Ms. Melissa Zaverton Profile

Melissa Zaverton

Optical Engineer at BAE Systems

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Author

Publications (7)

Proceedings Article | 17 April 2015 Paper

Process optimization for a 3D optical coupler and waveguide fabrication on a single substrate using buffer coat material

Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tao Ge, Tom Milster, Yuzuru Takashima

Proceedings Volume 9374, 937415 (2015) https://doi.org/10.1117/12.2080425

KEYWORDS: Waveguides, Mirrors, Photomasks, Optical alignment, Thin film coatings, Lithography, Cladding, Integrated optics, Silicon, Chromium

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Proceedings Article | 13 March 2015 Paper

High contrast and metal-less alignment process for all-polymer optical interconnect devices

Tao Ge, Jilin Yang, Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tom Milster, Yuzuru Takashima

Proceedings Volume 9374, 93741F (2015) https://doi.org/10.1117/12.2079620

KEYWORDS: Imaging systems, Phase contrast, Optical alignment, Mirrors, Polymers, Lithography, Optical interconnects, Waveguides, Microscopes, Objectives

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Proceedings Article | 15 September 2014 Paper

Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography

Sunglin Wang, Chris Summitt, Lee Johnson, Melissa Zaverton, Tom Milster, Yuzuru Takashima

Proceedings Volume 9170, 91700F (2014) https://doi.org/10.1117/12.2062414

KEYWORDS: Mirrors, Lithography, Interferometers, Scanning electron microscopy, Surface roughness, Objectives, Optical fabrication, Thin film coatings, Waveguides, Profilometers

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SPIE Journal Paper | 6 August 2014

Central aperture detection for auto direct read-write photoresist fabrication and inspection

Justin Sierchio, Melissa Zaverton, Lee Johnson, Victor Densmore, Thomas Milster

OE, Vol. 53, Issue 08, 084104, (August 2014) https://doi.org/10.1117/12.10.1117/1.OE.53.8.084104

KEYWORDS: Image processing, Inspection, Raster graphics, Photoresist materials, Defect detection, Sensors, Digital filtering, Optical lithography, Laser scanners, Image registration

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Proceedings Article | 7 March 2014 Paper

Micro-optics fabrication by mask-based and mask-less mixed lithography process towards 3D optical circuits

Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tao Ge, Tom Milster, Yuzuru Takashima

Proceedings Volume 8974, 89740C (2014) https://doi.org/10.1117/12.2045234

KEYWORDS: Lithography, Mirrors, Optical circuits, Optical alignment, Photomasks, Fabrication, Integrated optics, Micro optics, Photoresist materials, Double patterning technology

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Showing 5 of 7 publications

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