Dr. Bing Lu Profile

Dr. Bing Lu

at Freescale Semiconductor Inc

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 6 December 2004 Paper

Defect printability and inspection of EUVL mask

Bing Lu, James Wasson, Pawitter Mangat, Jonathan Cobb, Scott Hector, Donald Pettibone, Donna O'Connell

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569318

KEYWORDS: Inspection, Photomasks, Defect inspection, Scanning electron microscopy, Extreme ultraviolet lithography, Extreme ultraviolet, Printing, Defect detection, Reflectivity, Multilayers

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Proceedings Article | 20 May 2004 Paper

Process latitude measurements and their implications for CD control in EUV lithography

Jonathan Cobb, Richard Peters, Sergei Postnikov, Scott Hector, Bing Lu, Eric Weisbrod, James Wasson, Pawitter Mangat, Donna O'Connell

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537366

KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Optical proximity correction, Lithography, Photomasks, Critical dimension metrology, Data modeling, Monte Carlo methods, Scanners, Scanning electron microscopy

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SPIE Journal Paper | 1 April 2004

Effects of reticle reflectance on lithography

Kevin Cummings, Bernd Geh, Bing Lu, James Wasson, Pawitter Mangat

JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1668268

KEYWORDS: Photomasks, Reflectivity, Reticles, Semiconducting wafers, Reflection, Lithography, Quartz, Light scattering, Critical dimension metrology, Chromium

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Proceedings Article | 17 December 2003 Paper

157-nm attenuated phase-shift mask materials with irradiation stability

James Wasson, Nora Edwards, Bing Lu, Pawitter Mangat, Andrew Grenville

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517893

KEYWORDS: Inspection, Phase shifts, Photomasks, Attenuators, Semiconducting wafers, Reflection, Lithography, Vacuum ultraviolet, Optical properties, Chromium

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Proceedings Article | 17 December 2003 Paper

EUV radiation damage test on EUVL mask absorber materials

Bing Lu, James Wasson, Sang-In Han, Pawitter Mangat, Victoria Golovkina, Franco Cerrina

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517972

KEYWORDS: Extreme ultraviolet lithography, Reflectivity, Extreme ultraviolet, Hydrogen, Deep ultraviolet, Inspection, Plasma enhanced chemical vapor deposition, Plasma etching, Spectroscopy, Photomasks

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Proceedings Article | 17 December 2003 Paper

CD uniformity dependence on CAR PEB process and its improvement for EUVL mask fabrication

Bing Lu, James Wasson, Eric Weisbrod, Pawitter Mangat, Eric Ainley, Adolpho Rios, Kevin Nordquist

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517989

KEYWORDS: Critical dimension metrology, Extreme ultraviolet lithography, Mask making, Photoresist processing, Diffusion, Ultraviolet radiation, Lutetium, Electron beam lithography, Quartz, Semiconducting wafers

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Proceedings Article | 17 December 2003 Paper

Effects of reticle reflectance on lithography

Kevin Cummings, Bernd Geh, Bing Lu, James Wasson, Eric Weisbrod, William Dauksher, Kevin Nordquist, Pawitter Mangat

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.516925

KEYWORDS: Photomasks, Reflectivity, Semiconducting wafers, Reticles, Reflection, Lithography, Quartz, Light scattering, Critical dimension metrology, Chromium

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Proceedings Article | 16 June 2003 Paper

Evaluation of a high-performance chemically amplified resist for EUVL mask fabrication

Bing Lu, Eric Weisbrod, Pawitter Mangat, Kevin Nordquist, Eric Ainley

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.504553

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Critical dimension metrology, Semiconducting wafers, Mask making, Etching, Photoresist processing, Extreme ultraviolet, Silicon, Chemically amplified resists

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Proceedings Article | 2 June 2003 Paper

Simulation of repairing thin-film phase defect in masks for EUV lithography

Yeong-Uk Ko, David Joy, Scott Hector, Bing Lu

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485014

KEYWORDS: Monte Carlo methods, Photomasks, Extreme ultraviolet lithography, Electrons, Electron beams, Thin films, Gaussian beams, Diffusion, Radiation effects, Extreme ultraviolet

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Proceedings Article | 27 December 2002 Paper

Image placement error due to pattern transfer for EUV masks

Zorian Masnyj, James Wasson, Bing Lu, Eric Weisbrod, Pawitter Mangat, Kevin Nordquist, Eric Ainley, William Dauksher, Douglas Resnick

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.477479

KEYWORDS: Photomasks, Extreme ultraviolet, Chromium, Distortion, Lithography, Extreme ultraviolet lithography, Etching, Image processing, Reticles, Semiconducting wafers

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Proceedings Article | 1 July 2002 Paper

Inspection of EUV reticles

Donald Pettibone, Andrei Veldman, Ted Liang, Alan Stivers, Pawitter Mangat, Bing Lu, Scott Hector, James Wasson, Kenneth Blaedel, Emily Fisch, David Walker

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472311

KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Reflectivity, Silicon, Deep ultraviolet, Reticles, Semiconducting wafers, Multilayers, Glasses

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Proceedings Article | 20 August 2001 Paper

Evaluation of Shipley XP2040D positive chemically amplified resist for SCALPEL mask fabrication

Bing Lu, Zorian Masnyj, Pawitter Mangat, Kevin Nordquist, Eric Ainley, Douglas Resnick

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436703

KEYWORDS: Critical dimension metrology, Photomasks, Charged-particle lithography, Mask making, Silicon, Line edge roughness, Photoresist processing, Chemically amplified resists, Semiconducting wafers, Scanning electron microscopy

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Proceedings Article | 25 June 1999 Paper

Novel fiducial grid for x-ray masks

Choi Soo, Shobhna Chandra, Kong Jong Ren, Antony Bourdillon, Bing Lu

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351158

KEYWORDS: Luminescence, Photomasks, X-ray lithography, Confocal microscopy, Electron beam lithography, Microscopes, X-rays, Lithography, Synchrotrons, Semiconducting wafers

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Proceedings Article | 25 June 1999 Paper

Evaluation of photoacid generators in chemically amplified resists for x-ray lithography using an on-wafer photoacid determination technique

Bing Lu, Paul Dentinger, James Taylor, Gilbert Feke, Dan Hessman, Qiang Wu, Robert Grober

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351121

KEYWORDS: Luminescence, Lithography, Semiconducting wafers, Chemically amplified resists, Hydrogen, Halogens, X-ray lithography, X-rays, FT-IR spectroscopy, Nondestructive evaluation

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Proceedings Article | 5 June 1998 Paper

Surface chemistry of GaAs wafers and reaction with chemically amplified resists during resist processing

Bing Lu, Olga Vladimirsky, James Taylor, Niru Dandekar

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309610

KEYWORDS: Semiconducting wafers, Gallium arsenide, Oxides, Photoresist processing, Chemical analysis, Gallium, Ions, Mass spectrometry, Spectroscopy, Optical lithography

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Showing 5 of 15 publications

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