Dr. Christoph Spengler Profile

Dr. Christoph Spengler

at IMS Nanofabrication GmbH

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Author

Publications (6)

SPIE Journal Paper | 10 February 2024 Open Access

Multi-beam mask writing opens up new fields of application, including curvilinear mask pattern for high numerical aperture extreme ultraviolet lithography

Mathias Tomandl, Christoph Spengler, Peter Hudek, Christof Klein, Hans Loeschner, Elmar Platzgummer

JM3, Vol. 23, Issue 01, 011205, (February 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.1.011205

KEYWORDS: Extreme ultraviolet, Distortion, Lenses, Nanofabrication, Industry, Magnetism, Industrial applications, Lithography, Extreme ultraviolet lithography, Projection systems

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Proceedings Article | 22 November 2023 Presentation

MBMW-301: paving the way towards the angstrom era of mask writing lithography

Christoph Spengler, Christof Klein, Hans Loeschner, Elmar Platzgummer

Proceedings Volume PC12751, PC127510R (2023) https://doi.org/10.1117/12.2688204

KEYWORDS: Lithography, Nanofabrication, Extreme ultraviolet, Standards development, Optical lithography

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Proceedings Article | 5 October 2023 Paper

Multi-beam mask writing opens up new fields of application

Mathias Tomandl, Christoph Spengler, Christof Klein, Hans Loeschner, Elmar Platzgummer

Proceedings Volume 12802, 1280204 (2023) https://doi.org/10.1117/12.2678532

KEYWORDS: Distortion, Lenses, Nanofabrication, Magnetism, Extreme ultraviolet, Industry, Projection systems, Industrial applications, Mask making, Advanced patterning

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Proceedings Article | 1 November 2022 Paper

New registration calibration strategies for MBMW tools by PROVE measurements

Michael Haberler, Peter Hudek, Michal Jurkovic, Elmar Platzgummer, Christoph Spengler, Lena Bachar, Steffen Steinert, Hui-Wen Lu-Walther, Dirk Beyer

Proceedings Volume 12472, 124720L (2022) https://doi.org/10.1117/12.2641517

KEYWORDS: Image registration, Calibration, Photomasks, Metrology, Overlay metrology, Electron beams, Extreme ultraviolet lithography, Distortion, Semiconductors

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Proceedings Article | 12 November 2018 Presentation + Paper

Mask process correction validation for multi-beam mask lithography

Ingo Bork, Peter Buck, Christian Bürgel, Bhardwaj Durvasula, Stefan Eder-Kapl, Peter Hudek, Michal Jurkovic, Jan Klikovits, Elmar Platzgummer, Jed Rankin, Rao Nageswara, Murali Reddy, Christoph Spengler

Proceedings Volume 10810, 108100K (2018) https://doi.org/10.1117/12.2503284

KEYWORDS: Photomasks, SRAF, Calibration, Cadmium, Lithography, Double patterning technology, Data modeling, Etching, Vestigial sideband modulation, Scanning electron microscopy

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Showing 5 of 6 publications

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