Dr. Cao Zhang Profile

Dr. Cao Zhang

at KLA Corp

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Author

Publications (4)

Proceedings Article | 13 November 2024 Presentation

Nanometer-to-millimeter scale computational lithography for the study, detection, classification, repair, and reduction of stochastic defects in EUVL

John Biafore, Mark Smith, Anatoly Burov, Pradeep Vukkadala, Guy Parsey, Cao Zhang, Craig Higgins, Kunlun Bai, Trey Graves, Yi Liu, Janez Krek, Sergei Bakarian, Kyeongeun Ko, Chi-Ping Liu, Alex Arkhipov, Roel Gronheid, Kaushik Sah, Loemba Bouckou, Andrew Cross, Vikram Tolani, Ady Levy

Proceedings Volume PC13215, PC1321509 (2024) https://doi.org/10.1117/12.3034555

KEYWORDS: Extreme ultraviolet lithography, Stochastic processes, Inspection, Extreme ultraviolet, Computational lithography, Photoresist processing, Photoresist materials, Semiconducting wafers, Metrology, Printing

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Proceedings Article | 10 April 2024 Poster + Paper

Hotspot discovery and variability analysis for advanced EUV processes

Kaushik Sah, Zhijin Chen, Yao Zhang, Liming Zhang, Cao Zhang, Craig Higgins, Anatoly Burov, Guy Parsey, Pradeep Vukkadala, Roel Gronheid, Arpit Jain, Ramakanth Ramini, Ankur Agrawal, Garima Sharma, Andrew Cross, Syamashree Roy, Victor Blanco

Proceedings Volume 12955, 129553H (2024) https://doi.org/10.1117/12.3011178

KEYWORDS: Stochastic processes, Scanning electron microscopy, Design, Semiconducting wafers, Inspection, Metrology, Extreme ultraviolet lithography, Defect inspection

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Proceedings Article | 21 November 2023 Presentation + Paper

Rigorous 3D probabilistic computational lithography and chip-level inspection for EUV stochastic failure detection

Eunju Kim, Wooseok Kim, Jonggwan Lee, Seongjong Kim, Sukyong Lee, Nohong Kwak, Mincheol Kang, Yongchul Jeong, Myungsoo Hwang, Chang-Min Park, Kyoil Koo, Seongtae Jeong, John Biafore, Mark Smith, Trey Graves, Anatoly Burov, Pradeep Vukkadala, Guy Parsey, Cao Zhang, Kunlun Bai, Janez Krek, Craig Higgins, Sergei Bakarian, Kyeongeun Ko, Roel Gronheid, Kaushik Sah, Andrew Cross, Yi Liu, Alessandro Vaglio Pret, Chris Walker, Vikram Tolani, George Hwa, Peter Hu, Chang Song, Alex Arkhipov, Loemba Bouckou, Chi-Ping Liu, Xiaochun Yang, Kana O'Hara, Donghwan Son

Proceedings Volume 12750, 127500C (2023) https://doi.org/10.1117/12.2687373

KEYWORDS: Stochastic processes, Inspection, Extreme ultraviolet, Computational lithography, Printing, Semiconducting wafers, Photoresist materials, Extreme ultraviolet lithography, Statistical analysis, Physical phenomena

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Proceedings Article | 12 June 2012 Paper

Application of in-situ digital holography in the study of particles, organisms and bubbles within their natural environment

Siddharth Talapatra, James Sullivan, Joseph Katz, Michael Twardowski, Helen Czerski, Percy Donaghay, Jiarong Hong, Jan Rines, Malcolm McFarland, Aditya Nayak, Cao Zhang

Proceedings Volume 8372, 837205 (2012) https://doi.org/10.1117/12.920570

KEYWORDS: Particles, Holograms, Holography, Acoustics, Digital holography, Resonators, Data acquisition, Organisms, Ocean optics, Water

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