CONFERENCE PROCEEDINGS
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Dr. Michael R. Sogard
Fellow, Director
SPIE Involvement:
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Publications (4)
SPIE Journal Paper | 1 October 2009
Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance in the presence of particles for extreme ultraviolet lithography
JM3, Vol. 8, Issue 04, 041506, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238518
KEYWORDS: Particles, Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Analytical research, Finite element methods, Extreme ultraviolet, Thin films, Dielectrics
Proceedings Article | 18 March 2009 Paper
Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance in the presence of particles for EUV lithography
Proceedings Volume 7271, 72710H (2009) https://doi.org/10.1117/12.815402
KEYWORDS: Particles, Reticles, Extreme ultraviolet lithography, Photomasks, 3D modeling, Analytical research, Finite element methods, Extreme ultraviolet, Thin films, Dielectrics
Proceedings Article | 6 December 2004 Paper
Simulating the process flow of the Nikon EPL new geometry mask
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569315
KEYWORDS: Photomasks, Electron beam lithography, Semiconducting wafers, Silicon, Device simulation, Oxides, Mask making, Projection lithography, Etching, Semiconductors
Proceedings Article | 16 June 2003 Paper
Predicting local thermomechanical distortions of the 200-mm EPL mask system
Po-Tung Lee, Roxann Engelstad, Edward Lovell, Shintaro Kawata, Noriyuki Hirayanagi, Michael Sogard
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.504552
KEYWORDS: Photomasks, Semiconducting wafers, Electron beams, Silicon, Reticles, Thermal modeling, Prototyping, Lithography, Electron beam lithography, Projection lithography
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