Dr. Glen Mori Profile

Dr. Glen Mori

at Applied Materials Inc

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Author

Publications (6)

Proceedings Article | 1 April 2009 Paper

Photoresist stabilization for double patterning using 172 nm photoresist curing

Thomas Wallow, Junyan Dai, Charles Szmanda, Hiram Cervera, Chi Truong, Nikolaos Bekiaris, Jong-Wook Kye, Ryoung-Han Kim, Harry Levinson, Glen Mori

Proceedings Volume 7273, 72730D (2009) https://doi.org/10.1117/12.814468

KEYWORDS: Photoresist processing, Semiconducting wafers, Double patterning technology, Ultraviolet radiation, Photoresist materials, Image processing, Optical lithography, Lithography, Fourier transforms, Antireflective coatings

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Proceedings Article | 1 April 2009 Paper

Post-develop blob defect reduction

Masahiko Harumoto, Sei Negoro, Akihiro Hisai, Michio Tanaka, Glen Mori, Mark Slezak

Proceedings Volume 7273, 72730P (2009) https://doi.org/10.1117/12.813605

KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Raman spectroscopy, Carbon dioxide, Photoresist processing, Bridges, Image processing, Defect detection, Printing, Particles

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Proceedings Article | 1 April 2009 Paper

Performance of an ArF siloxane BARC exposed to a 172-nm UV cure for double patterning applications

Ze-Yu Wu, Joseph Kennedy, Song-Yuan Xie, Ron Katsanes, Kyle Flanigan, Junyan Dai, Nikolaos Bekiaris, Hiram Cervera, Glen Mori, Thomas Wallow

Proceedings Volume 7273, 72731I (2009) https://doi.org/10.1117/12.814416

KEYWORDS: Ultraviolet radiation, Photoresist materials, Optical lithography, Semiconducting wafers, Double patterning technology, Silicon, Optical properties, FT-IR spectroscopy, Lithography, Time division multiplexing

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Proceedings Article | 1 April 2009 Paper

Improved CD uniformity for chemical shrink patterning

Lu Chen, Nikolaos Bekiaris, Timothy Michaelson, Glen Mori

Proceedings Volume 7273, 72730F (2009) https://doi.org/10.1117/12.814359

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Lithography, Temperature metrology, Optical lithography, Resolution enhancement technologies, Industrial chemicals, Chemical reactions, Photoresist materials, Extreme ultraviolet lithography

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Proceedings Article | 1 April 1998 Paper

Analysis and characterization of In-film defects generated during sputter deposition of aluminum-alloy films

Murali Abburi, Vikram Pavate, Sunny Chiang, Keith Hansen, Glen Mori, Murali Narasimhan, Sesh Ramaswami, Jaim Nulman, Daryl Restaino

Proceedings Volume 3275, (1998) https://doi.org/10.1117/12.304398

KEYWORDS: Aluminum, Sputter deposition, Manufacturing, Plasma, Semiconducting wafers, Yield improvement, Optical microscopy, Dielectrics, Hydrogen, Semiconductor manufacturing

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Proceedings Article | 5 September 1997 Paper

Correlation between aluminum alloy sputtering target metallurgical characteristics, arc initiation, and in-film defect intensity

Vikram Pavate, Murali Abburi, Sunny Chiang, Keith Hansen, Glen Mori, Murali Narasimhan, Sesh Ramaswami, Jaim Nulman, Daryl Restaino

Proceedings Volume 3214, (1997) https://doi.org/10.1117/12.284663

KEYWORDS: Aluminum, Sputter deposition, Manufacturing, Hydrogen, Plasma, Yield improvement, Semiconducting wafers, Dielectrics, Semiconductor manufacturing, Solids

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Showing 5 of 6 publications

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