Dr. Wen-li Wu Profile

Dr. Wen-li Wu

NIST Fellow at National Institute of Standards and Technology

SPIE Involvement:

Author

Publications (45)

SPIE Journal Paper | 3 April 2023 Open Access

Review of the key milestones in the development of critical dimension small angle x-ray scattering at National Institute of Standards and Technology

Wen-li Wu, R. Joseph Kline, Ronald L. Jones, Hae-Jeong Lee, Eric K. Lin, Daniel F. Sunday, Chengqing Wang, Tengjiao Hu, Christopher L. Soles

JM3, Vol. 22, Issue 03, 031206, (April 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.3.031206

KEYWORDS: X-rays, Scattering, Metrology, Semiconductors, Critical dimension metrology, Lithography, Industry, Standards development, 3D metrology, Nanostructures

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SPIE Journal Paper | 12 August 2013

Three-dimensional x-ray metrology for block copolymer lithography line-space patterns

Daniel Sunday, Matthew Hammond, Chengqing Wang, Wen-li Wu, R. Joseph Kline, Gila Stein

JM3, Vol. 12, Issue 03, 031103, (August 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.031103

KEYWORDS: Scattering, X-rays, Picosecond phenomena, Lithography, Polymethylmethacrylate, Metrology, 3D metrology, X-ray lithography, Absorption, Directed self assembly

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Proceedings Article | 10 April 2013 Paper

Critical dimension small angle X-ray scattering measurements of FinFET and 3D memory structures

Charles Settens, Benjamin Bunday, Brad Thiel, R. Joseph Kline, Daniel Sunday, Chengqing Wang, Wen-li Wu, Richard Matyi

Proceedings Volume 8681, 86810L (2013) https://doi.org/10.1117/12.2012019

KEYWORDS: Scattering, 3D metrology, Critical dimension metrology, X-rays, Etching, Silicon, Metrology, Oxides, Scatter measurement

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Proceedings Article | 10 April 2013 Paper

Intercomparison between optical and x-ray scatterometry measurements of FinFET structures

P. Lemaillet, T. Germer, R. Joseph Kline, Daniel Sunday, Chengqing Wang, Wen-li Wu

Proceedings Volume 8681, 86810Q (2013) https://doi.org/10.1117/12.2011144

KEYWORDS: X-rays, X-ray optics, Scatterometry, Metrology, Silica, Scattering, Interfaces, Scatter measurement, Silicon

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Proceedings Article | 1 April 2009 Paper

Characterization of the photoacid diffusion length

Shuhui Kang, Vivek Prabhu, Wen-li Wu, Eric Lin, Kwang-Woo Choi, Manish Chandhok, Todd Younkin, Wang Yueh

Proceedings Volume 7273, 72733U (2009) https://doi.org/10.1117/12.813555

KEYWORDS: Diffusion, Photoresist materials, Extreme ultraviolet lithography, Switches, Lithography, Line edge roughness, Photoresist developing, Polymers, Deep ultraviolet, Extreme ultraviolet

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Proceedings Article | 24 March 2009 Paper

Nonplanar high-k dielectric thickness measurements using CD-SAXS

Chengqing Wang, Kwang-Woo Choi, Yi-Ching Chen, Jimmy Price, Derek Ho, Ronald Jones, Christopher Soles, Erik Lin, Wen-Li Wu, Benjamin Bunday

Proceedings Volume 7272, 72722M (2009) https://doi.org/10.1117/12.813757

KEYWORDS: Dielectrics, Scanning electron microscopy, Scattering, X-rays, Data modeling, Sensors, Transistors, Critical dimension metrology, Laser scattering, Silicon

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Proceedings Article | 15 April 2008 Paper

A comparison of the reaction-diffusion kinetics between model-EUV polymer and molecular-glass photoresists

Shuhui Kang, Kristopher Lavery, Kwang-Woo Choi, Vivek Prabhu, Wen-Li Wu, Eric Lin, Anuja De Silva, Nelson Felix, Christopher Ober

Proceedings Volume 6923, 692317 (2008) https://doi.org/10.1117/12.773018

KEYWORDS: Diffusion, Polymers, Photoresist materials, Glasses, FT-IR spectroscopy, Switches, Temperature metrology, Solids, Image resolution, Extreme ultraviolet

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Proceedings Article | 3 April 2008 Paper

Characterization of the latent image to developed image in model EUV photoresists

John Woodward, Kwang-Woo Choi, Vivek Prabhu, Shuhui Kang, Kristopher Lavery, Wen-li Wu, Michael Leeson, Anuja De Silva, Nelson Felix, Christopher Ober

Proceedings Volume 6923, 69232B (2008) https://doi.org/10.1117/12.773036

KEYWORDS: Line width roughness, Magnesium, Extreme ultraviolet lithography, Atomic force microscopy, Extreme ultraviolet, Photoresist materials, Image processing, Switches, Image quality, Photoresist developing

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Proceedings Article | 25 March 2008 Paper

Exploring the limitations of x-ray reflectivity as a critical dimension pattern shape metrology

Hae-Jeong Lee, Sangcheol Kim, Christopher Soles, Eric Lin, Wen-Li Wu

Proceedings Volume 6922, 692224 (2008) https://doi.org/10.1117/12.772849

KEYWORDS: X-rays, Polymers, Reflectivity, Metrology, Data modeling, Silicon, Picosecond phenomena, X-ray sources, Thin films, Scattering

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Proceedings Article | 24 March 2008 Paper

Linewidth roughness and cross-sectional measurements of sub-50 nm structures with CD-SAXS and CD-SEM

Chengqing Wang, Kwang-Woo Choi, Ronald Jones, Christopher Soles, Eric Lin, Wen-li Wu, James Clarke, John Villarrubia, Benjamin Bunday

Proceedings Volume 6922, 69221Z (2008) https://doi.org/10.1117/12.773558

KEYWORDS: Line width roughness, Line edge roughness, Diffraction, X-rays, Critical dimension metrology, Scattering, Sensors, Laser scattering, Extreme ultraviolet lithography, Extreme ultraviolet

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Proceedings Article | 24 March 2008 Paper

CD-SAXS measurements using laboratory-based and synchrotron-based instruments

Chengqing Wang, Kwang-Woo Choi, Wei-En Fu, Derek Ho, Ronald Jones, Christopher Soles, Eric Lin, Wen-Li Wu, James Clarke, Benjamin Bunday

Proceedings Volume 6922, 69222E (2008) https://doi.org/10.1117/12.773774

KEYWORDS: Diffraction, Line width roughness, Line edge roughness, Synchrotrons, X-rays, Satellites, Metrology, X-ray diffraction, Collimation, Scattering

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Proceedings Article | 12 April 2007 Paper

Identifying materials limits of chemically amplified photoresists

Wen-li Wu, Vivek Prabhu, Eric Lin

Proceedings Volume 6519, 651902 (2007) https://doi.org/10.1117/12.720424

KEYWORDS: Photoresist materials, Line edge roughness, Image quality, Polymers, Diffusion, Photoresist developing, Surface roughness, Image processing, Interfaces, Reflectivity

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Proceedings Article | 12 April 2007 Paper

Effect of photo-acid generator concentration and developer strength on the patterning capabilities of a model EUV photoresist

Kwang-Woo Choi, Vivek Prabhu, Kristopher Lavery, Eric Lin, Wen-li Wu, John Woodward, Michael Leeson, Heidi Cao, Manish Chandhok, George Thompson

Proceedings Volume 6519, 651943 (2007) https://doi.org/10.1117/12.712407

KEYWORDS: Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Photoresist developing, Extreme ultraviolet, Optical lithography, Scanning electron microscopy, Standards development, Systems modeling, Performance modeling

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Proceedings Article | 5 April 2007 Paper

Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results

Chengqing Wang, Ronald Jones, Eric Lin, Wen-li Wu, John Villarrubia, Kwang-Woo Choi, James Clarke, Bryan Rice, Michael Leeson, Jeanette Roberts, Robert Bristol, Benjamin Bunday

Proceedings Volume 6518, 65181O (2007) https://doi.org/10.1117/12.725380

KEYWORDS: Line width roughness, Line edge roughness, Diffraction, Critical dimension metrology, Photoresist materials, X-rays, Scattering, Satellites, Extreme ultraviolet lithography, Sensors

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Proceedings Article | 5 April 2007 Paper

Characterizing pattern structures using x-ray reflectivity

Hae-Jeong Lee, Christopher Soles, Hyun Wook Ro, Shuhui Kang, Eric Lin, Alamgir Karim, Wen-li Wu, D. Hines

Proceedings Volume 6518, 651813 (2007) https://doi.org/10.1117/12.712416

KEYWORDS: X-rays, Reflectivity, Silicon, Data modeling, Metrology, X-ray sources, Scattering, Nanoimprint lithography, Lithography, Laser scattering

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Proceedings Article | 3 April 2007 Paper

FTIR measurements of compositional heterogeneities

Shuhui Kang, Bryan Vogt, Wen-li Wu, Vivek Prabhu, David VanderHart, Ashwin Rao, Eric Lin, Karen Turnquest

Proceedings Volume 6519, 651916 (2007) https://doi.org/10.1117/12.712659

KEYWORDS: Hydrogen, Optical spheres, FT-IR spectroscopy, Polymers, Photoresist materials, Solids, Line edge roughness, Data modeling, Spectroscopy, Polymer thin films

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Proceedings Article | 22 March 2007 Paper

Evaluation of the 3D compositional heterogeneity effect on line-edge-roughness

Shuhui Kang, Wen-Li Wu, Vivek Prabhu, Bryan Vogt, Eric Lin, Karen Turnquest

Proceedings Volume 6519, 65193V (2007) https://doi.org/10.1117/12.712682

KEYWORDS: Line edge roughness, Switches, Diffusion, Photoresist materials, Optical spheres, Polymers, 3D modeling, Computer simulations, Photoresist developing, Standards development

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Proceedings Article | 29 March 2006 Paper

Fundamentals of the reaction-diffusion process in model EUV photoresists

Kristopher Lavery, Kwang-Woo Choi, Bryan Vogt, Vivek Prabhu, Eric Lin, Wen-li Wu, Sushil Satija, Michael Leeson, Heidi Cao, George Thompson, Hai Deng, David Fryer

Proceedings Volume 6153, 615313 (2006) https://doi.org/10.1117/12.656831

KEYWORDS: Photoresist materials, Reflectivity, Interfaces, Diffusion, Polymers, Line width roughness, Process modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography

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Proceedings Article | 29 March 2006 Paper

The deprotection reaction front profile in model 193 nm methacrylate-based chemically amplified photoresists

Bryan Vogt, Shuhui Kang, Vivek Prabhu, Ashwin Rao, Eric Lin, Sushil Satija, Karen Turnquest, Wen-li Wu

Proceedings Volume 6153, 615316 (2006) https://doi.org/10.1117/12.656464

KEYWORDS: FT-IR spectroscopy, Diffusion, Reflectivity, Line edge roughness, Photoresist materials, Image quality, Image processing, Standards development, Polymers, Scattering

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Proceedings Article | 29 March 2006 Paper

Dissolution fundamentals of 193-nm methacrylate-based photoresists

Ashwin Rao, Shuhui Kang, Bryan Vogt, Vivek Prabhu, Eric Lin, Wen-Li Wu, Karen Turnquest, William Hinsberg

Proceedings Volume 6153, 615310 (2006) https://doi.org/10.1117/12.656540

KEYWORDS: Polymers, Photoresist materials, Quartz, Crystals, Photoresist developing, Lithography, Chemistry, Molecules, Standards development, Infrared spectroscopy

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Proceedings Article | 29 March 2006 Paper

Copolymer fraction effect on acid catalyzed deprotection reaction kinetics in model 193 nm photoresists

Shuhui Kang, Vivek Prabhu, Bryan Vogt, Eric Lin, Wen-Li Wu, Karen Turnquest

Proceedings Volume 6153, 61533N (2006) https://doi.org/10.1117/12.656594

KEYWORDS: Polymers, Photoresist materials, Diffusion, FT-IR spectroscopy, Data modeling, Glasses, Ultraviolet radiation, Spectroscopy, Chemical reactions, Hydrogen

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Proceedings Article | 24 March 2006 Paper

Characterization of line edge roughness using CD-SAXS

Ronald Jones, Wen-li Wu, Cheng-qing Wang, Eric Lin, Kwang-Woo Choi, Bryan Rice, George Thompson, Steven Weigand, Denis Keane

Proceedings Volume 6152, 61520N (2006) https://doi.org/10.1117/12.656829

KEYWORDS: Line edge roughness, Diffraction, Line width roughness, Satellites, Data modeling, X-rays, Scattering, Laser scattering, Scanning electron microscopy, Sensors

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Proceedings Article | 23 March 2006 Paper

The role of stress in nanoimprint lithography

Hyun Ro, Yifu Ding, Hae-Jeong Lee, Daniel Hines, Ronald Jones, Eric Lin, Alamgir Karim, Wen-li Wu, Christopher Soles

Proceedings Volume 6151, 615116 (2006) https://doi.org/10.1117/12.656742

KEYWORDS: Polymers, Polymethylmethacrylate, Nanoimprint lithography, Annealing, Scattering, X-rays, Temperature metrology, Picosecond phenomena, Nanostructures, Reflectivity

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Proceedings Article | 23 March 2006 Paper

Characterizing nanoimprint pattern cross-section and fidelity from x-ray reflectivity

Hae-Jeong Lee, Christopher Soles, Hyun Ro, D. Hines, Ronald Jones, Eric Lin, Alamgir Karim, Wen-li Wu

Proceedings Volume 6151, 61510N (2006) https://doi.org/10.1117/12.656826

KEYWORDS: Silicon, Reflectivity, X-rays, Data modeling, Nanoimprint lithography, Oxides, Scattering, Semiconducting wafers, Nanostructures, Reactive ion etching

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Proceedings Article | 10 May 2005 Paper

Cross sectional measurements of dense high aspect ratio patterns using CD-SAXS

Ronald Jones, Eric Lin, Wen-li Wu, Steven Weigand, Denis Keane, John Quintana

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600290

KEYWORDS: Data modeling, Scattering, X-rays, Light scattering, Photoresist materials, Diffraction, Statistical modeling, Nondestructive evaluation, Fourier transforms, Metrology

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Proceedings Article | 6 May 2005 Paper

High-resolution residual layer thickness metrology using x-ray reflectivity

Hae-Jeong Lee, Christopher Soles, Hyun Ro, Daniel Hines, Ronald Jones, Eric Lin, Wen-li Wu

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600004

KEYWORDS: Reflectivity, Silicon, X-rays, Data modeling, Metrology, Nanoimprint lithography, Scattering, Reactive ion etching, Scanning electron microscopy, Semiconducting wafers

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Proceedings Article | 4 May 2005 Paper

Water distribution within immersed polymer films

Bryan Vogt, Christopher Soles, Vivek Prabhu, Sushil Satija, Eric Lin, Wen-li Wu

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599746

KEYWORDS: Interfaces, Reflectivity, Silicon, Polymers, Scattering, Water, Head-mounted displays, Polymer thin films, Photoresist materials, Semiconducting wafers

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Proceedings Article | 4 May 2005 Paper

Interfacial structure of photoresist thin films in developer solutions

Vivek Prabhu, Bryan Vogt, Wen-Li Wu, Jack Douglas, Eric Lin, Sushil Satija, Dario Goldfarb, Hiroshi Ito

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598956

KEYWORDS: Polymers, Reflectivity, Interfaces, Ionization, Photoresist materials, Thin films, Photoresist developing, Standards development, Dielectrics, Liquids

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SPIE Journal Paper | 1 January 2005

Water immersion of model photoresists: interfacial influences on water concentration and surface morphology

Bryan Vogt, Christopher Soles, Chia-Ying Wang, Vivek Prabhu, Patricia McGuiggan, Jack Douglas, Eric Lin, Wen-Li Wu, Sushil Satija, Dario Goldfarb, Marie Angelopoulos

JM3, Vol. 4, Issue 01, 013003, (January 2005) https://doi.org/10.1117/12.10.1117/1.1861852

KEYWORDS: Interfaces, Polymers, Oxides, Head-mounted displays, Photoresist materials, Silicon, Liquids, Absorption, Polymer thin films, Silicon films

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Proceedings Article | 24 May 2004 Paper

Preliminary evaluation of line-edge roughness metrology based on CD-SAXS

Ronald Jones, Tengjiao Hu, Christopher Soles, Eric Lin, Wen-li Wu, Diego Casa, Arpan Mahorowala

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535693

KEYWORDS: Line edge roughness, Scattering, Metrology, Edge roughness, Photoresist materials, Diffraction, X-rays, Diffraction gratings, Fourier transforms, Laser scattering

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Proceedings Article | 14 May 2004 Paper

Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248-nm and 157-nm photoresists

Vivek Prabhu, Michael Wang, Erin Jablonski, Bryan Vogt, Eric Lin, Wen-Li Wu, Dario Goldfarb, Marie Angelopoulos, Hiroshi Ito

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535862

KEYWORDS: Reflectivity, Photoresist developing, Surface roughness, Atomic force microscopy, Polymers, Photoresist materials, Scattering, Critical dimension metrology, Semiconducting wafers, X-rays

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Proceedings Article | 14 May 2004 Paper

Measurements of water distribution in thin lithographic films

Bryan Vogt, Christopher Soles, Vivek Prabhu, Ronald Jones, Wen-Li Wu, Eric Lin, Dario Goldfarb, Marie Angelopoulos

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535881

KEYWORDS: Reflectivity, Interfaces, Silicon, Photoresist materials, Polymers, Oxides, Scattering, Thin films, Head-mounted displays, Silicon films

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Proceedings Article | 26 June 2003 Paper

BARC-resist interfacial interacations

Chelladurai Devadoss, Yubao Wang, Rama Puligadda, Joseph Lenhart, Erin Jablonski, Daniel Fischer, Sharadha Sambasivan, Eric Lin, Wen-li Wu

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485347

KEYWORDS: Polymers, Carbon, Chemistry, X-rays, Sensors, Molecules, Chlorine, Thin films, Liquids, Silicon

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Proceedings Article | 12 June 2003 Paper

X-ray absorption spectroscopy to probe interfacial issues in photolithography

Joseph Lenhart, Daniel Fischer, Sharadha Sambasivan, Eric Lin, Ronald Jones, Christopher Soles, Wen-li Wu, Dario Goldfarb, Marie Angelopoulos

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485149

KEYWORDS: Carbon, Polymers, Interfaces, Sensors, Luminescence, Line edge roughness, X-rays, Optical lithography, Absorption, Ultraviolet radiation

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Proceedings Article | 12 June 2003 Paper

Polymer dynamics and diffusive properties in ultrathin photoresist films

Christopher Soles, Ronald Jones, Joseph Lenhart, Vivek Prabhu, Wen-li Wu, Eric Lin, Dario Goldfarb, Marie Angelopoulos

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485140

KEYWORDS: Diffusion, Polymers, Thin films, Scattering, Crystals, Polymer thin films, Lithography, Absorption, Photoresist materials, Quartz

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Proceedings Article | 12 June 2003 Paper

Deprotection volume characteristics and line-edge morphology in chemically amplified resists

Ronald Jones, Tengjiao Hu, Vivek Prabhu, Christopher Soles, Eric Lin, Wen-li Wu, Dario Goldfarb, Marie Angelopoulos, Brian Trinque, C. Grant Willson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485146

KEYWORDS: Line edge roughness, Polymers, Scattering, Diffusion, Fractal analysis, Chemically amplified resists, Fuzzy logic, Photoresist materials, Molecules, Motion models

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Proceedings Article | 12 June 2003 Paper

Polyelectrolyte effects in model photoresist developer solutions: roles of base concentration and added salts

Vivek Prabhu, Ronald Jones, Eric Lin, Christopher Soles, Wen-li Wu, Dario Goldfarb, Marie Angelopoulos

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485147

KEYWORDS: Polymers, Scattering, Photoresist materials, Photoresist developing, Ionization, Interfaces, Ions, Sodium, Standards development, Physics

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Proceedings Article | 2 June 2003 Paper

Subnanometer wavelength metrology of lithographically prepared structures: a comparison of neutron and X-ray scattering

Ronald Jones, Tengjiao Hu, Eric Lin, Wen-li Wu, Diego Casa, N. Orji, Theodore Vorburger, Patrick Bolton, George Barclay

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483669

KEYWORDS: Scattering, Metrology, X-rays, Photoresist materials, Diffraction, Scanning electron microscopy, Light scattering, X-ray lithography, Atomic force microscopy, Scatterometry

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Proceedings Article | 24 July 2002 Paper

Chain conformation in ultrathin polymer films

Ronald Jones, Christopher Soles, Francis Starr, Eric Lin, Joseph Lenhart, Wen-li Wu, Dario Goldfarb, Marie Angelopoulos

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474232

KEYWORDS: Polymers, Scattering, Polymer thin films, Thin films, Distortion, Molecules, Silicon, Sensors, Laser scattering, Double positive medium

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Proceedings Article | 24 July 2002 Paper

Measurement of the spatial evolution of the deprotection reaction front with nanometer resolution using neutron reflectometry

Eric Lin, Christopher Soles, Dario Goldfarb, Brian Trinque, Sean Burns, Ronald Jones, Joseph Lenhart, Marie Angelopoulos, C. Grant Willson, Sushil Satija, Wen-li Wu

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474229

KEYWORDS: Polymers, Reflectivity, Interfaces, X-rays, Reflectometry, Photoresist materials, Spatial resolution, Diffusion, Data modeling, Scattering

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Proceedings Article | 16 July 2002 Paper

Structural characterizaton of deep-submicron lithographic structures using small-angle neutron scattering

Eric Lin, Ronald Jones, Wen-li Wu, John Barker, Patrick Bolton, George Barclay

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473493

KEYWORDS: Diffraction, Scattering, Laser scattering, Diffraction gratings, Sensors, Standards development, Scanning electron microscopy, Photoresist materials, Crystals, Silicon

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Proceedings Article | 24 August 2001 Paper

Characterization of thin and ultrathin polymer and resist films

Dario Goldfarb, Qinghuang Lin, Marie Angelopoulos, Christopher Soles, Eric Lin, Wen-li Wu

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436863

KEYWORDS: Reflectivity, X-rays, Polymers, Polymer thin films, Interfaces, Absorption, Thin films, Silicon, Lithography, Head-mounted displays

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Proceedings Article | 22 August 2001 Paper

Feature-shape and line-edge roughness measurement of deep submicron lithographic structures using small-angle neutron scattering

Eric Lin, Wen-li Wu, Qinghuang Lin, Marie Angelopoulos

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436767

KEYWORDS: Scattering, Diffraction, Laser scattering, Sensors, Scanning electron microscopy, Photoresist materials, Lithography, Silicon, Diffraction gratings, Semiconducting wafers

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Proceedings Article | 30 October 1998 Paper

Characterization of planarity of polymer thin films on rough surfaces

Wen-li Wu, William Wallace

Proceedings Volume 3426, (1998) https://doi.org/10.1117/12.328458

KEYWORDS: Polymers, Thin film coatings, Surface roughness, X-rays, Thin films, X-ray fluorescence spectroscopy, Luminescence, Polymer thin films, Reflectivity, Optical coatings

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Proceedings Article | 4 November 1996 Paper

Application of off-specular x-ray reflectivity for surface characterization

Wen-li Wu

Proceedings Volume 2862, (1996) https://doi.org/10.1117/12.256208

KEYWORDS: X-rays, Reflectivity, Aluminum, Silicon, Interfaces, Semiconducting wafers, X-ray characterization, Surface roughness, X-ray technology, Polymers

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Showing 5 of 45 publications

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