Dr. Timothy B. Michaelson Profile

Dr. Timothy B. Michaelson

Senior Member of Technical Staff at Applied Materials Inc

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 1 April 2009 Paper

Improved CD uniformity for chemical shrink patterning

Lu Chen, Nikolaos Bekiaris, Timothy Michaelson, Glen Mori

Proceedings Volume 7273, 72730F (2009) https://doi.org/10.1117/12.814359

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Lithography, Temperature metrology, Optical lithography, Resolution enhancement technologies, Industrial chemicals, Chemical reactions, Photoresist materials, Extreme ultraviolet lithography

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SPIE Journal Paper | 1 March 2009

Pattern recognition of shape-encoded hydrogel biosensor arrays

Jason Meiring, Saul Lee, Elizabeth Costner, Matthew Schmid, Timothy Michaelson, C. Grant Willson, Scott Grayson

OE, Vol. 48, Issue 03, 037201, (March 2009) https://doi.org/10.1117/12.10.1117/1.3099722

KEYWORDS: Sensors, Pattern recognition, Optical pattern recognition, Biosensors, Detection and tracking algorithms, Optical engineering, Optical alignment, Target recognition, Luminescence, Optical lithography

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Proceedings Article | 15 April 2008 Paper

Wafer shape compensation at the track PEB for improved CD uniformity

Timothy Michaelson, Junyan Dai, Lu Chen, Hiram Cervera, Brian Lue, Harald Herchen, Kim Vellore, Nikolaos Bekiaris

Proceedings Volume 6923, 69233M (2008) https://doi.org/10.1117/12.772894

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Particles, Lithography, Scanners, Scanning electron microscopy, Wafer testing, Lutetium, Metrology, Silicon films

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SPIE Journal Paper | 1 April 2006

Line edge roughness and intrinsic bias for two methacrylate polymer resist systems

Adam Pawloski, Alden Acheta, Harry Levinson, Timothy Michaelson, Andrew Jamieson, Yukio Nishimura, Carlton Willson

JM3, Vol. 5, Issue 02, 023001, (April 2006) https://doi.org/10.1117/12.10.1117/1.2200675

KEYWORDS: Line edge roughness, Polymers, Diffusion, Data modeling, Optical lithography, Image quality, Systems modeling, Photoresist materials, Chemical analysis, Scanning electron microscopy

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Proceedings Article | 4 May 2005 Paper

The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness

Timothy Michaelson, Adam Pawloski, Alden Acheta, Yukio Nishimura, C. Grant Willson

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599848

KEYWORDS: Line edge roughness, Photoresist materials, Polymers, Diffusion, Data modeling, Semiconducting wafers, Scanning electron microscopy, Image processing, Data conversion, Mathematical modeling

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Proceedings Article | 4 May 2005 Paper

Using mesoscale simulation to explore photoresist line edge roughness

Jason Meiring, Timothy Michaelson, Andrew Jamieson, Gerard Schmid, Carlton Willson

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599736

KEYWORDS: Line edge roughness, Monte Carlo methods, Molecules, Polymers, Photoresist materials, Image quality, Stochastic processes, Computer simulations, Lithography, Diffusion

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Proceedings Article | 14 May 2004 Paper

Understanding the role of base quenchers in photoresists

Timothy Michaelson, Andrew Jamieson, Adam Pawloski, Jeffrey Byers, Alden Acheta, C. Willson

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537658

KEYWORDS: Photoresist materials, Line edge roughness, Critical dimension metrology, Optical lithography, Polymers, Mathematical modeling

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Proceedings Article | 24 July 2002 Paper

Acid mobility in chemically amplified photoresists

Michael Stewart, Darren Becker, Timothy Stachowiak, Gerard Schmid, Timothy Michaelson, Hoang Tran, C. Grant Willson

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474168

KEYWORDS: Diffusion, Polymers, Glasses, Photoresist materials, Molecules, Adaptive optics, Temperature metrology, Systems modeling, Chemical reactions, Chemical analysis

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In a chemically amplified resist the exposure energy is used to generate a catalytic species, which promotes a solubility-switching reaction during a post exposure processing step. Using an absorbed photon to generate a catalyst, instead of using it to directly cause a solubility-switching photochemical reaction, allows for much lower exposure doses to be used for patterning since the catalytic species can eventually promote multiple solubility-switching events instead of just one. Some level of catalyst mobility is necessary to achieve the amplification effect as the catalyst must move from reaction site to reaction site, but any catalyst mobility creates the possibility of movement from exposed regions into unexposed regions causing image blur or line width spreading. As the catalyst diffuses in the resist, it promotes chemical reactions; these chemical reactions complicate analyses of catalyst diffusion by changing the chemical environment of the diffusant. Thus, the material properties of the surrounding resin are changing, sometimes drastically, as the catalyst diffuses. In addition to simple changes in material type, the chemical reaction also generates a transient material state as reaction by-products either remain in the resist film or desorb. The variation in lifetime of this transient state is another factor that must be considered in a full analysis. This work reports a method to separate reaction effects from catalyst diffusion effects. Acid diffusion in polymers which are close structural analogues to poly(4-t-butyloxycarbonyloxystrene) (TBOCST), while being unreactive to diffusing acidic molecules, was studied. Specifically, the diffusion properties of photogenerated perfluorobutanesulfonic acid in the unreactive TBOCST analogues poly(4-isopropyloxycarbonyloxystyrene) and poly(4-neopentyloxycarbonyloxysytrene) are reported. Measuring and understanding diffusion in these analogue polymers provides insight into the more complicated, and more important, reaction-diffusion processes of TBOCST.

Proceedings Article | 25 June 1999 Paper

Step and flash imprint lithography: a new approach to high-resolution patterning

Matthew Colburn, Stephen Johnson, Michael Stewart, S. Damle, Todd Bailey, Bernard Choi, M. Wedlake, Timothy Michaelson, S. Sreenivasan, John Ekerdt, C. Grant Willson

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351155

KEYWORDS: Etching, Semiconducting wafers, Lithography, Silicon, Photomasks, Quartz, Ultraviolet radiation, Liquids, Interfaces, Chromium

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Showing 5 of 9 publications

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