Dr. Malahat A. Tavassoli
Area Engineering Manager at Intel Corp
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 12 November 2024 Presentation + Paper
Mitchell First, Elba Gomar-Nadal, Jeff Hsiao, Farhood Rasouli, Malahat Tavassoli, Chunzeng Li, Cassandra Phillips, Jason Osborne, Peter De Wolf
Proceedings Volume 13216, 132160W (2024) https://doi.org/10.1117/12.3037631
KEYWORDS: Atomic force microscopy, FT-IR spectroscopy, Contamination, Plastics, Photomasks, Infrared imaging, Chemical analysis, Equipment, Spectroscopy

Proceedings Article | 12 January 2024 Presentation + Paper
Roman Schmeissner, Susanne Toepfer, Mikhail Poretskiy, Sven Martin, Stephan Zschaeck, Martin Steinhardt, Vivek Mishra, Cindy Zheng, Kowtilya Bijjula, Malahat Tavassoli
Proceedings Volume PC12751, PC1275104 (2024) https://doi.org/10.1117/12.2688259
KEYWORDS: Image registration, Calibration, Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Overlay metrology, Lithography, Deep ultraviolet, Photomasks, Metrology

Proceedings Article | 21 November 2023 Presentation + Paper
Elba Gomar-Nadal, Malahat Tavassoli, Kowtilya Bijjula, Stuart Sherwin, Matt Hettermann, Christian Wilson, Feng Dong, Dave Houser, Alexander Khodarev, Chami Perera, Patrick Naulleau
Proceedings Volume 12751, 127510O (2023) https://doi.org/10.1117/12.2688453
KEYWORDS: Phase shifts, Extreme ultraviolet, Metrology, Reflectance spectroscopy, Reflectometry, Spectroscopy, Signal attenuation, Refractive index, Phase measurement, Thin films

Proceedings Article | 21 November 2023 Presentation + Paper
Deepan Kishore Kumar, Varun Mohan, Hatsey Frezghi, Adam Seeger, Malahat Tavassoli, Masayuki Kuribara, Kiyoshi Oura, Wataru Ito, Soichi Shida, Tatsuro Okawa, Mark Sheppard, Toshimichi Iwai
Proceedings Volume 12751, 127510R (2023) https://doi.org/10.1117/12.2687660
KEYWORDS: Metrology, Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Photomasks, Optical proximity correction, Reticles

Proceedings Article | 9 September 2013 Paper
Proceedings Volume 8880, 88800Q (2013) https://doi.org/10.1117/12.2027231
KEYWORDS: Critical dimension metrology, Extreme ultraviolet, Scanning electron microscopy, Scatterometry, Photomasks, Lithography, Spectroscopy, Metrology, Cadmium, Line edge roughness

Showing 5 of 20 publications
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