Mr. Hiroshi Fujita Profile

Hiroshi Fujita

at Dai Nippon Printing Co Ltd

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Author

Publications (21)

Proceedings Article | 22 April 2011 Paper

EB resolution capability with CP exposure

Masaki Kurokawa, Hideaki Isobe, Kenji Abe, Yoshihisa Oae, Akio Yamada, Shogo Narukawa, Mikio Ishikawa, Hiroshi Fujita, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 8081, 80810A (2011) https://doi.org/10.1117/12.897272

KEYWORDS: Photomasks, Semiconducting wafers, Sensors, Quartz, Vestigial sideband modulation, Silicon, Signal detection, Image resolution, Resolution enhancement technologies, Electron beams

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Proceedings Article | 15 May 2007 Paper

Hybrid EB-writing technique with a 50 kV-VSB writer and a 100 kV-SB writer for nanoimprint mold fabrication

Mikio Ishikawa, Masashi Sakaki, Naoko Kuwahara, Hiroshi Fujita, Tadahiko Takikawa, Hisatake Sano, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 6607, 66073I (2007) https://doi.org/10.1117/12.729045

KEYWORDS: Double patterning technology, Nanoimprint lithography, Photomasks, Neodymium, Optical alignment, Chromium, Nanolithography, Fabrication, Scanning electron microscopy, Quartz

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Proceedings Article | 9 November 2005 Paper

Image placement accuracy of single-membrane stencil masks for e-beam lithography

Minoru Kitada, Satoshi Yusa, Naoko Kuwahara, Hiroshi Fujita, Tadahiko Takikawa, Hisatake Sano, Morihisa Hoga

Proceedings Volume 5992, 59924R (2005) https://doi.org/10.1117/12.630114

KEYWORDS: Photomasks, Data corrections, Distortion, Silicon, Electron beam lithography, Metrology, Mask making, Data modeling, Semiconducting wafers, Printing

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Proceedings Article | 28 June 2005 Paper

Experimental analysis of image placement accuracy of single-membrane masks for LEEPL

Minoru Kitada, Yuuki Aritsuka, Satoshi Yusa, Naoko Kuwahara, Hiroshi Fujita, Tadahiko Takikawa, Hisatake Sano, Morihisa Hoga

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617290

KEYWORDS: Photomasks, Distortion, Charged-particle lithography, Electron beam direct write lithography, Silicon, Image analysis, Lithography, Metrology, Semiconducting wafers, Error analysis

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Proceedings Article | 6 May 2005 Paper

Device based evaluation of electron projection lithography

Carmelo Romeo, Pietro Cantu, Daniel Henry, Hidekazu Takekoshi, Noriyuki Hirayanagi, Kazuaki Suzuki, Martin McCallum, Hiroshi Fujita, Tadahiko Takikawa, Morihisa Hoga

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598751

KEYWORDS: Photomasks, Semiconducting wafers, Electron beam lithography, Optical lithography, Manufacturing, Etching, Projection lithography, Electron beams, Silicon, Printing

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Proceedings Article | 6 December 2004 Paper

CD-measurement technique for hole patterns on stencil mask

Mikio Ishikawa, Satoshi Yusa, Tadahiko Takikawa, Hiroshi Fujita, Hisatake Sano, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.575371

KEYWORDS: Photomasks, Semiconducting wafers, Scanning electron microscopy, Critical dimension metrology, Charged-particle lithography, Optical lithography, Lithography, Silicon, Holons, Printing

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Proceedings Article | 20 August 2004 Paper

Evaluation of image placement of EPL stencil masks

Satoshi Yusa, Mikio Ishikawa, Yoshinori Kinase, Tadahiko Takikawa, Hiroshi Fujita, Hisatake Sano, Morihisa Houga, Naoya Hayashi

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557774

KEYWORDS: Photomasks, Distortion, Semiconducting wafers, Data corrections, Image analysis, Data processing, Electron beams, Electron beam lithography, Projection lithography, Metrology

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Proceedings Article | 20 August 2004 Paper

Development of a LEEPL mask: flatness and IP measurements

Yuuki Aritsuka, Minoru Kitada, Masaru Kurosawa, Tadahiko Takikawa, Hiroshi Fujita, Hisatake Sano, Morihisa Hoga, Naoya Hayashi

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557777

KEYWORDS: Photomasks, Semiconducting wafers, Charged-particle lithography, Silicon, Electron beam lithography, Optical testing, Projection lithography, Oxides, Doping, Etching

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Proceedings Article | 20 May 2004 Paper

200-mm EPL stencil mask fabrication and metrology at DNP: IP and CD accuracy within subfield

Tadahiko Takikawa, Mikio Ishikawa, Satoshi Yusa, Yoshinori Kinase, Hiroshi Fujita, Morihisa Hoga, Naoya Hayashi, Hisatake Sano

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535108

KEYWORDS: Photomasks, Metrology, Distortion, Mask making, Electron beam lithography, Image quality, Electron beams, Projection lithography, Lithography, Optical lithography

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Proceedings Article | 17 December 2003 Paper

200-mm EPL stencil mask fabrication and metrology

Hiroshi Fujita, Tadahiko Takigawa, Mikio Ishikawa, Yu-ki Aritsuka, Satoshi Yusa, Morihisa Hoga, Hisatake Sano

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518034

KEYWORDS: Photomasks, Silicon, Etching, Scanning electron microscopy, Mask making, Optical lithography, Electron beam lithography, Image transmission, Metrology, Projection lithography

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Proceedings Article | 28 August 2003 Paper

Evaluation of a transmission CD-SEM for EB stencil masks

Mikio Ishikawa, Hiroshi Fujita, Morihisa Hoga, Hisatake Sano

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504237

KEYWORDS: Photomasks, Charged-particle lithography, Cadmium, Critical dimension metrology, Electron beam lithography, Projection lithography, Holons, Silicon, Electron beams, Sensors

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Proceedings Article | 1 August 2002 Paper

Impact of deformation of the edges of two complementary patterns on electron-beam projection lithography mask making

Hisatake Sano, Kenichi Morimoto, Yuuki Aritsuka, Hiroshi Fujita

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476995

KEYWORDS: Critical dimension metrology, Photomasks, Mask making, Projection lithography, Silicon, Data conversion, Electron beams, Electron beam lithography, Control systems, Lithography

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Proceedings Article | 11 March 2002 Paper

Improvement of alt-PSM production process using backside phase-measurement method

Hidetaka Saitou, Yasuhiro Koizumi, Syuichi Sanki, Tatsuhiko Kamibayashi, Shiaki Murai, Hiroyuki Miyashita, Hiroshi Fujita, Yasutaka Morikawa, Masami Nara, Naoya Hayashi, Morihisa Hoga

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458273

KEYWORDS: Etching, Quartz, Phase measurement, Wet etching, Photomasks, Dry etching, Profilometers, Phase shifts, Lithography, Laser development

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Proceedings Article | 30 December 1999 Paper

Realization of practical attenuated phase-shift mask with high-transmission KrF excimer laser exposure

Nobuhito Toyama, Hiroyuki Miyashita, Yasutaka Morikawa, Hiroshi Fujita, Kazuya Iwase, Hiroshi Mohri, Naoya Hayashi, Hisatake Sano

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373331

KEYWORDS: Optical simulations, Reticles, Manufacturing, Inspection, Photomasks, Excimer lasers, Optics manufacturing, Phase shifts, Transmittance, Optical properties

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Proceedings Article | 18 December 1998 Paper

Phase controllability improvement for alternating phase shift mask

Masami Nara, Toshifumi Yokoyama, Hiroshi Fujita, Hiroyuki Miyashita, Naoya Hayashi

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332833

KEYWORDS: Etching, Quartz, Photomasks, Phase shifts, Metals, Plasma, Dielectrics, Dry etching, Lithography, Phase measurement

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Proceedings Article | 24 July 1996 Paper

Performance of i- and g-line phase-shift measurement system MPM-100

Hiroshi Fujita, Hisatake Sano, Haruhiko Kusunose, Hideo Takizawa, Kouji Miyazaki, Naoki Awamura, Takahiro Ode, Daikichi Awamura

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245227

KEYWORDS: Phase shifts, Phase measurement, Halftones, Sodium, Transmittance, Refractive index, Photomasks, Objectives, Quartz, Laser systems engineering

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Proceedings Article | 8 December 1995 Paper

Quality assurance of embedded attenuated phase-shift masks

Hiroyuki Miyashita, Hiroshi Fujita, Toshifumi Yokoyama, Naoya Hayashi, Hisatake Sano

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228178

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Proceedings Article | 3 July 1995 Paper

Evaluation of CD metrology tools for photomasks for 0.25-um devices

Hiroshi Fujita, Shiho Sasaki, Hiroyuki Miyashita, Naoya Hayashi, Hisatake Sano

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212780

KEYWORDS: Photomasks, Confocal microscopy, Binary data, Microscopes, Critical dimension metrology, Calibration, Reticles, Scanning electron microscopy, Transmittance, Lawrencium

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Proceedings Article | 15 February 1994 Paper

Direct phase measurement in phase-shift masks with a differential heterodyne interferometer

Hiroshi Fujita, Hiroyuki Miyashita, Hiroyuki Nakamura, Hisatake Sano, Kasuhiko Kimura, Hiroshi Nakanishi, Hideo Takizawa, Hidehiko Yamaguchi, Takahiro Ode

Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167255

KEYWORDS: Phase measurement, Quartz, Heterodyning, Interferometers, Refractive index, Photomasks, Laser development, Photomask technology, Helium neon lasers, Phase shifts

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Proceedings Article | 26 March 1993 Paper

Primary processes in e-beam and laser lithographies for phase-shift mask manufacturing II

Masa-aki Kurihara, Masumi Arai, Hiroshi Fujita, Hisashi Moro-oka, Yoichi Takahashi, Hisatake Sano

Proceedings Volume 1809, (1993) https://doi.org/10.1117/12.142150

KEYWORDS: Electron beam lithography, Polymers, Manufacturing, Chromium, Photomasks, Optical alignment, Lithography, Curium, Quartz, Raster graphics

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Proceedings Article | 1 June 1992 Paper

Primary processes in e-beam and laser lithographies for phase-shift mask manufacturing

Yoichi Takahashi, Hiroshi Fujita, Hisashi Moro-oka, Masa-aki Kurihara, Kazuo Suwa, Hisatake Sano

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130322

KEYWORDS: Lithography, Photomasks, Optical alignment, Chromium, Manufacturing, Polymers, Optical lithography, Electron beam lithography, Etching, Quartz

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Showing 5 of 21 publications

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