Mr. Hiroshi Sugimura Profile

Hiroshi Sugimura

Senior Researcher at Toppan Printing Co Ltd

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 23 March 2006 Paper

Resolution improvement of EPL stencil mask using thin membrane

Hiroshi Sugimura, Hideyuki Eguchi, Masashi Norimoto, Yoshiyuki Negishi, Isao Yonekura, Kojiro Ito, Akira Tamura, Fumihiro Koba, Hiroshi Arimoto

Proceedings Volume 6151, 61511F (2006) https://doi.org/10.1117/12.655425

KEYWORDS: Photomasks, Reactive ion etching, Etching, Semiconducting wafers, Scattering, Mask making, Electron beam lithography, Silicon, Image resolution, Optical lithography

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Proceedings Article | 23 March 2006 Paper

Advanced Image Placement Performance for the Current EPL Masks

Hideyuki Eguchi, Hiroshi Sugimura, Kaoru Koike, Hiroshi Sakaue, Hiroshi Arimoto, Kentaro Ogawa, Takashi Susa, Shinji Kunitani, Toshiaki Kurosu, Takashi Yoshii, Kojiro Itoh, Akira Tamura

Proceedings Volume 6151, 61511G (2006) https://doi.org/10.1117/12.655423

KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Photoresist processing, Mask making, Optical alignment, Image processing, Silicon, Process control, Reactive ion etching

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Proceedings Article | 28 June 2005 Paper

Image placement of large window-size membrane for EPL and LEEPL mask

Hideyuki Eguchi, Tomoya Sumida, Takashi Susa, Yoshiyuki Negishi, Toshiaki Kurosu, Takashi Yoshii, Tsukasa Yamazaki, Kenta Yotsui, Hiroshi Sugimura, Akira Tamura

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617287

KEYWORDS: Photomasks, Charged-particle lithography, Electron beam lithography, Projection lithography, Microelectromechanical systems, Solids

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Proceedings Article | 28 June 2005 Paper

Stencil pattern accuracy of EPL masks

Hiroshi Sugimura, Tsukasa Yamazaki, Takashi Susa, Yoshiyuki Negishi, Takashi Yoshii, Hideyuki Eguchi, Akira Tamura

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617279

KEYWORDS: Photomasks, Reactive ion etching, Critical dimension metrology, Lithography, Mask making, Silicon, Etching, Electron beam lithography, Projection lithography, Distortion

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Proceedings Article | 28 June 2005 Paper

Local IP evaluations of EPL reticle with 4 mm-sq Si membranes

Kaoru Koike, Hiroshi Sakaue, Hiroshi Arimoto, Tukasa Yamazaki, Hiroshi Sugimura, Takashi Susa, Kojiro Ito, Akira Tamura

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617467

KEYWORDS: Reticles, Distortion, Semiconducting wafers, Photomasks, Silicon, Metrology, Electron beam lithography, Optical alignment, Data corrections, Overlay metrology

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Proceedings Article | 6 December 2004 Paper

Global image placement of LEEPL mask

Hideyuki Eguchi, Takashi Susa, Tomoya Sumida, Toshiaki Kurosu, Takashi Yoshii, Kenta Yotsui, Hiroshi Sugimura, Kojiro Itoh, Akira Tamura

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.578655

KEYWORDS: Photomasks, Charged-particle lithography, Distortion, Photovoltaics, Photomask technology, Silicon, Projection lithography

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Proceedings Article | 17 December 2003 Paper

Low-stress stencil masks using a doping method

Hideyuki Eguchi, Toshiaki Kurosu, Takashi Yoshii, Hiroshi Sugimura, Kojiro Itoh, Akira Tamura

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.519856

KEYWORDS: Photomasks, Doping, Charged-particle lithography, Electron beam lithography, Silicon, Projection lithography, Finite element methods, Boron, Lithography, Printing

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