Dr. Shuichi Tamamushi Profile

Dr. Shuichi Tamamushi

at Samsung ElectronicsCo Ltd

SPIE Involvement:

Author

Publications (32)

Proceedings Article | 16 October 2017 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Ryosuke Ueba, Kenji Otoshi, Hirokazu Yamada, Jin Choi, Byoung-Sup Ahn, Jong-Mun Park, Sang-Hee Lee, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 10451, 1045117 (2017) https://doi.org/10.1117/12.2280502

KEYWORDS: Photomasks, Computer aided design, Data processing, Modulation

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Proceedings Article | 3 October 2016 Paper

The technical consideration of multi-beam mask writer for production

Sang Hee Lee, Byung-Sup Ahn, Jin Choi, In Kyun Shin, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 9985, 998506 (2016) https://doi.org/10.1117/12.2243129

KEYWORDS: Vestigial sideband modulation, Electron beam lithography, Optical simulations, Electron beams, Photomasks, Optical lithography, Distortion, Modulation, Neodymium, Image registration

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Proceedings Article | 9 July 2015 Paper

Challenges and requirements of mask data processing for multi-beam mask writer

Jin Choi, Dong Hyun Lee, Sinjeung Park, SookHyun Lee, Shuichi Tamamushi, In Kyun Shin, Chan Uk Jeon

Proceedings Volume 9658, 96580C (2015) https://doi.org/10.1117/12.2199274

KEYWORDS: Photomasks, Data corrections, Optical proximity correction, Data processing, Data modeling, Scattering, Logic devices, Modulation, Laser scattering, Optical lithography

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Proceedings Article | 16 September 2014 Paper

Study of heating effect in multi-beam mask writing

Jongsu Kim, Jihoon Kang, Inhwan Noh, Sookhyun Lee, Soeun Shin, Sungil Lee, Hyunchung Ha, Hojune Lee, Jin Choi, Sanghee Lee, Inkyun Shin, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 9235, 92350Y (2014) https://doi.org/10.1117/12.2065930

KEYWORDS: Finite element methods, Critical dimension metrology, Vestigial sideband modulation, Photomasks, Beam shaping, Chemical reactions, Electron beams, Heat flux, Chemical analysis, Thermal effects

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Proceedings Article | 28 July 2014 Paper

Challenges and technical requirements for multi-beam mask writer development

Sang Hee Lee, Jin Choi, Ho June Lee, In Kyun Shin, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 9256, 925606 (2014) https://doi.org/10.1117/12.2069731

KEYWORDS: Photomasks, Vestigial sideband modulation, Electron beam lithography, Scattering, Laser scattering, Monte Carlo methods, Image processing, Backscatter, Beam controllers, Calibration

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Proceedings Article | 14 October 2011 Paper

In-die mask registration measurement with existing inspection tools

Shuichi Tamamushi, Takanao Touya

Proceedings Volume 8166, 816639 (2011) https://doi.org/10.1117/12.898890

KEYWORDS: Inspection, Photomasks, Image registration, Error analysis, Inspection equipment, Metrology, Calibration, Scanners, Interferometers, Data corrections

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Proceedings Article | 14 October 2011 Paper

EBM-8000: EB mask writer for product mask fabrication of 22nm half-pitch generation and beyond

Shusuke Yoshitake, Takashi Kamikubo, Noriaki Nakayamada, Kiyoshi Hattori, Hiroyoshi Ando, Tomohiro Iijima, Kenji Ohtoshi, Kenichi Saito, Ryoichi Yoshikawa, Shuichi Tamamushi, Rikio Tomiyoshi, Hitoshi Higurashi, Yoshiaki Hattori, Seiichi Tsuchiya, Masayuki Katoh, Kouichi Suzuki, Yuichi Tachikawa, Munehiro Ogasawara, Victor Katsap, Steven Golladay, Rodney Kendall

Proceedings Volume 8166, 81661D (2011) https://doi.org/10.1117/12.898850

KEYWORDS: Photomasks, Lithography, Amplifiers, Data storage servers, Mask making, Immersion lithography, Data conversion, Extreme ultraviolet lithography, Data processing, Data corrections

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Proceedings Article | 20 May 2011 Paper

Advancing the charging effect correction with time-dependent discharging model

Noriaki Nakayamada, Takashi Kamikubo, Hirohito Anze, Shuichi Tamamushi

Proceedings Volume 8081, 808109 (2011) https://doi.org/10.1117/12.899905

KEYWORDS: Photomasks, Electron beams, Metrology, Electron beam lithography, Numerical modeling, Overlay metrology, Current controlled current source

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Proceedings Article | 29 September 2010 Paper

Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000

Takashi Kamikubo, Takayuki Ohnishi, Shigehiro Hara, Hirohito Anze, Yoshiaki Hattori, Shuichi Tamamushi, Shufeng Bai, Jen-Shiang Wang, Rafael Howell, George Chen, Jiangwei Li, Jun Tao, Jim Wiley, Terunobu Kurosawa, Yasuko Saito, Tadahiro Takigawa

Proceedings Volume 7823, 782331 (2010) https://doi.org/10.1117/12.865822

KEYWORDS: Extreme ultraviolet, Data modeling, Photomasks, Scattering, Monte Carlo methods, Point spread functions, Process modeling, Electron beams, Tantalum, Chromium

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Proceedings Article | 25 September 2010 Paper

CD inspection by Nuflare NPI 6000 tool

J. Richter, C. Utzny, J. Heumann, Shuichi Tamamushi, Noriyuki Takamatsu

Proceedings Volume 7823, 78232L (2010) https://doi.org/10.1117/12.864976

KEYWORDS: Critical dimension metrology, Inspection, Scanning electron microscopy, Metals, Photomasks, Time metrology, Metrology, Optical proximity correction, Defect inspection, Electron beams

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Proceedings Article | 27 May 2010 Paper

Performance and stability of mask process correction for EBM-7000

Yasuko Saito, George Chen, Jen-Shiang Wang, Shufeng Bai, Rafael Howell, Jiangwei Li, Jun Tao, Doug VanDenBroeke, Jim Wiley, Tadahiro Takigawa, Takayuki Ohnishi, Takashi Kamikubo, Shigehiro Hara, Hirohito Anze, Yoshiaki Hattori, Shuichi Tamamushi

Proceedings Volume 7748, 774814 (2010) https://doi.org/10.1117/12.867969

KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet, Manufacturing, Metrology, Time metrology, EUV optics, Computational lithography, Scattering, Optical lithography

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Proceedings Article | 26 May 2010 Paper

Evaluation of metrology capabilities of mask inspection equipment

T. Touya, S. Tamamushi, N. Takamatsu

Proceedings Volume 7748, 77480O (2010) https://doi.org/10.1117/12.867221

KEYWORDS: Photomasks, Image sensors, Error analysis, Data acquisition, Sensors, Inspection, Metrology, Inspection equipment, Image processing, Time metrology

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Proceedings Article | 30 September 2009 Paper

Using metrology capabilities of mask inspection equipment for optimizing total lithography performance

Shuichi Tamamushi, Noriyuki Takamatsu

Proceedings Volume 7488, 74880C (2009) https://doi.org/10.1117/12.833513

KEYWORDS: Photomasks, Error analysis, Image sensors, Inspection equipment, Inspection, Interferometers, Image processing, Lithography, Scanners, Sensors

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Proceedings Article | 30 September 2009 Paper

Electron beam mask writer EBM-7000 for hp 32nm generation

Takashi Kamikubo, Kenji Ohtoshi, Noriaki Nakayamada, Rieko Nishimura, Hitoshi Sunaoshi, Kiminobu Akeno, Soichiro Mitsui, Yuichi Tachikawa, Hideo Inoue, Susumu Oogi, Hitoshi Higurashi, Akinori Mine, Takiji Ishimura, Seiichi Tsuchiya, Yoshitada Gomi, Hideki Matsui, Shuichi Tamamushi

Proceedings Volume 7488, 74881E (2009) https://doi.org/10.1117/12.833462

KEYWORDS: Photomasks, Data processing, Electron beams, Distributed computing, Objectives, Double patterning technology, Magnetism, Optical lithography, Overlay metrology, Lithography

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Proceedings Article | 17 October 2008 Paper

New electron optics for mask writer EBM-7000 to challenge hp 32nm generation

Takashi Kamikubo, Steven Golladay, Rodney Kendall, Victor Katsap, Kenji Ohtoshi, Munehiro Ogasawara, Shinsuke Nishimura, Rieko Nishimura, Osamu Iizuka, Takahito Nakayama, Shunji Shinkawa, Tetsurou Nishiyama, Shuichi Tamamushi

Proceedings Volume 7122, 71220J (2008) https://doi.org/10.1117/12.801725

KEYWORDS: Photomasks, Photoresist processing, Objectives, Beam shaping, Optical testing, Chemically amplified resists, Signal detection, Electron beam melting, In situ metrology, Electron beams

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Proceedings Article | 19 May 2008 Paper

Modeling of charging effect and its correction by EB mask writer EBM-6000

Noriaki Nakayamada, Seiji Wake, Takashi Kamikubo, Hitoshi Sunaoshi, Shuichi Tamamushi

Proceedings Volume 7028, 70280C (2008) https://doi.org/10.1117/12.793020

KEYWORDS: Photomasks, Data modeling, Double patterning technology, Mirrors, Lithography, Electron beams, Mask making, Optical lithography, Electron beam lithography, Thin film coatings

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Proceedings Article | 2 May 2008 Paper

Desired IP control methodology for EUV mask in current mask process

S. Yoshitake, H. Sunaoshi, S. Tamamushi, M. Ogasawara

Proceedings Volume 6792, 67920T (2008) https://doi.org/10.1117/12.798933

KEYWORDS: Photomasks, Extreme ultraviolet, Metrology, Extreme ultraviolet lithography, Semiconducting wafers, Optical lithography, EUV optics, Lithography, Reflection, Polishing

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Proceedings Article | 2 May 2008 Paper

Key improvement schemes of accuracies in EB mask writing for double patterning lithography

Hitoshi Sunaoshi, Takashi Kamikubo, Rieko Nishimura, Kaoru Tsuruta, Takehiko Katsumata, Takayuki Ohnishi, Hirohito Anze, Jun Takamatsu, Shusuke Yoshitake, Shuichi Tamamushi

Proceedings Volume 6792, 679208 (2008) https://doi.org/10.1117/12.798521

KEYWORDS: Photomasks, Double patterning technology, Semiconducting wafers, Critical dimension metrology, Error analysis, Lithography, Diffusion, LCDs, Chromium, Line edge roughness

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Proceedings Article | 30 October 2007 Paper

Correction technique of EBM-6000 prepared for EUV mask writing

Shusuke Yoshitake, Hitoshi Sunaoshi, Jun Yashima, Shuichi Tamamushi, Munehiro Ogasawara

Proceedings Volume 6730, 673030 (2007) https://doi.org/10.1117/12.747748

KEYWORDS: Photomasks, Extreme ultraviolet, Metrology, Extreme ultraviolet lithography, Error analysis, Reflectivity, Semiconducting wafers, EUV optics, Mirrors, Inspection

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Proceedings Article | 30 October 2007 Paper

Coping with double-patterning/exposure lithography by EB mask writer EBM-6000

Takashi Kamikubo, Rieko Nishimura, Kaoru Tsuruta, Kiyoshi Hattori, Jun Takamatsu, Shusuke Yoshitake, Hiroshi Nozue, Hitoshi Sunaoshi, Shuichi Tamamushi

Proceedings Volume 6730, 673031 (2007) https://doi.org/10.1117/12.747745

KEYWORDS: Photomasks, Error analysis, Double patterning technology, Lithography, Chromium, Scanners, Critical dimension metrology, Semiconducting wafers, Control systems, 193nm lithography

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Proceedings Article | 15 May 2007 Paper

A study of EB pattern write system design for 22-nm node and beyond

Shuichi Tamamushi, Hideaki Hamada

Proceedings Volume 6607, 660722 (2007) https://doi.org/10.1117/12.728985

KEYWORDS: Data processing, Transistors, Electron beams, Optical proximity correction, Photomasks, Resolution enhancement technologies, Vestigial sideband modulation, Electron beam melting, Data conversion, Data modeling

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Proceedings Article | 14 May 2007 Paper

Study of heating effect on CAR in electron-beam mask writing

Takashi Kamikubo, Makoto Hiramoto, Jun Yashima, Masazumi Takahashi, Rieko Nishimura, Takehiko Katsumata, Hirohito Anze, Hitoshi Sunaoshi, Shuichi Tamamushi, Munehiro Ogasawara

Proceedings Volume 6607, 660723 (2007) https://doi.org/10.1117/12.728986

KEYWORDS: Critical dimension metrology, Electron beams, Photomasks, Temperature metrology, Cadmium, Denoising, Resolution enhancement technologies, Computer simulations, Polymers, Optical lithography

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Proceedings Article | 11 May 2007 Paper

Electron-beam mask writer EBM-6000 for 45-nm HP node

Jun Yashima, Kenji Ohtoshi, Noriaki Nakayamada, Hirohito Anze, Takehiko Katsumata, Tomohiro Iijima, Rieko Nishimura, Syuuichiro Fukutome, Nobuo Miyamoto, Seiji Wake, Yusuke Sakai, Shinji Sakamoto, Shigehiro Hara, Hitoshi Higurashi, Kiyoshi Hattori, Kenichi Saito, Rodney Kendall, Shuichi Tamamushi

Proceedings Volume 6607, 660703 (2007) https://doi.org/10.1117/12.728917

KEYWORDS: Line edge roughness, Photomasks, Control systems, Standards development, Manufacturing, Monochromatic aberrations, Electron beam melting, Photoresist processing, Beam shaping, Electron beams

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Proceedings Article | 20 May 2006 Paper

EBM-5000: electron-beam mask writer for 45 nm node

Hitoshi Sunaoshi, Yuichi Tachikawa, Hitoshi Higurashi, Tomohiro Iijima, Junichi Suzuki, Takashi Kamikubo, Kenji Ohtoshi, Hirohito Anze, Takehiko Katsumata, Noriaki Nakayamada, Shigehiro Hara, Shuichi Tamamushi, Yoji Ogawa

Proceedings Volume 6283, 628306 (2006) https://doi.org/10.1117/12.681732

KEYWORDS: Photomasks, Line edge roughness, Error analysis, Electron beams, Manufacturing, Data conversion, Electron beam melting, Optical proximity correction, Electro optical systems

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Proceedings Article | 5 September 2001 Paper

Writing accuracy of EBM-3500 electron-beam mask writing system

Kenji Ohtoshi, Hitoshi Sunaoshi, Jun Takamatsu, Fumiyuki Okabe, K. Ishibashi, Shusuke Yoshitake, Hirokazu Yamada, Shuichi Tamamushi, Hirohito Anze, T. Kamikobo, Yoji Ogawa

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438403

KEYWORDS: Photomasks, Optical proximity correction, Beam shaping, Electron beams, Magnetism, Vestigial sideband modulation, Electron beam lithography, Lithography, Error analysis, Scanning electron microscopy

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Proceedings Article | 25 August 1999 Paper

Advanced electron-beam writing system EX-11 for next-generation mask fabrication

Toru Tojo, Ryoji Yoshikawa, Yoji Ogawa, Shuichi Tamamushi, Yoshiaki Hattori, Souji Koikari, Hideo Kusakabe, Takayuki Abe, Munehiro Ogasawara, Kiminobu Akeno, Hirohito Anze, Kiyoshi Hattori, Ryoichi Hirano, Shusuke Yoshitake, Tomohiro Iijima, Kenji Ohtoshi, Kazuto Matsuki, Naoharu Shimomura, Noboru Yamada, Hitoshi Higurashi, Noriaki Nakayamada, Yuuji Fukudome, Shigehiro Hara, Eiji Murakami, Takashi Kamikubo, Yasuo Suzuki, Susumu Oogi, Mitsuko Shimizu, Shinsuke Nishimura, Hideyuki Tsurumaki, Satoshi Yasuda, Kenji Ooki, Kiyomi Koyama, Susumu Watanabe, Mitsuhiro Yano, Hiroaki Suzuki, Hiroshi Hoshino, Masaki Toriumi, Osamu Watanabe, Kazuo Tsuji, Mitsunobu Katayama, Seiichi Tsuchiya, Kimio Suzuki, Shiro Kurasawa, Kazuyuki Okuzono, Hirokazu Yamada, Koji Handa, Yoshio Suzuki, Tetsu Akiyama, Yoshiaki Tada, Akira Noma, Tadahiro Takigawa

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360219

KEYWORDS: Photomasks, Data conversion, Mask making, Lithography, Distortion, Electron beams, Manufacturing, Critical dimension metrology, Vibration control, Sensors

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Proceedings Article | 28 July 1997 Paper

Development of an in-situ cleaning system for an e-beam reticle writer

Kenji Ohtoshi, Satoshi Yamasaki, Shuichi Tamamushi, Toru Tojo, Ryoichi Hirano, Yuuji Fukudome, Naoharu Shimomura, Shinsuke Nishimura, Shusuke Yoshitake, Munehiro Ogasawara

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277287

KEYWORDS: Contamination, Reticles, Electron beams, Gold, Optical testing, Microwave radiation, Etching, Diffusion, Electronics, Molecules

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Proceedings Article | 12 February 1997 Paper

Practical approach to evaluating mask CD uniformity patterned by a variable-shaped beam

Shusuke Yoshitake, Yoji Ogawa, Hideaki Sakurai, Masamitsu Itoh, Iwao Higashikawa, Noriaki Nakayamada, Kazuto Matsuki, Shuichi Tamamushi

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301200

KEYWORDS: Chromium, Beam shaping, Photomasks, Reactive ion etching, Critical dimension metrology, Etching, Semiconductors, Reticles, Optical lithography, Quartz

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Proceedings Article | 3 July 1995 Paper

Performance improvement in electron-beam reticle writing system

Hirohito Anze, Satoshi Yamasaki, Shuichi Tamamushi, Yoji Ogawa, Eiji Murakami, Ryoichi Hirano, Kazuto Matsuki

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212764

KEYWORDS: Reticles, Electron beams, Distortion, Beam shaping, Motion controllers, Etching, Beam controllers, Neodymium, Error analysis, Dynamical systems

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Proceedings Article | 3 July 1995 Paper

Reticle flexure influence on pattern positioning accuracy for reticle writing

Ryoichi Hirano, Kazuto Matsuki, Shusuke Yoshitake, Yoshihiko Takahashi, Shuichi Tamamushi, Yoji Ogawa, Toru Tojo

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212776

KEYWORDS: Reticles, Electron beams, Beam shaping, Affine motion model, Lithium, Vestigial sideband modulation, Laser interferometry, Image registration, Sensors, Time metrology

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Proceedings Article | 3 July 1995 Paper

Analysis of pattern shift error for mask clamping measured by Nikon XY-31

Shusuke Yoshitake, Kazuto Matsuki, Satoshi Yamasaki, Ryoichi Hirano, Shuichi Tamamushi, Yoji Ogawa, Toru Tojo

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212777

KEYWORDS: Photomasks, Error analysis, Metrology, Distortion, Mirrors, Factor analysis, Lithography, Quartz, Chromium, Sputter deposition

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Proceedings Article | 8 August 1993 Paper

Phase-contrast lithography

Soichi Inoue, Tadahito Fujisawa, Satoshi Tanaka, Shuichi Tamamushi, Yoji Ogawa, Makoto Nakase

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150449

KEYWORDS: Phase modulation, Lithography, Phase shift keying, Photomasks, Phase contrast, Lithographic illumination, Solids, Modulation, Projection systems, Halftones

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Showing 5 of 32 publications

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