Dr. Jian Ma
Manager of Product Engineering and Management at Intel Corp
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 24 March 2006 Paper
Jian Ma, Jeff Farnsworth, Larry Bassist, Ying Cui, Bobby Mammen, Ramaswamy Padmanaban, Venkatesh Nadamuni, Muralidhar Kamath, Ken Buckmann, Julie Neff, Phil Freiberger
Proceedings Volume 6152, 61521K (2006) https://doi.org/10.1117/12.654326
KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Optical proximity correction, Metrology, Optical lithography, Process control, Scanning electron microscopy, Manufacturing, Process modeling

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61540M (2006) https://doi.org/10.1117/12.654691
KEYWORDS: Quartz, Photomasks, Manufacturing, Etching, Optical lithography, Logic, Critical dimension metrology, Phase shifts, Optical proximity correction, Reticles

Proceedings Article | 5 November 2005 Paper
Jian Ma, Ke Han, Kyung Lee, Yulia Korobko, Mary Silva, Joas Chavez, Brian Irvine, Sven Henrichs, Kishore Chakravorty, Robert Olshausen, Mahesh Chandramouli, Bobby Mammen, Ramaswamy Padmanaban
Proceedings Volume 5992, 59921P (2005) https://doi.org/10.1117/12.632160
KEYWORDS: Overlay metrology, Neodymium, Quartz, Chromium, Photomasks, Tolerancing, Phase shifts, Etching, Scanning electron microscopy, Optical testing

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617359
KEYWORDS: Neodymium, Photomasks, Spatial light modulators, Deep ultraviolet, Electron beam lithography, Optical alignment, Quartz, Optical lithography, Chromium, Critical dimension metrology

Proceedings Article | 6 December 2004 Paper
Jian Ma, Chaoyang Li, Larry Bassist, Matthew Pekney, Nathan Wilcox, Jeff Farnsworth, Edward Lauder, B. Krishnakumar
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568423
KEYWORDS: Critical dimension metrology, Photomasks, Chromium, Etching, Diffractive optical elements, Semiconducting wafers, Reticles, Phase modulation, Optical proximity correction, Manufacturing

Showing 5 of 7 publications
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