Mr. Brian Chi-Chuang Lee Profile

Brian Chi-Chuang Lee

Team Member at Taiwan Semiconductor Mfg Co

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Author

Publications (4)

Proceedings Article | 8 March 2016 Paper

Improving focus performance at litho using diffraction-based focus metrology, novel calibration methods, interface, and control loop

Jiarui Hu, Y. L. Chen, K. H. Chen, Brian Lee, Frankie Tsai, C. M. Ke, C. H. Liao, Desmond Ngo, Benny Gosali, Robin Tijssen, Vincent Huang, Ward Tu, Marc Noot, Maryana Escalante Marun, Christian Leewis, Carlo Luijten, Frank Staals, Martijn Van Veen, Francois Furthner, Stuart Young, Kaustuve Bhattacharyya

Proceedings Volume 9778, 977829 (2016) https://doi.org/10.1117/12.2220373

KEYWORDS: Metrology, Calibration, Scanners, Process control, Interfaces, Optical lithography, Semiconducting wafers, Photoresist materials, Finite element methods, Inspection, Data modeling, Diffraction

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Proceedings Article | 10 May 2005 Paper

Evaluation of line and hole measurement by high-resolution low-magnification CD SEM

Chih-Ming Ke, Chi-Chuang Lee, Yu-Hsi Wang, Heng-Jen Lee, Chin-Hsiang Lin, Tsai-Sheng Gau, Burn Lin, Hiroki Kawada, Kazuhiro Ueda, Hiroaki Nomura, Nelson Ren, Takashi Iizumi

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601133

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Line edge roughness, Finite element methods, Metrology, Wafer-level optics, Optical testing, Cadmium, Inspection

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Proceedings Article | 10 May 2005 Paper

Monitoring method for automated CD-SEM recipes

Tatsuya Maeda, Satoru Iwama, Makoto Nishihara, Daniel Berger, Andrew Berger, Kazuhiro Ueda, Takenouchi Kenichi, Takashi Iizumi

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601107

KEYWORDS: Video, Semiconducting wafers, Scanning electron microscopy, Video compression, Image resolution, RGB color model, Image compression, Prototyping, Error analysis, Semiconductor manufacturing

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Proceedings Article | 28 May 2004 Paper

General scaling law of optical lithography: optical theory

Chun-Kuang Chen, Tsai-Sheng Gau, Li-Jui Chen, Chi-Chuang Lee, Jaw-Jung Shin, Anthony Yen, Burn-Jeng Lin

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536667

KEYWORDS: Optical lithography, Optics manufacturing, Manufacturing

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