Mr. Robert Eklund Profile

Robert Eklund

Product Manager at Mycronic AB

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 13 November 2024 Presentation

Meander writing, to further enhance maskshop productivity with the SLX laser mask writer

Robert Eklund, Mikael Wahlsten, Anders Svensson, Mats Rosling, Martin Glimtoft, Xueying Hai, Youngjin Park

Proceedings Volume 13216, 1321618 (2024) https://doi.org/10.1117/12.3034692

KEYWORDS: Semiconductor manufacturing, Semiconductor lasers, Manufacturing, Industry, Industrial applications, Design

Read Abstract +

Proceedings Article | 12 November 2024 Presentation + Paper

Evaluating high-throughput mask systems for mainstream technology applications

Martin Glimtoft, Robert Eklund, Mikael Wahlsten, Mats Rosling, Anders Svensson, Youngjin Park, Yukihiro Fujimura, Izumi Hotei, Mei Ebisawa, Yusuke Shoji, Shingo Yoshikawa

Proceedings Volume 13216, 132160L (2024) https://doi.org/10.1117/12.3034858

KEYWORDS: Photomasks, Deep ultraviolet, Printing, Design, Laser applications, Semiconductors, Industry, Semiconductor lasers, Semiconducting wafers, Scanning electron microscopy

Read Abstract +

Proceedings Article | 12 December 2023 Presentation + Paper

Development and production deployment of new laser-based mask writer for optical and EUV applications

Christopher Leavitt, Michael Hunsweck, Florence Eschbach, Yang Liu, Kyle Vogt, Jun Kim, Andrew Sowers, Frank Abboud, Mikael Wahlsten, Robert Eklund, Mats Rosling, Peter Henriksson, Anders Svensson, Fredric Ihren, Youngjin Park

Proceedings Volume PC12751, PC127510T (2023) https://doi.org/10.1117/12.2688097

KEYWORDS: EUV optics, Laser applications, Extreme ultraviolet, Laser development, Critical dimension metrology, Sustainability, Solid state lasers, Solid state electronics, Printing, Power consumption

Read Abstract +

Proceedings Article | 22 November 2023 Presentation

The SLX journey: designing a cost-efficient laser mask writer for today’s and tomorrow’s maskshop requirements

Robert Eklund, Mikael Wahlsten, Mats Rosling, Martin Glimtoft, Peter Henriksson, Anders Svensson, Fredric Ihren, Youngjin Park

Proceedings Volume PC12751, PC127510H (2023) https://doi.org/10.1117/12.2687582

KEYWORDS: Laser development, Sustainability, Semiconductors, Semiconductor manufacturing, Manufacturing, Laser marking, Carbon

Read Abstract +

Proceedings Article | 26 September 2023 Presentation

DUV Mask Writer addressable to 90nm nodes with a sustainability profile

Robert Eklund

Proceedings Volume PC12915, PC129150K (2023) https://doi.org/10.1117/12.3012449

Read Abstract +

Proceedings Article | 11 November 2022 Presentation

DUV mask writer addressable to 90nm nodes with a sustainability profile

Robert Eklund, Mikael Wahlsten, Mats Rosling, Martin Glimtoft, Gunnar Gustafsson, Ylva Mjöberg Wentzel, Anna-Karin Drake, Youngjin Park

Proceedings Volume PC12293, PC122930J (2022) https://doi.org/10.1117/12.2641791

KEYWORDS: Photomasks, Deep ultraviolet, Semiconductors, Manufacturing, Electronics, Climate change, Agriculture

Read Abstract +

Proceedings Article | 12 October 2021 Presentation + Paper

A new generation cost-efficient laser mask writer, addressable up to the 90nm node

Robert Eklund, Mats Rosling, Mikael Wahlsten, Martin Glimtoft, Göran Hansson, Anders Svensson, Youngjin Park

Proceedings Volume 11855, 1185511 (2021) https://doi.org/10.1117/12.2600939

KEYWORDS: Photomasks, Semiconductors, Laser applications, Semiconductor lasers, Manufacturing, Laser sources, Diagnostics, Deep ultraviolet, Solid state lighting, Modulation

Read Abstract +

Proceedings Article | 22 February 2021 Presentation

A new generation cost-efficient laser mask writer for mature semiconductor nodes

Mats Rosling, Mikael Wahlsten, Göran Hansson, Anders Svensson, Robert Eklund, Youngjin Park

Proceedings Volume 11613, 116130A (2021) https://doi.org/10.1117/12.2583601

Read Abstract +

Proceedings Article | 3 May 2007 Paper

Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer

Robert Eklund, Anders Österberg, Jonas Hellgren, Hans Fosshaug, Tord Karlin, Tom Newman

Proceedings Volume 6533, 65330C (2007) https://doi.org/10.1117/12.736923

KEYWORDS: Photomasks, Critical dimension metrology, Spatial light modulators, Convolution, Raster graphics, Neodymium, Electron beam lithography, Data modeling, Deep ultraviolet, Printing

Read Abstract +

Proceedings Article | 28 June 2005 Paper

Second level exposure for phase shift mask applications using an SLM-based DUV mask writer

Mahesh Chandramouli, Bob Olshausen, Yulia Korobko, Sven Henrichs, Ping Qu, Jian Ma, Bruce Auches, Damon Cole, Thomas Ostrom, Angela Beyerl, Robert Eklund, Raoul Zerne, Peter Goransson, Magnus Persson, Tom Newman

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617359

KEYWORDS: Neodymium, Photomasks, Spatial light modulators, Deep ultraviolet, Electron beam lithography, Optical alignment, Quartz, Optical lithography, Chromium, Critical dimension metrology

Read Abstract +

Proceedings Article | 14 May 2004 Paper

Influence of writing strategy on CD control for the spatial light modulator-based Sigma7300 DUV laser pattern generator

Hans Fosshaug, Per Askebjer, Johan Karlsson, Adisa Bajramovic, Kezhao Xing, Robert Eklund, Jonathan Walford, Mats Ekberg, Peter Hogfeldt, Thomas Öström

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535821

KEYWORDS: Diffusion, Critical dimension metrology, Photomasks, Deep ultraviolet, Polymers, Printing, Spatial light modulators, Photoresist materials, Chemistry, Chemically amplified resists

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Laser PG performance for 100-nm photomasks

Mats Rosling, Andrzej Karawajczyk, Per Askebjer, Raoul Zerne, Allen Carroll, Robert Eklund, Hans Fosshaug, Torbjoern Sandstrom

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468622

KEYWORDS: Spatial light modulators, Photomasks, Critical dimension metrology, Micromirrors, Analog electronics, Deep ultraviolet, Mirrors, Image resolution, Manufacturing, Electron beam lithography

Read Abstract +

Showing 5 of 12 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years