This short course intends to enrich the attendees' understanding of image formation physics through the lens and in the photoresist. They will learn the correct actions to take in improving the image. Optimizing operating conditions without the knowledge can result in a large number of test wafers, non-converging iterations, inconclusive experiments, waste of processing allocations, low yield, and long production delay.

This short course intends to enrich the attendees' understanding of lithography issues that they often encounter, help them design better chips, and develop better processes to make the chips meet better specs.