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Dr. Han-Kwang Nienhuys
at ASML Netherlands BV
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Publications (1)
Proceedings Article | 27 April 2023 Presentation + Paper
Soft x-ray: novel metrology for 3D profilometry and device pitch overlay
Christina Porter, Teis Coenen, Niels Geypen, Sandy Scholz, Loes van Rijswijk, Han-Kwang Nienhuys, Jeroen Ploegmakers, Johan Reinink, Hugo Cramer, Rik van Laarhoven, David O'Dwyer, Peter Smorenburg, Andrea Invernizzi, Ricarda Wohrwag, Hugo Jonquiere, Juliane Reinhardt, Omar el Gawhary, Simon Mathijssen, Peter Engblom, Heidi Chin, William Blanton, Sury Ganesan, Brian Krist, Florian Gstrein, Mark Phillips
Proceedings Volume 12496, 124961I (2023) https://doi.org/10.1117/12.2658495
KEYWORDS: Etching, Metrology, Overlay metrology, Signal detection, Diffraction, Semiconducting wafers, 3D metrology, X-rays, Nanosheets, Scatterometry
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