Mr. Ikuo Yoneda Profile

Ikuo Yoneda

at Toshiba Corp

SPIE Involvement:

Author

Publications (7)

SPIE Journal Paper | 1 October 2011

Nanoimprint lithography and future patterning for semiconductor devices

Tatsuhiko Higashiki, Tetsuro Nakasugi, Ikuo Yoneda

JM3, Vol. 10, Issue 04, 043008, (October 2011) https://doi.org/10.1117/12.10.1117/1.3658024

KEYWORDS: Nanoimprint lithography, Photomasks, Semiconductors, Lithography, Semiconducting wafers, Electron beam lithography, Optical lithography, Extreme ultraviolet lithography, Overlay metrology, Electron beams

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Proceedings Article | 17 March 2011 Open Access

Nanoimprint lithography for semiconductor devices and future patterning innovation

Tatsuhiko Higashiki, Tetsuro Nakasugi, Ikuo Yoneda

Proceedings Volume 7970, 797003 (2011) https://doi.org/10.1117/12.882940

KEYWORDS: Nanoimprint lithography, Lithography, Semiconducting wafers, Optical lithography, Semiconductors, Extreme ultraviolet lithography, Photomasks, Ultraviolet radiation, Defect inspection, Critical dimension metrology

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Proceedings Article | 18 March 2009 Paper

A study of filling process for UV nanoimprint lithography using a fluid simulation

Ikuo Yoneda, Yasutada Nakagawa, Shinji Mikami, Hiroshi Tokue, Takumi Ota, Takeshi Koshiba, Masamitsu Ito, Koji Hashimoto, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7271, 72712A (2009) https://doi.org/10.1117/12.813654

KEYWORDS: Nanoimprint lithography, Ultraviolet radiation, Photoresist processing, Capillaries, Lithography, Diffusion, Nitrogen, Semiconductors, Line edge roughness, Ranging

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Proceedings Article | 1 December 2008 Paper

What is the strongest candidate in lithography for 2x nm HP and beyond?　

Kohji Hashimoto, Ikuo Yoneda, Takeshi Koshiba, Shinji Mikami, Takumi Ota, Masamitsu Ito, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7140, 71400A (2008) https://doi.org/10.1117/12.810264

KEYWORDS: Lithography, Nanoimprint lithography, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Double patterning technology, Photomasks, Manufacturing, Signal processing, Optical lithography

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Proceedings Article | 14 March 2008 Paper

Study of nanoimprint lithography for applications toward 22nm node CMOS devices

Ikuo Yoneda, Shinji Mikami, Takumi Ota, Takeshi Koshiba, Masamitsu Ito, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 6921, 692104 (2008) https://doi.org/10.1117/12.771149

KEYWORDS: Nanoimprint lithography, Optical alignment, Multilayers, Line edge roughness, Lithography, CMOS devices, Metals, Inspection, Overlay metrology, Semiconducting wafers

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Proceedings Article | 19 July 2000 Paper

Phase defects on DUV alternating PSMs

Ikuo Yoneda, Hideki Kanai, Shinji Yamaguchi, Iwao Higashikawa

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392097

KEYWORDS: Inspection, Defect inspection, Phase shifts, Photomasks, Deep ultraviolet, Defect detection, Quartz, Lithography, Printing, Semiconducting wafers

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Proceedings Article | 24 July 1996 Paper

Subquarter-micron lithography with dual-trench-type alternating PSM

Hideki Kanai, Kenji Kawano, Satoshi Tanaka, Eishi Shiobara, Masami Aoki, Ikuo Yoneda, Shinichi Ito

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245213

KEYWORDS: Photomasks, Picosecond phenomena, Error analysis, Lithography, Phase shift keying, Phase shifts, Etching, Quartz, Opacity, Modulation

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Showing 5 of 7 publications

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