Mr. Takumi Ota Profile

Takumi Ota

at Toshiba Corp

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Author

Publications (7)

Proceedings Article | 18 March 2009 Paper

A study of filling process for UV nanoimprint lithography using a fluid simulation

Ikuo Yoneda, Yasutada Nakagawa, Shinji Mikami, Hiroshi Tokue, Takumi Ota, Takeshi Koshiba, Masamitsu Ito, Koji Hashimoto, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7271, 72712A (2009) https://doi.org/10.1117/12.813654

KEYWORDS: Nanoimprint lithography, Ultraviolet radiation, Photoresist processing, Capillaries, Lithography, Diffusion, Nitrogen, Semiconductors, Line edge roughness, Ranging

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Proceedings Article | 1 December 2008 Paper

What is the strongest candidate in lithography for 2x nm HP and beyond?　

Kohji Hashimoto, Ikuo Yoneda, Takeshi Koshiba, Shinji Mikami, Takumi Ota, Masamitsu Ito, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7140, 71400A (2008) https://doi.org/10.1117/12.810264

KEYWORDS: Lithography, Nanoimprint lithography, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Double patterning technology, Photomasks, Manufacturing, Signal processing, Optical lithography

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Proceedings Article | 14 March 2008 Paper

Study of nanoimprint lithography for applications toward 22nm node CMOS devices

Ikuo Yoneda, Shinji Mikami, Takumi Ota, Takeshi Koshiba, Masamitsu Ito, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 6921, 692104 (2008) https://doi.org/10.1117/12.771149

KEYWORDS: Nanoimprint lithography, Optical alignment, Multilayers, Line edge roughness, Lithography, CMOS devices, Metals, Inspection, Overlay metrology, Semiconducting wafers

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Proceedings Article | 15 March 2007 Paper

A study of voltage contrast image using Monte Carlo simulation

T. Ota, T. Koshiba, T. Nakasugi

Proceedings Volume 6517, 651712 (2007) https://doi.org/10.1117/12.711405

KEYWORDS: Monte Carlo methods, Virtual colonoscopy, Silicon, Scattering, Polymethylmethacrylate, Electron beams, Computing systems, Scanning electron microscopy, Lithography, 3D image processing

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Proceedings Article | 15 March 2007 Paper

Alignment method of low-energy electron-beam direct writing system EBIS using voltage contrast image

Takeshi Koshiba, Takumi Ota, Tetsuro Nakasugi, Fumihiko Nakamura, Katsuhide Watanabe, Kazuyoshi Sugihara

Proceedings Volume 6517, 651713 (2007) https://doi.org/10.1117/12.711368

KEYWORDS: Virtual colonoscopy, Optical alignment, Signal detection, Silicon, Metals, Image analysis, Overlay metrology, Lithography, Distortion, Back end of line

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Proceedings Article | 24 March 2006 Paper

A character projection low energy electron beam direct writing system for device of small production lot with a variety of design

Fumihiko Nakamura, Katsuhide Watanabe, Hidetoshi Kinoshita, Hiroyuki Shinozaki, Yasushi Kojima, Satoshi Morita, Kouhei Noguchi, Norihiro Yamaguchi, Hisashi Isokawa, Kazuhiko Kushitani, Takayuki Satoh, Takeshi Koshiba, Takumi Oota, Tetsuro Nakasugi, Hiroyuki Mizuno

Proceedings Volume 6151, 61512A (2006) https://doi.org/10.1117/12.655963

KEYWORDS: Semiconducting wafers, Electron beam direct write lithography, Control systems, Electron beams, Vestigial sideband modulation, Data conversion, Beam shaping, Photomasks, Optical alignment, Amplifiers

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Proceedings Article | 16 June 2003 Paper

Maskless lithography: a low-energy electron-beam direct writing system with a common CP aperture, and recent progress

Tetsuro Nakasugi, Atsushi Ando, Ryoichi Inanami, Noriaki Sasaki, Takumi Ota, Osamu Nagano, Yuuichiro Yamazaki, Kazuyoshi Sugihara, Ichiro Mori, Motosuke Miyoshi, Katsuya Okumura, Akira Miura

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483607

KEYWORDS: Scanning electron microscopy, Virtual colonoscopy, System on a chip, Logic devices, Maskless lithography, Lenses, Semiconducting wafers, Inspection, Electron beam direct write lithography, Lithography

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Showing 5 of 7 publications

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