Frederick R. Peiffer
Technical Staff Member at Broadcom Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 8 November 2005 Paper
Christopher Braun, Gerry Krupka, Frederick Peiffer, Thomas Polk, Evelyn Roadcap, John Sosik, Gregory Van Allen, William Wilkinson
Proceedings Volume 5992, 59923O (2005) https://doi.org/10.1117/12.632243
KEYWORDS: Photomasks, Manufacturing, Integrated circuits, Databases, Semiconducting wafers, Photomask technology, Prototyping, Control systems, Data modeling, Integrated circuit design

Proceedings Article | 27 December 1996 Paper
Joseph Garofalo, Pat Watson, Lee Trimble, Raymond Cirelli, Albert Colina, Ilya Grodnensky, B. Herrero, A. Dunbar, Frederick Peiffer, R. Takahashi, Regine Tarascon-Auriol, Willie Yarbrough, Ludwik Zych
Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262814
KEYWORDS: Photomasks, Optical proximity correction, Deep ultraviolet, Lithography, Resolution enhancement technologies, Semiconducting wafers, Binary data, Mask making, Process modeling, Optical lithography

Proceedings Article | 27 December 1996 Paper
Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262832
KEYWORDS: Metrology, Reticles, Lithography, Photomasks, Manufacturing, Standards development, Optical lithography, Time metrology, Image registration, Glasses

Proceedings Article | 8 December 1995 Paper
Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228161
KEYWORDS: Reticles, Photoresist processing, Inspection, Electron beams, Tolerancing, Manufacturing, Opacity, Polymers, Coating, Photomasks

Conference Committee Involvement (2)
Photomask Technology
9 September 2003 | Monterey, California, United States
Photomask Technology
1 October 2002 | Monterey, CA, United States
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