Mr. Toshifumi Yokoyama Profile

Toshifumi Yokoyama

Manager at Dai Nippon Printing Co Ltd

SPIE Involvement:

Author

Area of Expertise:

Photomask

Websites:

Company Website

Publications (17)

Proceedings Article | 2 May 2008 Paper

Paper

Mask CD measurement approach by diffraction intensity for lithography equivalent

Takaharu Nagai, Kei Mesuda, Takanori Sutou, Yuichi Inazuki, Hiroyuki Hashimoto, Toshifumi Yokoyama, Nobuhito Toyama, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 6792, 67920N (2008) https://doi.org/10.1117/12.798781

KEYWORDS: Photomasks, 3D modeling, Diffraction, 3D metrology, Lithography, Scanning electron microscopy, Critical dimension metrology, Printing, 3D printing, Image analysis

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Proceedings Article | 1 November 2007 Paper

Paper

Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyond

Yasuyuki Kushida, Hitoshi Handa, Hiroshi Maruyama, Yuuki Abe, Yukihiro Fujimura, Toshifumi Yokoyama

Proceedings Volume 6730, 673045 (2007) https://doi.org/10.1117/12.751244

KEYWORDS: Etching, Line width roughness, Photomasks, Chromium, Cadmium sulfide, Process control, SRAF, Photoresist processing, Diffractive optical elements, Mask making

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Proceedings Article | 3 May 2007 Paper

Paper

Birefringence variation of quartz substrates during mask process

Yasutaka Morikawa, Yasuhisa Kitahata, Toshifumi Yokoyama, Toshiharu Kikuchi, Atsushi Kawaguchi, Yasushi Ohkubo

Proceedings Volume 6533, 65331J (2007) https://doi.org/10.1117/12.736526

KEYWORDS: Birefringence, Photomasks, Pellicles, Quartz, Lithography, Semiconducting wafers, Thermal effects, Manufacturing, Standards development, Light sources

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Proceedings Article | 3 May 2007 Paper

Paper

Characteristics optimization of mask materials for Hyper-NA lithography

Yasutaka Morikawa, Takanori Suto, Takaharu Nagai, Yuichi Inazuki, Takashi Adachi, Yasuhisa Kitahata, Toshifumi Yokoyama, Nobuhito Toyama, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 6533, 653306 (2007) https://doi.org/10.1117/12.734498

KEYWORDS: Photomasks, Birefringence, Semiconducting wafers, Pellicles, Lithography, Lithographic illumination, Quartz, Polarization, Printing, Wafer-level optics

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Proceedings Article | 20 October 2006 Paper

Paper

Multi-layer resist system for 45-nm-node and beyond: Part III

Yuuki Abe, Jumpei Morimoto, Toshifumi Yokoyama, Atsushi Kominato, Yasushi Ohkubo

Proceedings Volume 6349, 634935 (2006) https://doi.org/10.1117/12.692889

KEYWORDS: Etching, Chromium, Anisotropic etching, Quartz, Photomasks, Plasma, Phase shifts, Photoresist processing, Chlorine, Plasma etching

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Proceedings Article | 20 October 2006 Paper

Paper

Multi-layer resist system for 45-nm-node and beyond: part I

M. Hashimoto, H. Shiratori, K. Horii, Y. Yokoya, Y. Ohkubo, H. Takamizawa, Y. Fujimura, J. Morimoto, A. Manoshiro, M. Shimizu, T. Yokoyama, T. Enomoto, M. Nagai

Proceedings Volume 6349, 63490I (2006) https://doi.org/10.1117/12.693131

KEYWORDS: Etching, Chromium, Photoresist processing, SRAF, Diffusion, Scanning electron microscopy, Standards development, Chemically amplified resists, Photomasks, Optical lithography

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Proceedings Article | 20 October 2006 Paper

Paper

A new criterion of mask birefringence for polarized illumination

Kazuya Iwase, Boontarika Thunnakart, Tokihisa Kaneguchi, Ken Ozawa, Toshifumi Yokoyama, Yasutaka Morikawa, Fumikatsu Uesawa

Proceedings Volume 6349, 634951 (2006) https://doi.org/10.1117/12.685360

KEYWORDS: Birefringence, Photomasks, Polarization, Cadmium sulfide, Tolerancing, Electroluminescence, Lithography, Critical dimension metrology, Lawrencium, Wave plates

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Proceedings Article | 20 May 2006 Paper

Paper

Advanced process control of mask dry-etching using RF sensor

Hitoshi Handa, Satoshi Yamauchi, Koji Hosono, Hiroshi Maruyama, Daisuke Nakamura, Toshifumi Yokoyama, Akihiko Naito

Proceedings Volume 6283, 62830D (2006) https://doi.org/10.1117/12.681740

KEYWORDS: Etching, Chromium, Plasma, Sensors, Photomasks, Critical dimension metrology, Process control, Computer simulations, Oxygen, Phase shifts

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Proceedings Article | 17 December 2003 Paper

Paper

Process monitoring of chrome dry-etching with RF sensor for reticle production beyond 90-nm node

Hitoshi Handa, Satoshi Yamauchi, Hiroshi Maruyama, Satoshi Ishimoto, Makoto Kosugi, Yutaka Miyahara, Toshifumi Uryu, Toshifumi Yokoyama, Akihiko Naito

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518337

KEYWORDS: Sensors, Etching, Reticles, Plasma, Critical dimension metrology, Signal detection, Chromium, Process control, Resistance, Error analysis

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Proceedings Article | 5 September 2001 Paper

Paper

Development of bilayered TaSiOx-HTPSM: II

Toshifumi Yokoyama, S. Yusa, T. Okamura, H. Nakagawa, Toshiaki Motonaga, Hiroshi Mohri, Junji Fujikawa, Naoya Hayashi

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438338

KEYWORDS: Etching, Chromium, Inspection, Opacity, Quartz, Plasma etching, Transmittance, Plasma, Tantalum, Critical dimension metrology

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Proceedings Article | 5 September 2001 Paper

Paper

Development of bilayered TaSiOx-HTPSM: I

Toshiaki Motonaga, M. Ohtsuki, Y. Kinase, H. Nakagawa, Toshifumi Yokoyama, Hiroshi Mohri, Junji Fujikawa, Naoya Hayashi

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438337

KEYWORDS: Transmittance, Phase shifts, Inspection, Reflectivity, Lithography, Laser irradiation, Quartz, Photomasks, Silicon, Tantalum

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Proceedings Article | 19 July 2000 Paper

Paper

Development of photomask process with precise CD control, and an approach for DFM (defect-free manufacturing) using a cluster tool

Shiho Sasaki, Toshifumi Yokoyama, Masa-aki Kurihara, Hiroyuki Miyashita, Naoya Hayashi, Hisatake Sano

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392030

KEYWORDS: Etching, Photomasks, Manufacturing, Critical dimension metrology, Scanning electron microscopy, Design for manufacturing, Particles, Control systems, Dry etching, Cadmium

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Proceedings Article | 18 December 1998 Paper

Paper

Phase controllability improvement for alternating phase shift mask

Masami Nara, Toshifumi Yokoyama, Hiroshi Fujita, Hiroyuki Miyashita, Naoya Hayashi

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332833

KEYWORDS: Etching, Quartz, Photomasks, Phase shifts, Metals, Plasma, Dielectrics, Dry etching, Lithography, Phase measurement

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Proceedings Article | 1 September 1998 Paper

Paper

Comparison of etching methods for subquarter-micron-rule mask fabrication

Tsukasa Abe, Toshifumi Yokoyama, Sato Kyoko, Hiroyuki Miyashita, Naoya Hayashi

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328797

KEYWORDS: Etching, Reactive ion etching, Edge roughness, Critical dimension metrology, Dry etching, Optical proximity correction, Plasma etching, Plasma, Photomasks, Mask making

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Proceedings Article | 28 July 1997 Paper

Paper

Development of focused-ion-beam repair for quartz defects on alternating phase-shift masks

Masami Matsumoto, Tsukasa Abe, Toshifumi Yokoyama, Hiroyuki Miyashita, Naoya Hayashi, Hisatake Sano

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277263

KEYWORDS: Quartz, Etching, Wet etching, Bridges, Gallium, Photomasks, Phase shifts, Ions, Lithography, Ion beams

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Proceedings Article | 8 December 1995 Paper

Paper

Quality assurance of embedded attenuated phase-shift masks

Hiroyuki Miyashita, Hiroshi Fujita, Toshifumi Yokoyama, Naoya Hayashi, Hisatake Sano

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228178

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Proceedings Article | 3 November 1994 Paper

Paper

Manufacturing of half-tone phase-shift masks III: inspection, repair, and quality assurance

Toshifumi Yokoyama, Y. Suzuki, K. Hanzawa, K. Oda, Katsuhide Tsuchiya, Shigeru Noguchi, Minoru Komada, Hisashi Moro-oka

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191938

KEYWORDS: Photomasks, Inspection, Phase shifts, Carbon, Printing, Opacity, Defect detection, X-ray technology, Laser systems engineering, Scanning electron microscopy

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Showing 5 of 17 publications

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