Dr. Peter D. Engblom Profile

Dr. Peter D. Engblom

Sr. Process Engineer at ASML Hillsboro

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Author

Publications (6)

Proceedings Article | 27 April 2023 Presentation + Paper

Soft x-ray: novel metrology for 3D profilometry and device pitch overlay

Christina Porter, Teis Coenen, Niels Geypen, Sandy Scholz, Loes van Rijswijk, Han-Kwang Nienhuys, Jeroen Ploegmakers, Johan Reinink, Hugo Cramer, Rik van Laarhoven, David O'Dwyer, Peter Smorenburg, Andrea Invernizzi, Ricarda Wohrwag, Hugo Jonquiere, Juliane Reinhardt, Omar el Gawhary, Simon Mathijssen, Peter Engblom, Heidi Chin, William Blanton, Sury Ganesan, Brian Krist, Florian Gstrein, Mark Phillips

Proceedings Volume 12496, 124961I (2023) https://doi.org/10.1117/12.2658495

KEYWORDS: Etching, Metrology, Overlay metrology, Signal detection, Diffraction, Semiconducting wafers, 3D metrology, X-rays, Nanosheets, Scatterometry

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Proceedings Article | 12 April 2013 Paper

A study on the automation of scanner matching

Yuan He, Alexander Serebryakov, Scott Light, Vivek Jain, Erik Byers, Ronald Goossens, Zhi-Yuan Niu, Peter Engblom, Scott Larson, Bernd Geh, Craig Hickman, Hoyoung Kang

Proceedings Volume 8683, 86830W (2013) https://doi.org/10.1117/12.2014402

KEYWORDS: Scanners, Semiconducting wafers, Critical dimension metrology, Wafer-level optics, Optical lithography, Metrology, Cadmium, Optics manufacturing, Databases, Diffractive optical elements

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Proceedings Article | 23 March 2011 Paper

Advanced wavefront engineering for improved imaging and overlay applications on a 1.35 NA immersion scanner

Frank Staals, Alena Andryzhyieuskaya, Hans Bakker, Marcel Beems, Jo Finders, Thijs Hollink, Jan Mulkens, Angelique Nachtwein, Rob Willekers, Peter Engblom, Toralf Gruner, Youping Zhang

Proceedings Volume 7973, 79731G (2011) https://doi.org/10.1117/12.880759

KEYWORDS: Wavefronts, Photomasks, Scanners, Source mask optimization, Optimization (mathematics), Semiconducting wafers, 3D acquisition, Reticles, Computational lithography, 3D image processing

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Proceedings Article | 4 March 2010 Paper

Simulation-based pattern matching using scanner metrology and design data to reduce reliance on CD metrology

Yuan He, Erik Byers, Scott Light, Danielle Hines, Anton Devilliers, Mike Hyatt, Jianming Zhou, Vinay Nair, Zongchang Yu, Yu Cao, Xu Xie, Wenjin Shao, Rafael Aldana, Ronald Goossens, Chang-Qun Ma, Junwei Lu, Hua-yu Liu, Chris Aquino, Peter Engblom, Tjitte Nooitgedagt, Eric Janda

Proceedings Volume 7640, 764014 (2010) https://doi.org/10.1117/12.848255

KEYWORDS: Scanners, Wafer-level optics, Semiconducting wafers, Metrology, Data modeling, Calibration, Critical dimension metrology, Optics manufacturing, Performance modeling, Optical simulations

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Proceedings Article | 4 March 2010 Paper

Improving aberration control with application specific optimization using computational lithography

Jianming Zhou, Youping Zhang, Peter Engblom, Mike Hyatt, Eric Wu, Martin Snajdr, Anton deVilliers, Yuan He, Craig Hickman, Peng Liu, Dennis de Lang, Bernd Geh, Erik Byers, Scott Light

Proceedings Volume 7640, 76400K (2010) https://doi.org/10.1117/12.846697

KEYWORDS: Semiconducting wafers, Scanners, Computational lithography, Optimization (mathematics), Calibration, Finite element methods, Thermal modeling, Computer simulations, Data modeling, Critical dimension metrology

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Proceedings Article | 16 March 2009 Paper

Process transfer strategies between ASML immersion scanners

Yuan He, Peter Engblom, Jianming Zhou, Eric Janda, Anton Devilliers, Bernd Geh, Erik Byers, Jasper Menger, Steve Hansen, Mircea Dusa

Proceedings Volume 7274, 72742P (2009) https://doi.org/10.1117/12.816417

KEYWORDS: Scanners, Printing, Semiconducting wafers, Reticles, Calibration, Metrology, Scatterometry, Data modeling, Cadmium, Scanning electron microscopy

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Showing 5 of 6 publications

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