Dr. Kwang-Woo Choi Profile

Dr. Kwang-Woo Choi

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Publications (11)

Proceedings Article | 1 April 2009 Paper

Characterization of the photoacid diffusion length

Shuhui Kang, Vivek Prabhu, Wen-li Wu, Eric Lin, Kwang-Woo Choi, Manish Chandhok, Todd Younkin, Wang Yueh

Proceedings Volume 7273, 72733U (2009) https://doi.org/10.1117/12.813555

KEYWORDS: Diffusion, Photoresist materials, Extreme ultraviolet lithography, Switches, Lithography, Line edge roughness, Photoresist developing, Polymers, Deep ultraviolet, Extreme ultraviolet

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Proceedings Article | 24 March 2009 Paper

Nonplanar high-k dielectric thickness measurements using CD-SAXS

Chengqing Wang, Kwang-Woo Choi, Yi-Ching Chen, Jimmy Price, Derek Ho, Ronald Jones, Christopher Soles, Erik Lin, Wen-Li Wu, Benjamin Bunday

Proceedings Volume 7272, 72722M (2009) https://doi.org/10.1117/12.813757

KEYWORDS: Dielectrics, Scanning electron microscopy, Scattering, X-rays, Data modeling, Sensors, Transistors, Critical dimension metrology, Laser scattering, Silicon

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Proceedings Article | 15 April 2008 Paper

A comparison of the reaction-diffusion kinetics between model-EUV polymer and molecular-glass photoresists

Shuhui Kang, Kristopher Lavery, Kwang-Woo Choi, Vivek Prabhu, Wen-Li Wu, Eric Lin, Anuja De Silva, Nelson Felix, Christopher Ober

Proceedings Volume 6923, 692317 (2008) https://doi.org/10.1117/12.773018

KEYWORDS: Diffusion, Polymers, Photoresist materials, Glasses, FT-IR spectroscopy, Switches, Temperature metrology, Solids, Image resolution, Extreme ultraviolet

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Proceedings Article | 3 April 2008 Paper

Characterization of the latent image to developed image in model EUV photoresists

John Woodward, Kwang-Woo Choi, Vivek Prabhu, Shuhui Kang, Kristopher Lavery, Wen-li Wu, Michael Leeson, Anuja De Silva, Nelson Felix, Christopher Ober

Proceedings Volume 6923, 69232B (2008) https://doi.org/10.1117/12.773036

KEYWORDS: Line width roughness, Magnesium, Extreme ultraviolet lithography, Atomic force microscopy, Extreme ultraviolet, Photoresist materials, Image processing, Switches, Image quality, Photoresist developing

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Proceedings Article | 24 March 2008 Paper

Linewidth roughness and cross-sectional measurements of sub-50 nm structures with CD-SAXS and CD-SEM

Chengqing Wang, Kwang-Woo Choi, Ronald Jones, Christopher Soles, Eric Lin, Wen-li Wu, James Clarke, John Villarrubia, Benjamin Bunday

Proceedings Volume 6922, 69221Z (2008) https://doi.org/10.1117/12.773558

KEYWORDS: Line width roughness, Line edge roughness, Diffraction, X-rays, Critical dimension metrology, Scattering, Sensors, Laser scattering, Extreme ultraviolet lithography, Extreme ultraviolet

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Proceedings Article | 24 March 2008 Paper

CD-SAXS measurements using laboratory-based and synchrotron-based instruments

Chengqing Wang, Kwang-Woo Choi, Wei-En Fu, Derek Ho, Ronald Jones, Christopher Soles, Eric Lin, Wen-Li Wu, James Clarke, Benjamin Bunday

Proceedings Volume 6922, 69222E (2008) https://doi.org/10.1117/12.773774

KEYWORDS: Diffraction, Line width roughness, Line edge roughness, Synchrotrons, X-rays, Satellites, Metrology, X-ray diffraction, Collimation, Scattering

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Proceedings Article | 20 March 2008 Paper

Quantitative measurement of outgas products from EUV photoresists

C. Tarrio, B. Benner, R. Vest, S. Grantham, S. Hill, T. Lucatorto, J. Hendricks, P. Abbott, G. Denbeaux, C. Mbanaso, A. Antohe, K. Orvek, K.-W. Choi

Proceedings Volume 6921, 69211H (2008) https://doi.org/10.1117/12.772686

KEYWORDS: Semiconducting wafers, Molecules, Extreme ultraviolet lithography, Photoresist materials, Statistical analysis, Extreme ultraviolet, Capacitance, EUV optics, Mass spectrometry, Chemical analysis

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Proceedings Article | 12 April 2007 Paper

Effect of photo-acid generator concentration and developer strength on the patterning capabilities of a model EUV photoresist

Kwang-Woo Choi, Vivek Prabhu, Kristopher Lavery, Eric Lin, Wen-li Wu, John Woodward, Michael Leeson, Heidi Cao, Manish Chandhok, George Thompson

Proceedings Volume 6519, 651943 (2007) https://doi.org/10.1117/12.712407

KEYWORDS: Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Photoresist developing, Extreme ultraviolet, Optical lithography, Scanning electron microscopy, Standards development, Systems modeling, Performance modeling

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Proceedings Article | 5 April 2007 Paper

Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results

Chengqing Wang, Ronald Jones, Eric Lin, Wen-li Wu, John Villarrubia, Kwang-Woo Choi, James Clarke, Bryan Rice, Michael Leeson, Jeanette Roberts, Robert Bristol, Benjamin Bunday

Proceedings Volume 6518, 65181O (2007) https://doi.org/10.1117/12.725380

KEYWORDS: Line width roughness, Line edge roughness, Diffraction, Critical dimension metrology, Photoresist materials, X-rays, Scattering, Satellites, Extreme ultraviolet lithography, Sensors

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Proceedings Article | 29 March 2006 Paper

Fundamentals of the reaction-diffusion process in model EUV photoresists

Kristopher Lavery, Kwang-Woo Choi, Bryan Vogt, Vivek Prabhu, Eric Lin, Wen-li Wu, Sushil Satija, Michael Leeson, Heidi Cao, George Thompson, Hai Deng, David Fryer

Proceedings Volume 6153, 615313 (2006) https://doi.org/10.1117/12.656831

KEYWORDS: Photoresist materials, Reflectivity, Interfaces, Diffusion, Polymers, Line width roughness, Process modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography

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Proceedings Article | 24 March 2006 Paper

Characterization of line edge roughness using CD-SAXS

Ronald Jones, Wen-li Wu, Cheng-qing Wang, Eric Lin, Kwang-Woo Choi, Bryan Rice, George Thompson, Steven Weigand, Denis Keane

Proceedings Volume 6152, 61520N (2006) https://doi.org/10.1117/12.656829

KEYWORDS: Line edge roughness, Diffraction, Line width roughness, Satellites, Data modeling, X-rays, Scattering, Laser scattering, Scanning electron microscopy, Sensors

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Showing 5 of 11 publications

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