method

Tsuyoshi Amano, Noriaki Takagi, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Anto Yasaka, Yuichi Inazuki, Naoya Hayashi

Proceedings Volume 7823, 782323 (2010) https://doi.org/10.1117/12.864213

KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Cadmium sulfide, Image processing, Scanning electron microscopy, Transmission electron microscopy, Semiconducting wafers, Carbon, Ions

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Proceedings Article | 27 May 2010 Paper

FIB-CVD technology for EUV mask repair

Tsuyoshi Amano, Noriaki Takagi, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Anto Yasaka

Proceedings Volume 7748, 77481I (2010) https://doi.org/10.1117/12.867233

KEYWORDS: Chemical vapor deposition, Photomasks, Tungsten, Extreme ultraviolet, Carbon, Silicon, Gallium, Extreme ultraviolet lithography, Chemical analysis, Vacuum ultraviolet

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Proceedings Article | 11 May 2009 Paper

FIB mask repair technology for EUV mask

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Anto Yasaka, Tsukasa Abe, Hiroshi Mohri

Proceedings Volume 7379, 73792L (2009) https://doi.org/10.1117/12.824335

KEYWORDS: Photomasks, Carbon, Etching, Extreme ultraviolet, Hydrogen, Chemical vapor deposition, Contamination, Cadmium sulfide, Extreme ultraviolet lithography, Scanning electron microscopy

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Proceedings Article | 17 October 2008 Paper

Ga implantation and interlayer mixing during FIB repair of EUV mask defects

Yasushi Nishiyama, Tsuyoshi Amano, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Tomokazu Kozakai, Fumio Aramaki, Kensuke Shiina, Anto Yasaka, Ryoji Hagiwara

Proceedings Volume 7122, 71222J (2008) https://doi.org/10.1117/12.801428

KEYWORDS: Gallium, Reflectivity, Etching, Chromium, Silicon, Extreme ultraviolet, Chemical species, Ions, Absorption, Molybdenum

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Proceedings Article | 17 October 2008 Paper

Study of EUVL mask defect repair using FIB-GAE method

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Ryoji Hagiwara, Anto Yasaka

Proceedings Volume 7122, 71222H (2008) https://doi.org/10.1117/12.801214

KEYWORDS: Etching, Photomasks, Extreme ultraviolet lithography, Bridges, Scanning electron microscopy, Image processing, Extreme ultraviolet, Semiconducting wafers, Chromium, Reflectivity

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Proceedings Article | 19 May 2008 Paper

Damage analysis of EUV mask under Ga focused ion beam irradiation

Yasushi Nishiyama, Tsuyoshi Amano, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Tomokazu Kozakai, Syuichi Kikuchi, Kensuke Shiina, Anto Yasaka, Ryoji Hagiwara

Proceedings Volume 7028, 70280J (2008) https://doi.org/10.1117/12.793026

KEYWORDS: Gallium, Reflectivity, Extreme ultraviolet, Photomasks, Silicon, Ions, Chemical species, Absorption, Etching, Ion beams

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Proceedings Article | 19 May 2008 Paper

Evaluation of defect repair of EUVL mask pattern using FIB-GAE method

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Ryoji Hagiwara, Kensuke Shiina, Shuichi Kikuchi, Anto Yasaka

Proceedings Volume 7028, 70281T (2008) https://doi.org/10.1117/12.793071

KEYWORDS: Etching, Extreme ultraviolet lithography, Photomasks, Scanning electron microscopy, Image processing, Bridges, Reflectivity, Critical dimension metrology, Tantalum, Isotropic etching

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Proceedings Article | 1 November 2007 Paper

Mask rule check using priority information of mask patterns

Kokoro Kato, Yoshiyuki Taniguchi, Kuninori Nishizawa, Masakazu Endo, Tadao Inoue, Ryouji Hagiwara, Anto Yasaka

Proceedings Volume 6730, 67304F (2007) https://doi.org/10.1117/12.746549

KEYWORDS: Photomasks, Manufacturing, Inspection, Design for manufacturing, Data conversion, Software development, SRAF, Design for manufacturability, Optical proximity correction, Error analysis

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Proceedings Article | 23 October 2006 Paper

Advanced photomask repair technology for 65-nm lithography

Fumio Aramaki, Tomokazu Kozakai, Masashi Muramatsu, Yasuhiko Sugiyama, Yoshihiro Koyama, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Toshio Doi, Ryoji Hagiwara, Tatsuya Adachi, Anto Yasaka, Yoshiyuki Tanaka, Osamu Suga, Naoki Nishida, Youichi Usui

Proceedings Volume 6349, 63491E (2006) https://doi.org/10.1117/12.691195

KEYWORDS: Photomasks, Etching, Computer aided design, Lithography, Transmittance, Process control, Opacity, Data processing, Scanning electron microscopy, CAD systems

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Proceedings Article | 20 May 2006 Paper

Advanced photomask repair technology for 65-nm lithography

Fumio Aramaki, Tomokazu Kozakai, Yasuhiko Sugiyama, Masashi Muramatsu, Yoshihiro Koyama, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Ryoji Hagiwara, Anto Yasaka, Tatsuya Adachi, Yoshiyuki Tanaka, Osamu Suga, Naoki Nishida, Youichi Usui

Proceedings Volume 6283, 628310 (2006) https://doi.org/10.1117/12.681859

KEYWORDS: Etching, Photomasks, Quartz, Chromium, Transmittance, Scanning electron microscopy, Lithography, Visibility, Critical dimension metrology, Sensors

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Proceedings Article | 9 November 2005 Paper

Advanced photomask repair technology for 65nm lithography (4)

Yasutoshi Itou, Yoshiyuki Tanaka, Osamu Suga, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida

Proceedings Volume 5992, 59924Y (2005) https://doi.org/10.1117/12.632756

KEYWORDS: Gallium, Photomasks, Quartz, Ions, Transmittance, Lithography, Monte Carlo methods, 193nm lithography, Binary data, Opacity

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Proceedings Article | 28 June 2005 Paper

Advanced photomask repair technology for 65nm lithography (3)

Yasutoshi Itou, Yoshiyuki Tanaka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617344

KEYWORDS: Photomasks, Lithography, Opacity, Computer aided design, Atomic force microscopy, Surface conduction electron emitter displays, 193nm lithography, Control systems, Acoustics, Etching

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Proceedings Article | 6 December 2004 Paper

IP protection of mask data by rebuilding the design hierarchy using OASIS format

Kokoro Kato, Kuninori Nishizawa, Tadao Inoue, Anto Yasaka

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.577807

KEYWORDS: Parallel processing, Data storage, Process control, Local area networks, Software development, Control systems, Nanotechnology, Photomask technology, Computing systems, Environmental sensing

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Proceedings Article | 6 December 2004 Paper

Advanced photomask repair technology for 65-nm lithography (2)

Yasutoshi Itou, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Tomokazu Kozakai, Osamu Matsuda, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida, Toshiya Ozawa

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.578615

KEYWORDS: Photomasks, Lithography, Etching, Computer aided design, Control systems, Surface conduction electron emitter displays, 193nm lithography, Chromium, Transmittance, Imaging systems

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Proceedings Article | 20 August 2004 Paper

FIB mask repair technology for electron projection lithography

Yoh Yamamoto, Masakatsu Hasuda, Hiroyuki Suzuki, Makoto Sato, Osamu Takaoka, Hiroshi Matsumura, Noboru Matsumoto, Kouji Iwasaki, Ryoji Hagiwara, Katsumi Suzuki, Yutaka Ikku, Kazuo Aita, Takashi Kaito, Tatsuya Adachi, Anto Yasaka, Jiro Yamamoto, Teruo Iwasaki, Masaki Yamabe

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557731

KEYWORDS: Photomasks, Imaging systems, Opacity, Electron beam lithography, Projection lithography, Etching, Ion beams, Sensors, Image processing, Silicon

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Proceedings Article | 20 August 2004 Paper

Advanced photomask repair technology for 65-nm lithography (1)

Yasutoshi Itou, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Yasuhiko Sugiyama, Ryoji Hagiwara, Haruo Takahashi, Osamu Takaoka, Junichi Tashiro, Katsumi Suzuki, Mamoru Okabe, Syuichi Kikuchi, Atsushi Uemoto, Anto Yasaka, Tatsuya Adachi, Naoki Nishida, Toshiya Ozawa

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557789

KEYWORDS: Computer aided design, Photomasks, Lithography, Transmittance, Control systems, Carbon, Surface conduction electron emitter displays, 193nm lithography, Image resolution, Raman spectroscopy

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Proceedings Article | 17 December 2003 Paper

Advanced FIB mask repair technology for 90-nm/ArF lithography: III

Yoshiyuki Tanaka, Yasutoshi Itou, Nobuyuki Yoshioka, Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, Tomokazu Kozakai, Yoshihiro Koyama, Hiroshi Sawaragi, Yasuhiko Sugiyama, Masashi Muramatsu, Toshio Doi, Katsumi Suzuki, Mamoru Okabe, Masashi Shinohara, Osamu Matsuda, Kazuo Aita, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Satoh, Naoya Hayashi

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518026

KEYWORDS: Printing, Photomasks, Binary data, Image processing, Lithography, Ions, Opacity, Transmittance, Imaging systems, Surface conduction electron emitter displays

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Proceedings Article | 28 August 2003 Paper

Advanced FIB mask repair technology for 100-nm/ArF lithography: II

Ryoji Hagiwara, Anto Yasaka, Kazuo Aita, Osamu Takaoka, Yoshihiro Koyama, Tomokazu Kozakai, Toshio Doi, Masashi Muramatsu, Katsumi Suzuki, Yasuhiko Sugiyama, Osamu Matsuda, Mamoru Okabe, Shoji Shinohara, Masakatsu Hasuda, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Sato, Naoya Hayashi, Toshiya Ozawa, Yoshihiro Tanaka, Nobuyuki Yoshioka

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504212

KEYWORDS: Printing, Photomasks, Binary data, Lithography, Semiconducting wafers, Imaging systems, Opacity, Ions, Scanners, Transmittance

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Proceedings Article | 27 December 2002 Paper

Advanced FIB mask repair technology for 100-nm/ArF lithography

Ryoji Hagiwara, Anto Yasaka, Kazuo Aita, Osamu Takaoka, Yoshihiro Koyama, Tomokazu Kozakai, Toshio Doi, Masashi Muramatsu, Katsumi Suzuki, Yasuhiko Sugiyama, Hiroshi Sawaragi, Mamoru Okabe, Shoji Shinohara, Masakatsu Hasuda, Tatsuya Adachi, Yasutaka Morikawa, Masaharu Nishiguchi, Yasushi Sato, Naoya Hayashi, Toshiya Ozawa, Yoshihiro Tanaka, Nobuyuki Yoshioka

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467357

KEYWORDS: Photomasks, Binary data, Transmittance, Lithography, Opacity, Ions, Atomic force microscopy, Imaging systems, Image processing, Data modeling

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Proceedings Article | 5 September 2001 Paper

Advanced FIB mask repair technology for ArF lithography: III

Ryoji Hagiwara, Anto Yasaka, Osamu Takaoka, Tomokazu Kozakai, S. Yabe, Yoshihiro Koyama, Masashi Muramatsu, Toshio Doi, Kenji Suzuki, Mamoru Okabe, Kazuo Aita, Tatsuya Adachi, Shinji Kubo, Nobuyuki Yoshioka, Hiroaki Morimoto, Yasutaka Morikawa, Kazuya Iwase, Naoya Hayashi

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438373

KEYWORDS: Photomasks, Imaging systems, Prototyping, Lithography, Ions, Opacity, Semiconductors, 193nm lithography, Transmittance, Manufacturing

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Proceedings Article | 22 January 2001 Paper

Advanced FIB mask repair technology for ArF lithography: II

Shinji Kubo, Koji Hiruta, Hiroaki Morimoto, Anto Yasaka, Ryoji Hagiwara, Tatsuya Adachi, Yasutaka Morikawa, Kazuya Iwase, Naoya Hayashi

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410689

KEYWORDS: Photomasks, Opacity, Ions, Transmittance, Lithography, Carbon, Ion beams, Etching, Semiconducting wafers, Phase shifts

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Proceedings Article | 19 July 2000 Paper

Advanced FIB mask repair technology in ArF lithography

Koji Hiruta, Shinji Kubo, Hiroaki Morimoto, Anto Yasaka, Ryoji Hagiwara, Tatsuya Adachi, Yasutaka Morikawa, Kazuya Iwase, Naoya Hayashi

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392089

KEYWORDS: Carbon, Photomasks, Transmittance, Semiconducting wafers, Atomic force microscopy, Ion beams, Laser irradiation, Opacity, Lithography, Ions

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Proceedings Article | 12 February 1997 Paper

Advanced photomask reconstruction with the Seiko SIR 3000

Stephen Ruatta, Eryn Smith, Anto Yasaka

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301209

KEYWORDS: Photomasks, Glasses, Ion beams, Etching, Opacity, Gallium, Ions, Chromium, Inspection, Silicon

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Proceedings Article | 27 December 1996 Paper

Performance of gas-assisted FIB repair for opaque defects

Yasushi Satoh, Hiroshi Nakamura, Junji Fujikawa, Katsuhide Tsuchiya, Shigeru Noguchi, Kazuo Aita, Anto Yasaka

Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262799

KEYWORDS: Photomasks, Glasses, Printing, Etching, Gallium, Opacity, Phase shifts, Chromium, Semiconducting wafers, Ions

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Proceedings Article | 24 July 1996 Paper

Recent progress in repair accuracy of the focused ion-beam mask repair system

Kazuo Aita, Anto Yasaka, Tadashi Kitamura, Hiroshi Matsumura, Yasushi Satoh, Hiroshi Nakamura, Junji Fujikawa, Katsuhide Tsuchiya, Shigeru Noguchi

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245221

KEYWORDS: Ion beams, Ions, Silicon, Chromium, Photomasks, Opacity, Etching, Phase shifts, Lithium, Glasses

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Showing 5 of 27 publications

Proceedings Volume Editor (1)

SPIE Conference Volume | 10 May 2007

Photomask and Next-Generation Lithography Mask Technology XIV

Conference Committee Involvement (3)

Photomask and Next Generation Lithography Mask Technology XIV

17 April 2007 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XIII

18 April 2006 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XII

13 April 2005 | Yokohama, Japan

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