Dr. Jun Tao Profile

Dr. Jun Tao

at ASML

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 23 March 2011 Paper

Full-chip source and mask optimization

Min-Chun Tsai, Stephen Hsu, Luoqi Chen, Yen-Wen Lu, Jiangwei Li, Frank Chen, Hong Chen, Jun Tao, Been-Der Chen, Hanying Feng, William Wong, Wei Yuan, Xiaoyang Li, Zhipan Li, Liang Li, Russell Dover, Hua-yu Liu, Jim Koonmen

Proceedings Volume 7973, 79730A (2011) https://doi.org/10.1117/12.881633

KEYWORDS: Source mask optimization, Photomasks, SRAF, Optical proximity correction, Lithography, Manufacturing, Logic, Electroluminescence, Inspection, Lithium

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Proceedings Article | 29 September 2010 Paper

Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

Takashi Kamikubo, Takayuki Ohnishi, Shigehiro Hara, Hirohito Anze, Yoshiaki Hattori, Shuichi Tamamushi, Shufeng Bai, Jen-Shiang Wang, Rafael Howell, George Chen, Jiangwei Li, Jun Tao, Jim Wiley, Terunobu Kurosawa, Yasuko Saito, Tadahiro Takigawa

Proceedings Volume 7823, 782331 (2010) https://doi.org/10.1117/12.865822

KEYWORDS: Extreme ultraviolet, Data modeling, Photomasks, Scattering, Monte Carlo methods, Point spread functions, Process modeling, Electron beams, Tantalum, Chromium

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Proceedings Article | 27 May 2010 Paper

Performance and stability of mask process correction for EBM-7000

Yasuko Saito, George Chen, Jen-Shiang Wang, Shufeng Bai, Rafael Howell, Jiangwei Li, Jun Tao, Doug VanDenBroeke, Jim Wiley, Tadahiro Takigawa, Takayuki Ohnishi, Takashi Kamikubo, Shigehiro Hara, Hirohito Anze, Yoshiaki Hattori, Shuichi Tamamushi

Proceedings Volume 7748, 774814 (2010) https://doi.org/10.1117/12.867969

KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet, Manufacturing, Metrology, Time metrology, EUV optics, Computational lithography, Scattering, Optical lithography

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